摘要:
A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, so that the surface is lowered and/or removed at least partially, wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed by the method.
摘要:
A method for producing an element having at least one arbitrarily freely formed surface (freeform surface) having a high accuracy of form and a low surface roughness. The freeform surface is obtained by at least one first processing step with a shaping material processing method in which at least an approximation to the desired freeform surface (target form) is effected, and at least one second step with a material processing method that smooths the surface, wherein at least during the second processing step of the smoothing material processing, the element (1) to be processed is elastically stressed by force introduction such that the freeform surface to be smoothed is processed by smoothing processes for spherical, plane or aspherical surfaces. A corresponding apparatus includes a mount receiving the element to be processed and a smoothing tool smoothing the freeform surface, wherein the receptacle has at least one actuator (6) for exerting a force on the element to be processed, such that the element to be processed can be elastically stressed into an intermediate shape (2″), such that the freeform surface to be smoothed can be processed with the smoothing tool by smoothing processes for spherical, plane or aspherical surfaces.
摘要:
A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, whereby the surface is lowered and/or removed at least partially, and wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed in accordance with the method.
摘要:
A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, whereby the surface is lowered and/or removed at least partially, and wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed in accordance with the method.
摘要:
A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, so that the surface is lowered and/or removed at least partially, wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed by the method.