公开(公告)号：US20100033696A1

公开(公告)日：2010-02-11

申请号：US12563766

申请日：2009-09-21

申请人： Thure BOEHM ,  Stefan Burkart ,  Hans-Juergen Mann ,  Danny Chan ,  Holger Maltor

发明人： Thure BOEHM ,  Stefan Burkart ,  Hans-Juergen Mann ,  Danny Chan ,  Holger Maltor

IPC分类号： G03B27/68 ,  B24B1/00 ,  B24B41/06 ,  B32B3/00

CPC分类号： B24B13/0043 ,  Y10T428/24355

摘要： A method for producing an element having at least one arbitrarily freely formed surface (freeform surface) having a high accuracy of form and a low surface roughness. The freeform surface is obtained by at least one first processing step with a shaping material processing method in which at least an approximation to the desired freeform surface (target form) is effected, and at least one second step with a material processing method that smooths the surface, wherein at least during the second processing step of the smoothing material processing, the element (1) to be processed is elastically stressed by force introduction such that the freeform surface to be smoothed is processed by smoothing processes for spherical, plane or aspherical surfaces. A corresponding apparatus includes a mount receiving the element to be processed and a smoothing tool smoothing the freeform surface, wherein the receptacle has at least one actuator (6) for exerting a force on the element to be processed, such that the element to be processed can be elastically stressed into an intermediate shape (2″), such that the freeform surface to be smoothed can be processed with the smoothing tool by smoothing processes for spherical, plane or aspherical surfaces.

摘要翻译： 一种具有至少一种具有高精度和低表面粗糙度的任意自由形成的表面（自由曲面）的元件的制造方法。 通过具有成形材料加工方法的至少一个第一加工步骤获得自由形式表面，其中至少实现对期望的自由曲面（目标形式）的近似，以及至少一个第二步骤，其具有使材料加工方法平滑的材料加工方法 表面，其中至少在平滑材料处理的第二处理步骤期间，待加工的元件（1）通过力引入而弹性应力，使得待平滑的自由曲面由球面，平面或非球面的平滑处理 。 相应的装置包括接收待处理元件的安装件和平滑自由曲面表面的平滑工具，其中容器具有至少一个致动器（6），用于在要处理的元件上施加力，使得要处理的元件 可以弹性地施加到中间形状（2“），使得可以通过平滑工具通过平滑球面，平面或非球面表面处理来平滑待平滑的自由曲面。

公开(公告)号：US20130286471A1

公开(公告)日：2013-10-31

申请号：US13846785

申请日：2013-03-18

申请人： Rolf FREIMANN ,  Norman BAER ,  Guido LIMBACH ,  Thure BOEHM ,  Gero WITTICH

发明人： Rolf FREIMANN ,  Norman BAER ,  Guido LIMBACH ,  Thure BOEHM ,  Gero WITTICH

IPC分类号： G02B5/08

CPC分类号： G02B5/0891 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

摘要： A mirror (1a; 1a′; 1b; 1b′; 1c; 1c′) with a substrate (S) and a layer arrangement configured such that light (32) having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P′″) having a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include a high refractive index layer (H′″) and a low refractive index layer (L′″). The layer arrangement has at least one graphine layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.

摘要翻译： 具有衬底（S）的反射镜（1a; 1a'; 1b; 1b'; 1c; 1c'）和被配置为使得波长低于250nm的光（32）被配置成入射到反射镜上的至少 0°和30°之间的入射角反映其强度的20％以上。 层布置具有至少一个具有至少两个单独层的周期（P3）的周期性序列的表面层系统（P“），其中周期（P3）包括高折射率层（H”） 和低折射率层（L“'）。 层布置具有至少一个石墨层。 石墨烯（G，SPL，B）在光学元件上的使用将表面粗糙度降低到低于0.1nm rms HSFR，和/或保护EUV元件免受辐射诱导的体积变化超过1％。 石墨烯也被用作阻挡层以防止层相互扩散。

公开(公告)号：US20090174934A1

公开(公告)日：2009-07-09

申请号：US12350474

申请日：2009-01-08

申请人： Thure BOEHM

发明人： Thure BOEHM

IPC分类号： G02B1/10 ,  B05D3/00 ,  B05D3/06 ,  B05D3/14 ,  B05D5/06 ,  B32B17/00 ,  G02B1/02

CPC分类号： G02B1/10 ,  G02B1/02 ,  G02B1/12 ,  G02B5/0891 ,  Y10T428/263 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31504 ,  Y10T428/31678

摘要： A method for repairing optical elements having a coating, in which the coating is fully or partially removed or left on the optical element, a polishing layer being provided in the coating or a polishing layer being applied, which allows simple processing of the surface to achieve high geometrical accuracy and lower surface roughness. A new coating is applied onto the corresponding polishing layer. Also addressed are corresponding optical elements, including optical elements recycled according to the method.

摘要翻译： 一种用于修复具有涂层的光学元件的方法，其中涂层被完全或部分地去除或留在光学元件上，抛光层设置在涂层中或被施加的抛光层，其允许表面的简单加工以实现 高几何精度和较低的表面粗糙度。 将新的涂层施加到相应的抛光层上。 还涉及了相应的光学元件，包括根据该方法再循环的光学元件。