公开(公告)号：US12009372B2

公开(公告)日：2024-06-11

申请号：US17601860

申请日：2020-03-27

Applicant: ISAC RESEARCH INC.

Inventor： Jin-Seong Park ,  Seong-Hyeon Lee ,  Ju-Hwan Han ,  Hyun-Jun Jeong

IPC: H01L27/12

CPC classification number: H01L27/1274 ,  H01L27/1225 ,  H01L27/1248

Abstract: A display device may comprise: a substrate including a driving area and a pixel area; a first transistor on the driving area; a second transistor on the pixel area; a first hydrogen diffusion barrier film between a first active layer and a first gate insulating film of the first transistor; and a second hydrogen diffusion barrier film between a second active layer and a second gate insulating film of the second transistor.

公开(公告)号：US20230132914A1

公开(公告)日：2023-05-04

申请号：US17801544

申请日：2021-05-13

Applicant: ISAC RESEARCH INC.

Inventor： Chae Woong KIM ,  Su Han SONG ,  Hyung Sang PARK

IPC: C23C16/455 ,  C23C16/52

Abstract: Provided are powder atomic layer deposition (ALD) equipment capable of increasing deposition uniformity of powder by using a gas supply sequence with or without an impeller or a vibration generator, and a gas supply method thereof, the powder ALD equipment including a process chamber having an accommodation space therein to accommodate powder, a gas supplier for sequentially supplying a plurality of gases to the powder, and a gas exhauster for exhausting, to outside, the gases discharged from the process chamber, wherein the gas supplier includes a gas supply plate, a first gas supply line, a first valve, edge valves, and a gas supply sequence controller.

公开(公告)号：US11534772B2

公开(公告)日：2022-12-27

申请号：US16850611

申请日：2020-04-16

Applicant: HYUNDAI MOTOR COMPANY ,  KIA MOTORS CORPORATION ,  ISAC RESEARCH INC.

Inventor： Woong Pyo Hong ,  Jung Yeon Park ,  Chae Woong Kim ,  Hyun Seok Cha ,  Hyung Sang Park

IPC: B03C3/82 ,  B03C3/36 ,  C23C16/44

Abstract: The present disclosure relates to a trap device for a powder coating apparatus. The trap device includes a body part including an inlet through which exhaust gas containing lost powder is introduced, an outlet through which the exhaust gas is discharged, and an interior space in communication with the inlet and the outlet and a trap part that is located in the interior space of the body part and that traps the lost powder contained in the exhaust gas by a magnetic force.

公开(公告)号：US20180274096A1

公开(公告)日：2018-09-27

申请号：US15934115

申请日：2018-03-23

Applicant: ISAC RESEARCH INC.

Inventor： Hyung Sang PARK ,  Tae Ho YOON ,  Ji Hye KIM

IPC: C23C16/455 ,  H01L21/02

CPC classification number: C23C16/45551 ,  C23C16/45544 ,  C23C16/45578 ,  C23C16/45589 ,  H01L21/0228

Abstract: Disclosed is an atomic layer deposition system and method, the system including a chamber having a first accommodation space to accommodate a first target substrate, and a first gas supplier mounted in the chamber to supply a first gas to the first target substrate, wherein the first gas supplier includes a first fixed block having a rotation space therein and including a (1-1)st passage provided in a first direction of the rotation space and a (1-2)nd passage provided in a second direction of the rotation space, and a first rotatable pipe having a first gas channel therein, having a pipe shape including at least one first gas outlet at a side thereof, and rotatably mounted in the rotation space of the first fixed block to connect the first gas outlet to the (1-1)st or (1-2)nd passage of the first fixed block.

公开(公告)号：US20210162428A1

公开(公告)日：2021-06-03

申请号：US16850611

申请日：2020-04-16

Applicant: HYUNDAI MOTOR COMPANY ,  KIA MOTORS CORPORATION ,  ISAC RESEARCH INC.

Inventor： Woong Pyo Hong ,  Jung Yeon Park ,  Chae Woong Kim ,  Hyun Seok Cha ,  Hyung Sang Park

IPC: B03C3/82 ,  B03C3/36 ,  C23C16/44

Abstract: The present disclosure relates to a trap device for a powder coating apparatus. The trap device includes a body part including an inlet through which exhaust gas containing lost powder is introduced, an outlet through which the exhaust gas is discharged, and an interior space in communication with the inlet and the outlet and a trap part that is located in the interior space of the body part and that traps the lost powder contained in the exhaust gas by a magnetic force.

公开(公告)号：US20240018649A1

公开(公告)日：2024-01-18

申请号：US18148331

申请日：2022-12-29

Applicant: Hyundai Motor Company ,  Kia Corporation ,  ISAC RESEARCH INC.

Inventor： Seung Jeong Oh ,  Woong Pyo Hong ,  Jung Yeon Park ,  Chae Woong Kim ,  Hyung Sang Park

IPC: C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4417 ,  C23C16/45544

Abstract: An embodiment powder-surface treatment apparatus includes a housing defining an internal space, a main chamber installed in the internal space and defining an accommodation space in which a surface treatment process is performable using ALD, an injection unit provided on a first end portion of the main chamber, a plurality of sub-chambers arranged in a stack on top of each other in a multi-step configuration along the accommodation space in the main chamber in a state where an internal space in each of the plurality of sub-chambers is filled with a powder, a discharging unit provided on a second end portion of the main chamber, a loading apparatus configured to load a new sub-chamber into the accommodation space in the main chamber, and an unloading apparatus configured to unload and discharge at least one of the plurality of sub-chambers from the accommodation space to the outside.