公开(公告)号：US08697468B2

公开(公告)日：2014-04-15

申请号：US13443767

申请日：2012-04-10

申请人： Sang-Yeol Kim ,  Il-Seok Park ,  Kyul Han

发明人： Sang-Yeol Kim ,  Il-Seok Park ,  Kyul Han

IPC分类号： H01L33/62

CPC分类号： H01L51/5203 ,  H01L27/3246 ,  H01L51/5092

摘要： An organic light-emitting apparatus includes a substrate; a first electrode formed on the substrate, where the first electrode is a cathode, an electron injection layer formed to contact an upper surface of the first electrode and including Mg, an intermediate layer formed on the electron injection layer and including an organic emission layer, and a second electrode which is formed on the intermediate layer and is an anode.

摘要翻译： 有机发光装置包括：基板; 形成在所述基板上的第一电极，其中所述第一电极为阴极;电子注入层，形成为与所述第一电极的上表面接触并且包括Mg，形成在所述电子注入层上并包括有机发射层的中间层; 以及形成在中间层上并且是阳极的第二电极。

公开(公告)号：US20120138084A1

公开(公告)日：2012-06-07

申请号：US13135758

申请日：2011-07-13

申请人： Kyul Han ,  Mu Hyun Kim ,  Sang Yeol Kim ,  Il Seok Park ,  Hyun Sung Kang

发明人： Kyul Han ,  Mu Hyun Kim ,  Sang Yeol Kim ,  Il Seok Park ,  Hyun Sung Kang

IPC分类号： B08B7/04 ,  B08B5/00

CPC分类号： H01L21/67115 ,  H01L21/67028

摘要： A contaminant cleaning device includes a stage configured to house a substrate; an imaging means configured to obtain an image of a contaminant on the substrate; a control means configured to recognize the image and configured to generate a control signal in accordance with the recognized image; a UV generating means; an irradiation shape forming unit configured to selectively block a passage of UV radiated from the UV generating means to make a UV irradiated shape correspond to a shape of the image recognized in the control means; and an interrupter configured to receive a control signal from the control means to block or allow passage of UV from the UV generating means, wherein the stage is configured to move in accordance with a control signal from the control means to enable a contaminant on the substrate to be positioned in the area to which UV is irradiated.

摘要翻译： 污染物清洁装置包括：被配置为容纳衬底的台; 被配置为获得所述基板上的污染物的图像的成像装置; 控制装置，被配置为识别所述图像并被配置为根据所识别的图像生成控制信号; 紫外线发生装置; 照射形状形成单元，被配置为选择性地阻挡从UV产生装置辐射的UV的通过以使得UV照射的形状对应于在控制装置中识别的图像的形状; 以及断续器，其被配置为从所述控制装置接收控制信号以阻挡或允许UV从所述UV产生装置通过，其中所述级被配置为根据来自所述控制装置的控制信号移动以使得所述衬底上的污染物 被定位在UV被照射的区域中。

公开(公告)号：US07075085B2

公开(公告)日：2006-07-11

申请号：US10869903

申请日：2004-06-18

申请人： Il-Seok Park ,  Sang-Min Park

发明人： Il-Seok Park ,  Sang-Min Park

IPC分类号： G01J5/02

CPC分类号： G01B11/0658 ,  G01J5/0003 ,  G01J2005/0077 ,  G01J2005/0081

摘要： The present invention relates to a method of measuring the thickness of a thin film layer using an infrared thermal imaging system. The object of the present invention is to provide a method of measuring the thickness of a thin film layer fast in such a way as to obtain the two-dimensional (2-D) thickness distribution of the thin film layer at one time by measuring infrared spontaneous light emitted from a target surface using an infrared imaging camera. The present invention includes a means for measuring the thickness of a thin film coated on a flat base surface, which outputs the thickness of the thin film layer based on the emissivity of the base surface and the coating layer and the intensity of the infrared spontaneous light that is measured on the flat target surface and converted into temperature, and a means for measuring the thickness of a thin film layer coated on a curved base surface, which outputs the thickness of the thin film layer while considering directional emissivity attributable to the materials of the base surface and the coating layer.

摘要翻译： 本发明涉及使用红外热成像系统测量薄膜层的厚度的方法。 本发明的目的是提供一种通过测量红外线来一次获得薄膜层的二维（2-D）厚度分布的方式来快速测量薄膜层的厚度。 使用红外成像照相机从目标表面发射的自发光。 本发明包括用于测量涂覆在平坦基面上的薄膜的厚度的装置，其基于基底表面和涂层的发射率和红外自发光的强度输出薄膜层的厚度 在平坦目标表面上测量并转换成温度，以及用于测量涂覆在弯曲基底表面上的薄膜层的厚度的装置，其输出薄膜层的厚度，同时考虑归因于材料的方向发射率 基面和涂层。

公开(公告)号：US20050263706A1

公开(公告)日：2005-12-01

申请号：US10869903

申请日：2004-06-18

申请人： Il-Seok Park ,  Sang-Min Park

发明人： Il-Seok Park ,  Sang-Min Park

IPC分类号： G01B11/06 ,  G01J5/00 ,  G01J5/02

CPC分类号： G01B11/0658 ,  G01J5/0003 ,  G01J2005/0077 ,  G01J2005/0081

摘要： The present invention relates to a method of measuring the thickness of a thin film layer using an infrared thermal imaging system. The object of the present invention is to provide a method of measuring the thickness of a thin film layer fast in such a way as to obtain the two-dimensional (2-D) thickness distribution of the thin film layer at one time by measuring infrared spontaneous light emitted from a target surface using an infrared imaging camera. The present invention includes a means for measuring the thickness of a thin film coated on a flat base surface, which outputs the thickness of the thin film layer based on the emissivity of the base surface and the coating layer and the intensity of the infrared spontaneous light that is measured on the flat target surface and converted into temperature, and a means for measuring the thickness of a thin film layer coated on a curved base surface, which outputs the thickness of the thin film layer while considering directional emissivity attributable to the materials of the base surface and the coating layer.

摘要翻译： 本发明涉及使用红外热成像系统测量薄膜层的厚度的方法。 本发明的目的是提供一种通过测量红外线来一次获得薄膜层的二维（2-D）厚度分布的方式来快速测量薄膜层的厚度。 使用红外成像照相机从目标表面发射的自发光。 本发明包括用于测量涂覆在平坦基面上的薄膜的厚度的装置，其基于基底表面和涂层的发射率和红外自发光的强度输出薄膜层的厚度 在平坦目标表面上测量并转换成温度，以及用于测量涂覆在弯曲基底表面上的薄膜层的厚度的装置，其输出薄膜层的厚度，同时考虑归因于材料的方向发射率 基面和涂层。

公开(公告)号：US20130015491A1

公开(公告)日：2013-01-17

申请号：US13443767

申请日：2012-04-10

申请人： Sang-Yeol Kim ,  Il-Seok Park ,  Kyul Han

发明人： Sang-Yeol Kim ,  Il-Seok Park ,  Kyul Han

IPC分类号： H01L33/62

CPC分类号： H01L51/5203 ,  H01L27/3246 ,  H01L51/5092

摘要： An organic light-emitting apparatus includes a substrate; a first electrode formed on the substrate, where the first electrode is a cathode, an electron injection layer formed to contact an upper surface of the first electrode and including Mg, an intermediate layer formed on the electron injection layer and including an organic emission layer, and a second electrode which is formed on the intermediate layer and is an anode.

摘要翻译： 有机发光装置包括：基板; 形成在所述基板上的第一电极，其中所述第一电极为阴极;电子注入层，形成为与所述第一电极的上表面接触并且包括Mg，形成在所述电子注入层上并包括有机发射层的中间层; 以及形成在中间层上并且是阳极的第二电极。

公开(公告)号：US20120009332A1

公开(公告)日：2012-01-12

申请号：US13180454

申请日：2011-07-11

申请人： Sang-Yeol Kim ,  Il-Seok Park ,  Kyul Han ,  Mu-Hyun Kim

发明人： Sang-Yeol Kim ,  Il-Seok Park ,  Kyul Han ,  Mu-Hyun Kim

IPC分类号： B05D5/06

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/56 ,  H01L21/67173 ,  H01L51/001 ,  H01L51/0011 ,  H01L2227/323

摘要： A method of manufacturing an organic light-emitting display device, which simplifies fabrication processes of the organic light-emitting display device and improves manufacturing yield. This method includes preparing a substrate that has a number of first regions and a second region surrounding the first regions. The substrate is conveyed into a chamber. An organic emission layer is formed in a direction on a surface of the substrate. A first metal layer is formed on the organic emission layer so as to correspond to the first regions, and the organic emission layer formed on the second region is removed.

摘要翻译： 一种制造有机发光显示装置的方法，其简化了有机发光显示装置的制造工艺并提高了制造成品率。 该方法包括制备具有多个第一区域的基板和围绕第一区域的第二区域。 将基板输送到室中。 在基板的表面的方向上形成有机发光层。 在有机发光层上形成与第一区域对应的第一金属层，去除形成在第二区域上的有机发光层。