Method for manufacturing a sputtering target
    1.
    发明申请
    Method for manufacturing a sputtering target 失效
    溅射靶的制造方法

    公开(公告)号:US20090056840A1

    公开(公告)日:2009-03-05

    申请号:US11892755

    申请日:2007-08-27

    CPC classification number: B22D27/06 C21D8/0226 C21D8/0273 C22F1/10 C23C14/3414

    Abstract: A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.

    Abstract translation: 制造溅射靶的方法包括以下步骤:提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭,得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中,同时通过电弧加热将熔融合金的表面保持在熔融状态,直到浇注完成,从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。

    METHOD FOR MANUFACTURING METAL-BASED CERAMIC COMPOSITE TARGET CONTAINING NOBLE METAL
    2.
    发明申请
    METHOD FOR MANUFACTURING METAL-BASED CERAMIC COMPOSITE TARGET CONTAINING NOBLE METAL 审中-公开
    制造金属基陶瓷复合材料靶材的方法

    公开(公告)号:US20090317280A1

    公开(公告)日:2009-12-24

    申请号:US12238477

    申请日:2008-09-26

    CPC classification number: B22F3/15 B22F2998/00 C22C32/0026 B22F1/02

    Abstract: A method for manufacturing a metal-based ceramic composite target containing noble metal is provided, which includes firstly applying a ceramic powder uniformly onto a surface of a magnetic metal powder by using a wet powder mixing process, and drying it to obtain a ceramic-metal composite powder, and then uniformly mixing a noble metal powder with the ceramic-metal powder by using a dry powder mixing process, and finally making the ceramic-metal composite powder into a compact target by using a molding and compacting process. The manufacturing method of the present invention can uniformly mix the powders of the magnetic metal, the ceramic, and the noble metal, and reduce the loss of the noble metal powder in the production process of the target, so as to improve the quality of the target and decrease the production cost thereof.

    Abstract translation: 提供一种含有贵金属的金属系陶瓷复合靶的制造方法,其特征在于,首先使用湿式粉末混合法将陶瓷粉末均匀地涂布在磁性金属粉末的表面上,并干燥,得到陶瓷 - 金属 复合粉末,然后通过使用干粉混合工艺将贵金属粉末与陶瓷 - 金属粉末均匀混合,最后通过使用成型和压实工艺将陶瓷 - 金属复合粉末制成紧凑的靶材。 本发明的制造方法可以均匀地混合磁性金属,陶瓷和贵金属的粉末,并且在目标的生产过程中减少贵金属粉末的损失,从而提高 目标并降低其生产成本。

    Method for manufacturing a sputtering target
    3.
    发明授权
    Method for manufacturing a sputtering target 失效
    溅射靶的制造方法

    公开(公告)号:US07754027B2

    公开(公告)日:2010-07-13

    申请号:US11892755

    申请日:2007-08-27

    CPC classification number: B22D27/06 C21D8/0226 C21D8/0273 C22F1/10 C23C14/3414

    Abstract: A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.

    Abstract translation: 制造溅射靶的方法包括以下步骤:提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭,得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中,同时通过电弧加热将熔融合金的表面保持在熔融状态,直到浇注完成,从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。

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