Method for manufacturing cobalt alloy-based ceramic composite sputtering target
    1.
    发明授权
    Method for manufacturing cobalt alloy-based ceramic composite sputtering target 有权
    制造钴合金陶瓷复合溅射靶的方法

    公开(公告)号:US08366994B2

    公开(公告)日:2013-02-05

    申请号:US12939174

    申请日:2010-11-04

    IPC分类号: C22C32/00

    摘要: A method for manufacturing a cobalt (Co) alloy-based ceramic composite sputtering target is provided. A cobalt ingot and a chromium (Cr) ingot are melted in vacuum and then nebulized to form a cobalt-chromium (CoCr) alloy powder. Additionally, a ceramic powder and a platinum powder are wetly mixed to form a platinum-ceramic (Pt-ceramic) slurry, in which the ceramic powder is applied onto the platinum powder's surface uniformly. Next, the CoCr alloy powder and the Pt-ceramic slurry are wetly mixed to form a CoCrPt-ceramic slurry. Thereafter, the CoCrPt-ceramic slurry is dried, molded and compressed to form the cobalt alloy-based ceramic composite sputtering target. The resulted cobalt alloy-based ceramic composite sputtering target, which has a fine and dense structure, uniform composition and lower magnetic permeability, is beneficial to a magnetron sputter deposition process, as well as a film sputtering process used in the magnetic recording industry.

    摘要翻译: 提供了一种制造钴(Co)合金系陶瓷复合溅射靶的方法。 钴锭和铬(Cr)锭在真空中熔化,然后喷雾形成钴 - 铬(CoCr)合金粉末。 另外,将陶瓷粉末和铂粉末湿式混合以形成铂 - 陶瓷(Pt-陶瓷)浆料,其中将陶瓷粉末均匀地涂覆在铂粉末的表面上。 接着,将CoCr合金粉末和Pt-陶瓷浆料湿混,形成CoCrPt陶瓷浆料。 然后,将CoCrPt陶瓷浆料干燥,成型并压缩,形成钴合金系陶瓷复合溅射靶。 得到的钴合金系陶瓷复合溅射靶具有精细且致密的结构,组成均匀性和较低的磁导率,有利于磁控溅射沉积工艺以及在磁记录工业中使用的薄膜溅射工艺。

    Method for manufacturing a sputtering target
    3.
    发明授权
    Method for manufacturing a sputtering target 失效
    溅射靶的制造方法

    公开(公告)号:US07754027B2

    公开(公告)日:2010-07-13

    申请号:US11892755

    申请日:2007-08-27

    IPC分类号: H01F1/01

    摘要: A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.

    摘要翻译: 制造溅射靶的方法包括以下步骤:提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭,得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中,同时通过电弧加热将熔融合金的表面保持在熔融状态,直到浇注完成,从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。

    METHOD FOR MANUFACTURING COBALT ALLOY-BASED CERAMIC COMPOSITE SPUTTERING TARGET
    5.
    发明申请
    METHOD FOR MANUFACTURING COBALT ALLOY-BASED CERAMIC COMPOSITE SPUTTERING TARGET 有权
    制造基于钴合金的陶瓷复合溅射靶的方法

    公开(公告)号:US20110241253A1

    公开(公告)日:2011-10-06

    申请号:US12939174

    申请日:2010-11-04

    IPC分类号: B28B3/00 B28B1/00

    摘要: A method for manufacturing a cobalt (Co) alloy-based ceramic composite sputtering target is provided. A cobalt ingot and a chromium (Cr) ingot are melted in vacuum and then nebulized to form a cobalt-chromium (CoCr) alloy powder. Additionally, a ceramic powder and a platinum powder are wetly mixed to form a platinum-ceramic (Pt-ceramic) slurry, in which the ceramic powder is applied onto the platinum powder's surface uniformly. Next, the CoCr alloy powder and the Pt-ceramic slurry are wetly mixed to form a CoCrPt-ceramic slurry. Thereafter, the CoCrPt-ceramic slurry is dried, molded and compressed to form the cobalt alloy-based ceramic composite sputtering target. The resulted cobalt alloy-based ceramic composite sputtering target, which has a fine and dense structure, uniform composition and lower magnetic permeability, is beneficial to a magnetron sputter deposition process, as well as a film sputtering process used in the magnetic recording industry.

    摘要翻译: 提供了一种制造钴(Co)合金系陶瓷复合溅射靶的方法。 钴锭和铬(Cr)锭在真空中熔化,然后喷雾形成钴 - 铬(CoCr)合金粉末。 另外,将陶瓷粉末和铂粉末湿式混合以形成铂 - 陶瓷(Pt-陶瓷)浆料,其中将陶瓷粉末均匀地涂覆在铂粉末的表面上。 接着,将CoCr合金粉末和Pt-陶瓷浆料湿混,形成CoCrPt陶瓷浆料。 然后,将CoCrPt陶瓷浆料干燥,成型并压缩,形成钴合金系陶瓷复合溅射靶。 得到的钴合金系陶瓷复合溅射靶具有精细且致密的结构,组成均匀性和较低的磁导率,有利于磁控溅射沉积工艺以及在磁记录工业中使用的薄膜溅射工艺。

    Method for manufacturing a sputtering target
    6.
    发明申请
    Method for manufacturing a sputtering target 失效
    溅射靶的制造方法

    公开(公告)号:US20090056840A1

    公开(公告)日:2009-03-05

    申请号:US11892755

    申请日:2007-08-27

    IPC分类号: C21D1/26 B22D23/00 B22D7/00

    摘要: A method for manufacturing a sputtering target includes the steps of: providing a highly pure matrix material containing a magnetic metal, and a highly pure precious metal ingot material; cleaning the surfaces of the matrix material and the precious metal ingot; vacuum melting the matrix material and the precious metal ingot to obtain a molten alloy; pouring the molten alloy in a mold having a cooling system while maintaining a surface of the molten alloy at a molten state by arc heating until the pouring is finished, thereby forming the molten alloy into a cast blank; hot working the cast blank; and annealing the cast blank after the hot working.

    摘要翻译: 制造溅射靶的方法包括以下步骤:提供含有磁性金属和高纯贵金属锭材料的高纯度基质材料; 清理基体材料和贵金属锭的表面; 真空熔化基体材料和贵金属锭,得到熔融合金; 将熔融合金倾倒在具有冷却系统的模具中,同时通过电弧加热将熔融合金的表面保持在熔融状态,直到浇注完成,从而将熔融合金形成铸坯; 热工作铸坯; 并在热加工后退火铸坯。