摘要:
A self-aligned one transistor-capacitor memory cell is provided which uses an n-channel MOS transistor having separate drain and source regions with a first level polysilicon conductor coupled to the top plate of the capacitor and separate second level polysilicon conductors coupled to the gate and drain of the transistor. A reduction in a dimension of the memory cell is acheived compared to a similar memory cell which uses only one level of conductors.
摘要:
A proximity-based order processing system provides a way for a customer of a restaurant or other retail establishment to set up a default order for food or other goods or services via a web page interface. The customer is issued a portable wireless communication device, such as an active RFID device, having an order-confirmation button. If the button is pressed while the portable unit is in range of a reader unit in the retail establishment, the portable unit transmits an order confirmation signal to the reader unit. Upon receipt of the order confirmation signal, a order handling computer system confirms that a default order on file for the customer and sufficient funds are available in the user's monetary account. If the default order is on file and the funds are sufficient, the customer's order is processed and made ready for pickup. In this manner, the customer need not stand in line to wait to place or pay for an order.
摘要:
In a dynamic MOS (Metal Oxide Semiconductor) random access memory, reverse bias leakage currents which deplete stored charges are reduced by minimizing minority carrier generation-type currents. By so minimizing these currents, the leakage currents become dominated by minority carrier diffusion currents. The memory is ideally formed in an upper semiconductor layer (14) of a layered structure (11). The semiconductor layer (14) is grown epitaxially with a relatively low dopant concentration on a semiconductor substrate (12) with a dopant concentration of the same conductivity type and about three orders of magnitude greater than that of the epitaxially grown layer. The epitaxially grown structure is advantageously suited for the memory circuits in that it may be formed with very low leakage currents. The material further offers by its layered structure a basis for optimizing dynamic memory device characteristics.