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1.发明授权Resonant impedance-matching slow-wave ring structure microwave applicator for plasmas 有权用于等离子体的谐振阻抗匹配慢波环结构微波施加器公开(公告)号：US06175095B1
公开(公告)日：2001-01-16
申请号：US09272690
申请日：1999-03-18
IPC分类号： B23K900
CPC分类号： H01J37/32311 , H01J37/32192 , H05H1/46
摘要： A microwave applicator has exactly six equal length parallel rods equally distributed in 60° angular intervals in a circle, and at circumferential intervals that are one half the wavelength of operation of a microwave power source. The circumference is therefore preferred to be three wavelengths. The top ends of every rod terminate in a top planar shorting ring. The bottom ends of every rod terminate in a bottom planar shorting ring which is perpendicular to each of the rods and which is parallel to the top planar shorting ring. Intermediate to the two planar shorting rings are an upper and lower planar feed ring that are each parallel to the outside planar shorting rings. The upper planar feed ring connects to odd numbered rods and the lower planar feed ring connects to even numbered rods. A ridged tapered waveguide is connected to the feed rings at a point intersected by any one of the rods. A quartz, ceramic, or sapphire plasma tube is passed through the central axis of the planar shorting rings and feed rings. The applicator is tuned by either internal or external means to match its resonant frequency to that of the microwave source such that impedance mismatch reflections are minimized and the energy transferred to the plasma generated within the plasma tube is maximized.
摘要翻译： 微波施加器具有六个相等长度的平行杆，其平均分布在圆形的60个角度间隔中，并且周向间隔为微波功率源的操作波长的一半。 因此，周长优选为三个波长。 每个杆的顶端终止于顶部平面短路环。 每个杆的底端终止于垂直于每个杆并且平行于顶部平面短路环的底部平面短路环。 中间到两个平面短路环是上下平面进料环，每个平行进给环平行于外部平面短路环。 上平面进料环连接到奇数杆，下平面进给环连接到偶数杆。 脊状锥形波导在与任何一个杆相交的点处连接到进给环。 石英，陶瓷或蓝宝石等离子体管穿过平面短路环和馈电环的中心轴线。 施加器通过内部或外部装置调谐以将其谐振频率与微波源的谐振频率相匹配，使得阻抗失配反射最小化，并且传递到等离子体管内产生的等离子体的能量最大化
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2.发明授权Process chamber sleeve with ring seals for isolating individual process modules in a common cluster 失效具有环形密封件的过程室套筒，用于隔离公共集群中的各个过程模块
公开(公告)号：US5667592A
公开(公告)日：1997-09-16
申请号：US633365
申请日：1996-04-16
CPC分类号： H01L21/6719 , C23C14/568 , C23C16/54 , H01L21/67196
摘要： A modular semiconductor wafer processing system comprises a plurality of detachable process reactors and other types of generators that can be attached to any of several ports on the lid of a circular wafer handling chamber. A multiple-spoke single-axis rigid-arm transfer carousel centrally located within the circular wafer handling chamber has access to the respective process areas beneath each port in the lid. A set of independent cylindrical sleeves with sealing rings are provided to rise up from the floor of the circular wafer handling chamber to contact and seal against the lid to isolate each of the process stations. The multiple-spoke single-axis rigid-arm transfer carousel is automatically positioned out of the way before the cylindrical rings are raised and sealed.
摘要翻译： 模块化半导体晶片处理系统包括多个可拆卸工艺反应器和可连接到圆形晶片处理室的盖上的多个端口中的任一个的其它类型的发生器。 中心位于圆形晶片处理室内的多辐条单轴刚性臂转移转盘可进入盖子每个端口下方的相应过程区域。 提供一组具有密封环的独立圆柱形套筒，以从圆形晶片处理室的地板上升，以接触和密封盖子以隔离每个处理站。 在圆柱形环升高和密封之前，多辐条单轴刚性臂传送转盘自动定位在外面。
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公开(公告)号：US06211621B1
公开(公告)日：2001-04-03
申请号：US09272689
申请日：1999-03-18
IPC分类号： H01J724
CPC分类号： H01J37/32522 , H01J37/32256 , H01J37/32357 , H05H1/46
摘要： A microwave energy plasma source comprises a cylinder with a top lid that allows a centrally located plasma tube to be supplied with a process gas. On opposite sides of the cylinder walls are located a pair of push-pull air fans that provide a cooling air flow through the inside chamber of the cylinder. Orthogonal to the pair of fans, a microwave energy applicator is mounted to the cylinder walls and has a ring type slow wave structure which surrounds the plasma tube. The bottoms of the cylinder and the plasma tube are connected through a coupler to a process chamber in which is situated a semiconductor wafer being processed. In alternative embodiments, the cylinder has included a movable planar floor and ceiling between which is formed a tunable microwave cavity. Such top and bottom tuning plates are adjusted such that the microwave source impedance is optimally matched to the microwave applicator terminating impedance by affecting the tuned frequency of the ring type slow wave structure.
摘要翻译： 微波能量等离子体源包括具有顶盖的圆柱体，其允许位于中心的等离子体管被供应处理气体。 在气缸壁的相对侧上设置有一对推拉式风扇，其提供通过气缸内腔的冷却空气流。 与一对风扇正交，微波能量施加器安装在气缸壁上，并具有围绕等离子体管的环形慢波结构。 圆柱体和等离子体管的底部通过耦合器连接到处理室，其中位于正在处理的半导体晶片。 在替代实施例中，气缸包括可移动的平面底板和天花板，在其之间形成可调微波空腔。 通过调节这种顶部和底部调谐板，使得微波源阻抗通过影响环型慢波结构的调谐频率而与微波施加器终端阻抗最佳匹配。
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公开(公告)号：US5662143A
公开(公告)日：1997-09-02
申请号：US648771
申请日：1996-05-16
申请人： James W. Caughran
发明人： James W. Caughran
CPC分类号： C23C16/52 , C23C16/54 , Y10T137/5109 , Y10T137/8376 , Y10T137/87885
摘要： A modular gas box system comprises a series of modules that each connect into upper and lower manifolds that distribute reactive and purge gases through weldments and monoblock valves. A motherboard distributes power, control signals, and pneumatics air to all the plug-in modules. Environmental modules provide vent and purge lines to the process' reaction chambers. An embedded microcomputer manages in situ system and safety diagnostics for each and every module that has been assigned a motherboard address. Each gas module 24 is easy to remove and replace and the pneumatics control motherboard integrates pneumatics distribution, analog-to-digital converters, device controllers and support electronics. Gas module 24s include digital mass flow controllers, analog and digital pressure switches and transducers, gas filters and pneumatic valves.
摘要翻译： 模块化气箱系统包括一系列模块，每个模块连接到通过焊件和整体阀分配反应和吹扫气体的上歧管和下歧管。 主板向所有插件模块分配电源，控制信号和气动空气。 环境模块为过程的反应室提供通风和净化管线。 嵌入式微型计算机为分配了主板地址的每个模块管理原位系统和安全诊断。 每个气体模块24易于拆卸和更换，气动控制主板集成了气动分配，模数转换器，设备控制器和支持电子设备。 气体模块24s包括数字质量流量控制器，模拟和数字压力开关和换能器，气体过滤器和气动阀。
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公开(公告)号：US5863170A
公开(公告)日：1999-01-26
申请号：US633364
申请日：1996-04-16
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677
CPC分类号： H01L21/6719 , H01L21/67196 , H01L21/67745 , Y10S414/137
摘要： A modular semiconductor wafer processing system comprises a plurality of detachable process reactors and other types of generators that can be quick-clamped to any of several ports on the lid of a circular wafer handling chamber. A multiple-spoke single-axis rigid-arm transfer carousel centrally located within the circular wafer handling chamber has access to the respective process areas beneath each port in the lid. A set of independent cylindrical rings are provided to rise up from the floor of the circular wafer handling chamber to contact and seal against the lid to isolate each of the process stations. The multiple-spoke single-axis rigid-arm transfer carousel is automatically positioned out of the way before the cylindrical rings are raised and sealed.
摘要翻译： 模块化半导体晶片处理系统包括多个可拆卸工艺反应器和其他类型的发生器，其可以快速夹紧到圆形晶片处理室的盖上的多个端口中的任何一个端口。 中心位于圆形晶片处理室内的多辐条单轴刚性臂转移转盘可进入盖子每个端口下方的相应过程区域。 提供一组独立的圆柱形环从圆形晶片处理室的地板上升到与盖接触并密封以隔离每个处理站。 在圆柱形环升高和密封之前，多辐条单轴刚性臂传送转盘自动定位在外面。
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公开(公告)号：US5855465A
公开(公告)日：1999-01-05
申请号：US633366
申请日：1996-04-16
IPC分类号： B65G49/07 , H01L21/677
CPC分类号： H01L21/67745 , Y10S414/137 , Y10S414/139
摘要： A semiconductor wafer processing carousel comprises an elevator chamber that accepts cassettes loaded with semiconductor wafers through a removable vacuum lock door, an elevator platform on which the cassettes ride up and down, an elevator drive to automatically position the elevator platform, a lid and a circular wafer handling chamber with an anteroom chamber connection to the elevator chamber. A double-axis wafer transfer arm provides for linear transfer through the anteroom chamber of selected wafers between the cassettes and a first pre-heating and cool-down process station within the circular wafer handling chamber. A multiple-spoke single-axis rigid-arm transfer carousel is centrally located within the circular wafer handling chamber and has access to multiple process stations. A set of independent cylindrical rings are positioned to rise up from the handling chamber bottom of the circular wafer handling chamber to contact and seal against the lid to isolate each of the process stations. A circular port with a diameter larger than the wafer is thus coupled from a detachable process reactor mounted on the lid down deep into the circular wafer handling chamber. The multiple-spoke single-axis rigid-arm transfer carousel is automatically positioned out of the way before the cylindrical rings are raised and sealed.
摘要翻译： 一种半导体晶片处理转盘包括一个电梯室，该电梯室通过一个可拆卸的真空锁门来接纳装有半导体晶片的盒子，一个电梯平台，盒子上下移动，电梯驱动器自动定位电梯平台，一个盖子和一个圆形 晶片处理室具有连接到电梯室的前室。 双轴晶片传送臂提供通过盒之间的选定晶片的前室的线性传输和在圆形晶片处理室内的第一预热和冷却处理站。 多辐射单轴刚性臂转移转盘位于圆形晶片处理室的中心，可进入多个工艺站。 一组独立的圆柱形环被定位成从圆形晶片处理室的处理室底部上升以接触并密封盖子以隔离每个处理站。 因此，直径大于晶片的圆形端口从安装在盖上的可拆卸工艺反应器向下深度地耦合到圆形晶片处理室中。 在圆柱形环升高和密封之前，多辐条单轴刚性臂传送转盘自动定位在外面。
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