公开(公告)号：US6123775A

公开(公告)日：2000-09-26

申请号：US343482

申请日：1999-06-30

申请人： Fangli Hao ,  Rajinder Dhindsa ,  Javad Pourhashemi

发明人： Fangli Hao ,  Rajinder Dhindsa ,  Javad Pourhashemi

IPC分类号： H05H1/46 ,  C23C16/44 ,  C23C16/455 ,  H01J37/32 ,  H01L21/00 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00 ,  C23F1/02

CPC分类号： C23C16/45572 ,  H01J37/3244 ,  H01J37/32522 ,  H01L21/67103

摘要： A component useful for a plasma reaction chamber includes a heat sink such as a temperature-controlled support member and a heated member such as an electrically powered showerhead electrode. The showerhead electrode is peripherally secured to the support member to enclose a gas distribution chamber between a top surface of the electrode and a bottom surface of the support member. A heat transfer member extends between the electrode and the support member and transfers heat from an area of temperature buildup on the top surface of the showerhead electrode to the bottom surface of the support member in order to control the temperature distribution across the showerhead electrode.

摘要翻译： 用于等离子体反应室的部件包括诸如温度控制的支撑构件的散热器和诸如电动喷头电极的加热构件。 淋浴头电极周边地固定到支撑构件上以将气体分配室封闭在电极的顶表面和支撑构件的底表面之间。 传热构件在电极和支撑构件之间延伸并且将热量从喷淋头电极的顶表面上的温度积分区域传递到支撑构件的底表面，以便控制喷头电极两端的温度分布。