PROCESS CAP FOR FLAT SUBSTRATES AND PLANT AND METHOD FOR ONE-SIDED TREATMENT OF FLAT SUBSTRATES
    1.
    发明申请
    PROCESS CAP FOR FLAT SUBSTRATES AND PLANT AND METHOD FOR ONE-SIDED TREATMENT OF FLAT SUBSTRATES 审中-公开
    平面基板和工艺的方法和用于单面处理平板基板的方法

    公开(公告)号:US20130160279A1

    公开(公告)日:2013-06-27

    申请号:US13537604

    申请日:2012-06-29

    IPC分类号: B05C13/00 F26B25/00 C03B35/00

    摘要: A process cap for protecting a top side of a flat substrate includes a cap and a seal. The seal is circumferentially arranged on a circumferential rim of the cap such that the cap effects a liquid-tight and vapor-tight closure between cap and flat substrate when the cap is fitted on a top side of the flat substrate. The process cap touches the flat substrate only in a circumferential rim area of the same, when it is fitted on the flat substrate and defines a fluid-tight space without any openings between process cap and flat substrate.

    摘要翻译: 用于保护平坦基板的顶侧的工艺帽包括盖和密封件。 密封件周向地布置在盖的圆周边缘上,使得当盖安装在平坦基板的顶侧时,盖在盖和平坦基板之间实现液密和气密的封闭。 只有当平板基板安装在平坦的基板上并且限定了流体密封的空间而没有在处理盖和平的基板之间没有任何开口的情况下,处理盖仅在其平坦的基板上触及平面基板。

    DEVICE AND METHOD FOR COATING A SURFACE
    2.
    发明申请
    DEVICE AND METHOD FOR COATING A SURFACE 审中-公开
    用于涂覆表面的装置和方法

    公开(公告)号:US20100279017A1

    公开(公告)日:2010-11-04

    申请号:US12741658

    申请日:2008-11-06

    申请人: Jens Eckstein

    发明人: Jens Eckstein

    IPC分类号: B05D3/02 B05C9/14

    摘要: A device for coating a product includes a provider for providing a liquid containing reagents necessitated for coating. Additionally, the device comprises a transporter for contacting the surface of the product to be coated with the liquid and passing same by the liquid such that the surface to be coated remains in contact with the liquid for a predetermined period of time so as to effect coating thereof.

    摘要翻译: 用于涂覆产品的装置包括用于提供含有需要涂覆的试剂的液体的提供者。 另外,该装置包括一个运送器,用于接触要被涂覆的产品的表面并通过液体使其通过,使得待涂覆的表面保持与液体接触一段预定的时间,从而实现涂覆 其中。