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公开(公告)号：US09655222B2
公开(公告)日：2017-05-16
申请号：US13599494
申请日：2012-08-30
CPC分类号： H05G2/005 , G03F7/70033 , H05G2/006 , H05G2/008 , Y10T29/49815 , Y10T29/49817 , Y10T29/49826 , Y10T29/49865
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a reservoir configured to retain a volume of fuel; a nozzle, in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma; and a contamination filter assembly located in a fuel flow path of the radiation source, upstream of a nozzle outlet, a filter medium of that contamination filter assembly being held in place within the contamination filter assembly by a clamping force provided by one or more objects that at least partially surround the filter medium.
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公开(公告)号：US08638421B2
公开(公告)日：2014-01-28
申请号：US12233000
申请日：2008-09-26
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.
摘要翻译： 描述了一种浸没式光刻设备，其中设置入口以向位于衬底台上的物体（例如衬底）和衬底台之间的空间提供清洁流体。
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公开(公告)号：US20090091716A1
公开(公告)日：2009-04-09
申请号：US12233000
申请日：2008-09-26
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.
摘要翻译： 描述了一种浸没式光刻设备，其中设置入口以向位于衬底台上的物体（例如衬底）和衬底台之间的空间提供清洁流体。
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公开(公告)号：US20130077071A1
公开(公告)日：2013-03-28
申请号：US13599494
申请日：2012-08-30
CPC分类号： H05G2/005 , G03F7/70033 , H05G2/006 , H05G2/008 , Y10T29/49815 , Y10T29/49817 , Y10T29/49826 , Y10T29/49865
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a reservoir configured to retain a volume of fuel; a nozzle, in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma; and a contamination filter assembly located in a fuel flow path of the radiation source, upstream of a nozzle outlet, a filter medium of that contamination filter assembly being held in place within the contamination filter assembly by a clamping force provided by one or more objects that at least partially surround the filter medium.
摘要翻译： 根据本发明的第一方面，提供了一种辐射源，包括：储存器，其构造成保持一定体积的燃料; 喷嘴，其与所述储存器流体连接，并且构造成沿着等离子体形成位置的轨迹引导燃料流; 激光器，被配置为在所述等离子体形成位置处的所述流处引导激光辐射，以在使用中产生辐射产生等离子体; 以及污染过滤器组件，其位于辐射源的燃料流动路径中，在喷嘴出口的上游，该污染过滤器组件的过滤介质通过由一个或多个物体提供的夹紧力保持在污染过滤器组件内的适当位置， 至少部分地围绕过滤介质。
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