公开(公告)号：USD480919S1

公开(公告)日：2003-10-21

申请号：US29168832

申请日：2002-10-08

Applicant: Jin Xue Bin

Designer： Jin Xue Bin

公开(公告)号：US20170293230A1

公开(公告)日：2017-10-12

申请号：US15093843

申请日：2016-04-08

Applicant: Ping Liang ,  Jian Yang ,  Yongtian Wang ,  Wenbo Wu ,  Yue Liu ,  Jin Xue ,  Lei Chen ,  Weijian Cong

Inventor： Ping Liang ,  Jian Yang ,  Yongtian Wang ,  Wenbo Wu ,  Yue Liu ,  Jin Xue ,  Lei Chen ,  Weijian Cong

IPC: G03F7/20 ,  G02B27/00 ,  G02B3/00 ,  G02B19/00 ,  G02B13/16 ,  G02B13/14 ,  G02B5/09 ,  G02B5/00 ,  G02B13/00

CPC classification number: G03F7/70141 ,  G02B3/0056 ,  G02B5/005 ,  G02B5/09 ,  G02B13/0095 ,  G02B13/143 ,  G02B13/16 ,  G02B19/0028 ,  G02B19/0095 ,  G02B27/0012 ,  G03F7/705

Abstract: Provided in the present invention is an adjustment and design method of an illumination system matched with multiple objective lenses in an extreme ultraviolet lithography machine; the illumination system to which the method is applied comprises a light source, a collection lens, a field compound eye, a pupil compound eye and a relay lens group; the method specifically comprises the steps: before a projection objective lens of an extreme ultraviolet lithography machine is replaced, calculating aperture angles of emergent ray of a relay lens A on a meridian plane and a sagittal plane by means of ray tracing; after the projection objective lens of the extreme ultraviolet lithography machine is replaced, taking out a central point of a exit pupil plane as an object point for ray tracing; adjusting inclination angles and positions of the relay lens A and a relay lens B, and adjusting inclination angles of central compound eye units of the pupil compound eye and the field compound eye, till an image plane of a current illumination system approximates to an arc-shaped image plane corresponding to the projection objective lens. By adjusting the illumination system on the basis of the adjustment method of the present invention, an illumination system matched with the projection objective lens system can be obtained, which dramatically reduces the cost of designing a projection lithography machine.

公开(公告)号：USD493332S1

公开(公告)日：2004-07-27

申请号：US29163270

申请日：2002-07-02

Applicant: Jin Xue Bin

Designer： Jin Xue Bin

公开(公告)号：USD475891S1

公开(公告)日：2003-06-17

申请号：US29168755

申请日：2002-10-08

Applicant: Jin Xue Bin

Designer： Jin Xue Bin

公开(公告)号：US20070090116A1

公开(公告)日：2007-04-26

申请号：US11282072

申请日：2005-11-17

Applicant: Jin Xue Bin

Inventor： Jin Xue Bin

IPC: B65D81/38

CPC classification number: B65D81/3874

Abstract: A drinking mug including a rigid liquid container having a continuous side wall, a closed bottom and an open top. An outer sleeve is disposed around the side wall of the container. The outer sleeve includes a bottom portion that extends beyond the closed bottom of the container and that terminates at a bottom edge. A base member is held in contact with the bottom edge of the outer sleeve and spaced from the closed bottom of the container. A foam layer is disposed between the closed bottom of the container and the base member and extends between the outer sleeve and the side wall of the container.

Abstract translation: 一种饮用杯，包括具有连续侧壁，封闭底部和敞开顶部的刚性液体容器。 外套筒围绕容器的侧壁设置。 外套筒包括延伸超出容器的封闭底部并终止于底部边缘的底部部分。 基部构件与外套筒的底边缘保持接触并与容器的封闭底部间隔开。 泡沫层设置在容器的封闭底部和基底构件之间，并且在外套筒和容器的侧壁之间延伸。

公开(公告)号：USD531451S1

公开(公告)日：2006-11-07

申请号：US29219343

申请日：2004-12-15

Applicant: Jin Xue Bin

Designer： Jin Xue Bin

公开(公告)号：US20210389612A1

公开(公告)日：2021-12-16

申请号：US17227457

申请日：2021-04-12

Applicant: Rajeev J. Ram ,  Marc De Cea Falco ,  Jin Xue

Inventor： Rajeev J. Ram ,  Marc De Cea Falco ,  Jin Xue

IPC: G02F1/025 ,  G02F1/015

Abstract: Semiconductor optical modulators are described that utilize bipolar junction transistor (BJT) structure within the optical modulator. The junctions within the BJT can be designed and biased to increase modulator efficiency and speed. An optical mode may be located in a selected region of the BJT structure to improve modulation efficiency. The BJT structure can be included in optical waveguides of interferometers and resonators to form optical modulators.

公开(公告)号：USD533402S1

公开(公告)日：2006-12-12

申请号：US29219344

申请日：2004-12-15

Applicant: Jin Xue Bin

Designer： Jin Xue Bin

公开(公告)号：USD530981S1

公开(公告)日：2006-10-31

申请号：US29219348

申请日：2004-12-15

Applicant: Jin Xue Bin

Designer： Jin Xue Bin

公开(公告)号：USD477968S1

公开(公告)日：2003-08-05

申请号：US29164567

申请日：2002-07-26

Applicant: Jin Xue Bin

Designer： Jin Xue Bin