公开(公告)号：US20050078292A1

公开(公告)日：2005-04-14

申请号：US10925214

申请日：2004-08-25

申请人： Joerg Bruebach

发明人： Joerg Bruebach

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G03F7/7005 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70625

摘要： A lithographic apparatus includes an illumination system for conditioning a projection beam of radiation including components having a first radiation component having a first wavelength and a second radiation component having a second wavelength for reproducing features patterned on a mask. The lithographic apparatus includes an illumination system having an adjustable filter for filtering said beam of radiation, arranged in use, to selectively adjust the proportion of said second radiation component in said beam. Embodiments of the apparatus provide reproduction of both isolated and dense features patterned on the mask.

摘要翻译： 光刻设备包括用于调节投影射束的照明系统，包括具有第一波长的第一辐射分量和具有第二波长的第二辐射分量的投影光束，用于再现在掩模上图案化的特征。 光刻设备包括具有可调节滤光器的照明系统，用于对使用中布置的辐射束进行过滤，以选择性地调节所述光束中所述第二辐射分量的比例。 该设备的实施例提供了在掩模上图案化的孤立和致密特征的再现。

公开(公告)号：US20060126681A1

公开(公告)日：2006-06-15

申请号：US11270898

申请日：2005-11-10

申请人： Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

发明人： Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

IPC分类号： H01S3/13

CPC分类号： B23K26/0613 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/067 ,  G03F7/7055

摘要： A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiation along a first optical axis and further configured to emit one or more corresponding output pulses of radiation along a second optical axis, including a divider disposed along the first optical axis and configured to divide the incoming pulse into a first and a second pulse portion, wherein the divider is further configured to direct the first pulse portion along the second optical axis. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, configured to receive the second pulse portion and to redirect the second portion along the second optical axis. The optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

摘要翻译： 在光刻设备的照明系统中提供脉冲修改单元以减少昂贵的透镜元件的劣化，数十亿的来自激光器的高强度紫外线脉冲被配置成沿第一光轴接收辐射的输入脉冲 被配置为沿着第二光轴发射一个或多个对应的辐射输出脉冲，包括沿着所述第一光轴设置的分配器，并且被配置为将所述输入脉冲分成第一和第二脉冲部分，其中所述除法器还被配置为引导 沿第二光轴的第一脉冲部分。 每个具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，被配置为接收第二脉冲部分并且沿着第二光轴重定向第二部分。 通过脉冲调制器的第二部分的光路比第一部分的光路长，并且分离小于曲率半径。

公开(公告)号：US07432517B2

公开(公告)日：2008-10-07

申请号：US11270898

申请日：2005-11-10

申请人： Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

发明人： Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

IPC分类号： G01R23/02

CPC分类号： B23K26/0613 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/067 ,  G03F7/7055

摘要： A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiation along a first optical axis and further configured to emit one or more corresponding output pulses of radiation along a second optical axis, including a divider disposed along the first optical axis and configured to divide the incoming pulse into a first and a second pulse portion, wherein the divider is further configured to direct the first pulse portion along the second optical axis. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, configured to receive the second pulse portion and to redirect the second portion along the second optical axis. The optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

摘要翻译： 在光刻设备的照明系统中提供脉冲修改单元以减少昂贵的透镜元件的劣化，数十亿的来自激光器的高强度紫外线脉冲被配置成沿第一光轴接收辐射的输入脉冲 被配置为沿着第二光轴发射一个或多个对应的辐射输出脉冲，包括沿着所述第一光轴设置的分配器，并且被配置为将所述输入脉冲分成第一和第二脉冲部分，其中所述除法器还被配置为引导 沿第二光轴的第一脉冲部分。 每个具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，被配置为接收第二脉冲部分并且沿着第二光轴重定向第二部分。 通过脉冲调制器的第二部分的光路比第一部分的光路长，并且分离小于曲率半径。

公开(公告)号：US07230678B2

公开(公告)日：2007-06-12

申请号：US10925214

申请日：2004-08-25

申请人： Joerg Bruebach

发明人： Joerg Bruebach

IPC分类号： G03B27/32 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/7005 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70625

摘要： A lithographic apparatus includes an illumination system for conditioning a projection beam of radiation including components having a first radiation component having a first wavelength and a second radiation component having a second wavelength for reproducing features patterned on a mask. The lithographic apparatus includes an illumination system having an adjustable filter for filtering said beam of radiation, arranged in use, to selectively adjust the proportion of said second radiation component in said beam. Embodiments of the apparatus provide reproduction of both isolated and dense features patterned on the mask.

摘要翻译： 光刻设备包括用于调节投影射束的照明系统，包括具有第一波长的第一辐射分量和具有第二波长的第二辐射分量的投影光束，用于再现在掩模上图案化的特征。 光刻设备包括具有可调节滤光器的照明系统，用于对使用中布置的辐射束进行过滤，以选择性地调节所述光束中所述第二辐射分量的比例。 该设备的实施例提供了在掩模上图案化的孤立和致密特征的再现。