Strong names
    1.
    发明申请
    Strong names 有权
    强名

    公开(公告)号:US20060059350A1

    公开(公告)日:2006-03-16

    申请号:US10925284

    申请日:2004-08-24

    IPC分类号: H04L9/00

    摘要: Systems and methods for using private keys in software development that minimizes the risks of the private key being lost or stolen. A strong name consists of the assembly's identity, e.g., its simple text name, version number, and culture information (if provided), plus a public key and a digital signature. It is generated from an assembly file using the corresponding private key. The private/public key pair is persisting in a password-encrypted file using a standard encryption format that can be made available to everyone. The first time any subsystem of the development environment requires use of the private key contained in an encrypted file format, the developer is prompted to provide the password to decrypt the key. The user supplies the password and the public/private key is imported into a non-exportable key container in the local cryptographic store.

    摘要翻译: 在软件开发中使用私钥的系统和方法可最大限度地减少私钥丢失或被盗的风险。 强大的名字由大会的身份组成,例如其简单的文本名称,版本号和文化信息(如果提供),加上公钥和数字签名。 它是使用相应的私钥从汇编文件生成的。 私钥/公钥对使用可以向所有人提供的标准加密格式持续使用密码加密的文件。 开发环境的任何子系统首次需要使用以加密文件格式包含的私钥时,提示开发者提供密码来解密密钥。 用户提供密码,将公钥/私钥导入到本地加密存储中的不可导出密钥容器中。

    Extensible productivity tool for exposing common classes in application building
    2.
    发明申请
    Extensible productivity tool for exposing common classes in application building 有权
    可扩展生产力工具,用于在应用程序构建中暴露常见类

    公开(公告)号:US20050172265A1

    公开(公告)日:2005-08-04

    申请号:US10767543

    申请日:2004-01-29

    IPC分类号: G06F9/44

    CPC分类号: G06F8/24

    摘要: Architecture for developing an application. The architecture provides an entry point to commonly used classes of an application development framework. A developer begins a project which predefines a set of collection classes. An exposer component includes an identifier component and a compiler for generating accessors to the collected classes. The identifier uses an attribute on a collection class which a compiler dynamically extracts in order to generate accessors to the desired collected classes and compiles the generated collection classes for use in the namespace.

    摘要翻译: 开发应用程序的架构。 该架构提供了应用程序开发框架常用类的入口点。 开发人员开始一个预定义一组集合类的项目。 曝光器组件包括标识符组件和用于生成对所收集的类的访问器的编译器。 标识符使用编译器动态提取的集合类中的属性,以生成所需收集的类的访问器,并编译生成的集合类以用于命名空间。

    Runtime dependency analysis for calculated properties
    5.
    发明授权
    Runtime dependency analysis for calculated properties 有权
    计算属性的运行时依赖性分析

    公开(公告)号:US08356058B2

    公开(公告)日:2013-01-15

    申请号:US12621964

    申请日:2009-11-19

    IPC分类号: G06F7/00 G06F17/30

    摘要: Techniques for determining and tracking dependent properties for a calculated property are provided. A request for a value of a first property is received. The value for the first property is calculated, including accessing values for one or more properties used to calculate the value for the first property. The accessing of the values for the one or more properties may be detected, and the one or more properties may be tracked as dependent properties for the first property in a first set of dependent properties. A change in the value of a second property may subsequently be detected. If the second property is determined to be included in the first set of dependent properties, the value of the first property is invalidated.

    摘要翻译: 提供了用于确定和跟踪计算属性的依赖属性的技术。 接收对第一属性的值的请求。 计算第一个属性的值,包括访问用于计算第一个属性的值的一个或多个属性的值。 可以检测对一个或多个属性的值的访问,并且可以在第一组依赖属性中跟踪第一属性的一个或多个属性作为依赖属性。 可以随后检测第二属性的值的变化。 如果确定第二属性被包括在第一组依赖属性中,则第一属性的值无效。

    RUNTIME DEPENDENCY ANALYSIS FOR CALCULATED PROPERTIES
    6.
    发明申请
    RUNTIME DEPENDENCY ANALYSIS FOR CALCULATED PROPERTIES 有权
    计算性能的运行时间依赖性分析

    公开(公告)号:US20110119681A1

    公开(公告)日:2011-05-19

    申请号:US12621964

    申请日:2009-11-19

    IPC分类号: G06F9/46

    摘要: Techniques for determining and tracking dependent properties for a calculated property are provided. A request for a value of a first property is received. The value for the first property is calculated, including accessing values for one or more properties used to calculate the value for the first property. The accessing of the values for the one or more properties may be detected, and the one or more properties may be tracked as dependent properties for the first property in a first set of dependent properties. A change in the value of a second property may subsequently be detected. If the second property is determined to be included in the first set of dependent properties, the value of the first property is invalidated.

    摘要翻译: 提供了用于确定和跟踪计算属性的依赖属性的技术。 接收对第一属性的值的请求。 计算第一个属性的值,包括访问用于计算第一个属性的值的一个或多个属性的值。 可以检测对一个或多个属性的值的访问,并且可以在第一组依赖属性中跟踪第一属性的一个或多个属性作为依赖属性。 可以随后检测第二属性的值的变化。 如果确定第二属性被包括在第一组依赖属性中,则第一属性的值无效。

    Versioning support in object-oriented programming languages and tools
    7.
    发明申请
    Versioning support in object-oriented programming languages and tools 审中-公开
    面向对象编程语言和工具的版本控制支持

    公开(公告)号:US20050177826A1

    公开(公告)日:2005-08-11

    申请号:US10772992

    申请日:2004-02-05

    CPC分类号: G06F8/71 G06F9/44536

    摘要: A versioning policy included in a target component indicates how the target component is to be accessed, for example, either as a library component or a platform component. A component may be designated as a library component when it is not versioned in a binary compatible manner. When other components request such a component they receive specifically the version of the component they requested. On the other hand, a component may be designated as a platform component when it is versioned in a binary compatible manner. When other components request such a component they may receive the latest upgraded version of the component requested instead. Thus, access to an appropriate version of the component (even a version differing from the requested version) is facilitated. Other embodiments include mechanisms for stratifying component scope based on different processing levels.

    摘要翻译: 目标组件中包含的版本控制策略指示如何访问目标组件,例如,作为库组件或平台组件。 当组件不以二进制兼容的方式进行版本化时,组件可以被指定为库组件。 当其他组件请求这样的组件时,他们会专门接收他们所要求的组件的版本。 另一方面,当以二进制兼容的方式版本化时,组件可以被指定为平台组件。 当其他组件请求这样的组件时,他们可能会收到要求的组件的最新升级版本。 因此,便于访问组件的适当版本(甚至与所请求的版本不同的版本)。 其他实施例包括基于不同处理级别对组件范围进行分层的机制。

    Method for hardening a photoresist material formed on a substrate
    9.
    发明授权
    Method for hardening a photoresist material formed on a substrate 失效
    硬化形成在基板上的光致抗蚀剂材料的方法

    公开(公告)号:US6121158A

    公开(公告)日:2000-09-19

    申请号:US910308

    申请日:1997-08-13

    IPC分类号: G03F7/40 H01L21/027 H01L21/31

    CPC分类号: G03F7/40

    摘要: A method for hardening a photoresist material formed on a semiconductor substrate comprising the steps of coating a surface of a substrate of a wafer with a layer of photoresist material. Next, the layer of photoresist material disposed on the surface of the substrate of the wafer is masked, exposed, and developed to provide a patterned photoresist material. The patterned developed photoresist material layer is then inspected for critical dimensions, linewidths, and other dimensional characteristics. After the inspection, UV radiation is used to cure the patterned developed photoresist material layer to provide a hardened patterned developed photoresist material layer which is disposed on the surface of the substrate of the wafer. Next, the hardened patterned developed photoresist material layer is implanted from a first implant direction with an inert species material such as argon. Following the implantation step, the first implant direction is incremented 90 degrees to a second implant direction. The hardened patterned developed photoresist material layer is then implanted from the second implant direction with an identical dose of argon. Then, the second implant direction is incremented by another 90 degrees. Two addition implants are performed each from a different implant direction such that the hardened patterned developed photoresist material layer is implanted with equivalent doses of argon from four implant directions each angularly spaced apart by 90 degrees. After implantation, unmasked portions of the substrate of the wafer are etched. Next, the hardened patterned developed photoresist material layer is stripped from the surface of the substrate.

    摘要翻译: 一种用于硬化形成在半导体衬底上的光致抗蚀剂材料的方法,包括以下步骤:用光致抗蚀剂材料层涂覆晶片的衬底的表面。 接下来,将掩模,暴露和显影设置在晶片的基板的表面上的光致抗蚀剂材料层以提供图案化的光致抗蚀剂材料。 然后对图案化显影的光致抗蚀剂材料层进行临界尺寸,线宽和其它尺寸特性的检查。 在检查之后,使用UV辐射来固化图案化显影的光致抗蚀剂材料层,以提供设置在晶片的基板的表面上的硬化的图案化显影的光致抗蚀剂材料层。 接下来,用惰性物质材料如氩气从第一注入方向注入硬化的图案化显影的光致抗蚀剂材料层。 在植入步骤之后,第一植入方向与第二植入方向相加90度。 然后用相同剂量的氩从第二注入方向注入硬化的图案化显影的光致抗蚀剂材料层。 然后,第二植入方向增加另一个90度。 从不同的植入方向进行两个加入植入物,使得硬化的图案化显影的光致抗蚀剂材料层从四个注入方向上注入相同剂量的氩,每个角度间隔开90度。 在植入之后,蚀刻晶片的衬底的未屏蔽部分。 接下来,将硬化的图案化显影的光致抗蚀剂材料层从基板的表面剥离。