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公开(公告)号:US5093151A
公开(公告)日:1992-03-03
申请号:US448337
申请日:1989-12-11
申请人: Hendrikus van den Berg , Udo Konig , Ralf Tabersky , Josef Blum
发明人: Hendrikus van den Berg , Udo Konig , Ralf Tabersky , Josef Blum
IPC分类号: C22C29/08 , B26D1/00 , C22C29/06 , C22C29/10 , C22C29/16 , C23C16/32 , C23C16/34 , C23C16/36 , C23C16/50 , C23C16/515 , C23C30/00 , G11B23/20
CPC分类号: G11B23/20 , B26D1/0006 , C23C16/32 , C23C16/34 , C23C16/36 , C23C16/515 , C23C30/005 , B26D2001/002 , B26D2001/0046 , B26D2001/0053 , B26D2001/0066
摘要: A plasma-activated CVD process provides improved adhesion of the coated surface layers and employs, as the plasma exciting source, a pulsed direct voltage and a residual direct voltage which remains during the pulse intervals. The residual direct voltage is equal to or greater than the lowest ionization potential of the gases participating in the CVD process, but is no more than 50% of the maximum value of the pulsed direct voltage. The total thickness of the layer(s) does not exceed 30 .mu.m and the temperature of the basic tool body during the coating process is reduced, compared to prior art plasma CVD processes, and ranges from between 400.degree. to 800.degree. C., and is preferably kept below 600.degree. C.
摘要翻译: 等离子体激活的CVD工艺提供了改进的涂覆表面层的粘附性,并且使用等离子体激发源中的脉冲直流电压和在脉冲间隔期间保留的残余直流电压。 剩余直流电压等于或大于参与CVD工艺的气体的最低电离电位,但不超过脉冲直流电压的最大值的50%。 与现有技术的等离子体CVD工艺相比,层的总厚度不超过30μm,并且涂覆过程中基础工具体的温度降低,范围为400-800℃, 优选保持在600℃以下。
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公开(公告)号:US3981644A
公开(公告)日:1976-09-21
申请号:US545293
申请日:1975-01-29
申请人: Josef Blum , Heinz Lamm , Alfred Sprang
发明人: Josef Blum , Heinz Lamm , Alfred Sprang
IPC分类号: F01C19/02
CPC分类号: F01C19/02
摘要: A sintered hard metal sealing strip particularly for constituting a radial seal in a rotary internal combustion engine, includes a hollow body with longitudinal ends each closed off by a sintered hard metal end face forming part of the hollow body.
摘要翻译: 特别是用于构成旋转内燃机的径向密封的烧结硬质金属密封条包括中空体,纵向端部由形成中空体的一部分的烧结硬质金属端面封闭。
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公开(公告)号:US2852794A
公开(公告)日:1958-09-23
申请号:US52680055
申请日:1955-08-08
申请人: JOSEF BLUM
发明人: JOSEF BLUM
IPC分类号: A47L13/146
CPC分类号: A47L13/146
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公开(公告)号:US3166774A
公开(公告)日:1965-01-26
申请号:US29077263
申请日:1963-06-26
申请人: JOSEF BLUM
发明人: JOSEF BLUM
IPC分类号: A47L13/14 , A47L13/146
CPC分类号: A47L13/146 , A47L13/14
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公开(公告)号:US5223337A
公开(公告)日:1993-06-29
申请号:US797113
申请日:1991-11-21
申请人: Hendrikus van den Berg , Udo Konig , Ralf Tabersky , Josef Blum
发明人: Hendrikus van den Berg , Udo Konig , Ralf Tabersky , Josef Blum
CPC分类号: C23C16/34 , B26D1/0006 , C23C16/32 , C23C16/36 , C23C16/515 , C23C30/005 , G11B23/20 , B26D2001/002 , B26D2001/0046 , B26D2001/0053 , B26D2001/0066 , Y10T407/27 , Y10T428/265
摘要: A tool having an extended service lift and including a hard metal body, and at least one surface layer composed of at least one hard substance selected from the group consisting of carbides, nitrides, and carbonitrides of titanium and zirconium, and having a chlorine content ranging from a finite amount up to 4 mass percent, the tool being produced by plasma-activated CVD process including: a. positioning the hard metal body in a CVD chamber having means for supplying direct voltage thereto, the hard metal body being connected to the direct voltage supplying means as a cathode thereof, b. introducing into the CVD chamber a reactive gas mixture including a nitrogen-containing substance, a carbon-containing substance, and at least one compound containing at least one of titanium and zirconium, and c. exciting plasma formation at the hard metal body and coating same by chemical vapor deposition by applying a pulsed direct voltage and a residual direct voltage thereto, the residual direct voltage having a magnitude which is at least equal to the lowest ionization potential of any gas in the reactive gas mixture but does not exceed 50% of the maximum value of the pulsed direct voltage.
摘要翻译: 一种具有延伸的服务提升并且包括硬质金属体的工具,以及至少一个由至少一种硬质物质组成的表层,所述至少一种硬质物质选自由碳化物,氮化物和钛和锆的碳氮化物组成的组,并且具有范围 从有限量到4质量%,该工具通过等离子体激活CVD工艺生产,包括:a。 b。将硬金属体定位在具有用于直接供电的装置的CVD室中,硬金属体作为其阴极连接到直流供电装置。 将包括含氮物质,含碳物质和至少一种含有钛和锆中的至少一种的化合物的反应性气体混合物引入CVD室中,c。 通过施加脉冲直流电压和剩余直流电压,在硬质金属体上激发等离子体形成并通过化学气相沉积来涂覆,剩余直流电压的幅度至少等于其中的任何气体的最低电离电位 反应气体混合物,但不超过脉冲直流电压的最大值的50%。
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公开(公告)号:US4626464A
公开(公告)日:1986-12-02
申请号:US603916
申请日:1984-04-25
申请人: Johannes Jachowski , Helmut Klasing , Josef Blum , Paul Pant
发明人: Johannes Jachowski , Helmut Klasing , Josef Blum , Paul Pant
IPC分类号: C22C32/00 , B22D19/00 , B22D19/14 , B32B15/01 , C22C1/10 , C22C33/02 , C22C33/04 , C22C38/00 , B32B15/04 , B22C9/02
CPC分类号: C22C33/0292 , B22D19/14 , C22C1/1036 , Y10T428/24942 , Y10T428/2982
摘要: A wear resistant compound body is disclosed which is comprised of a metallic basic material and has a wear resistant zone which includes hard substance and/or hard metal particles in addition to the basic material. The basic material is composed of0.001 to 1.5 weight percent carbon,0.5 to 8 weight percent boron,1 to 8 weight percent niobium,0.2 to 6 weight percent chromium,0 to 30 weight percent nickel,0 to 10 weight percent manganese,0 to 6 weight percent vanadium,0 to 5 weight percent molybdenum,0 to 5 weight percent silicon, the remainder being iron.Also disclosed is a casting process for producing the compound body.
摘要翻译: 公开了一种耐磨复合体,其由金属基材构成,并具有包含硬质和/或硬质金属颗粒以外的基础材料的耐磨区。 基本材料由0.001〜1.5重量%的碳,0.5〜8重量%的硼,1〜8重量%的铌,0.2〜6重量%的铬,0〜30重量%的镍,0〜10重量%的锰,0〜 6重量%的钒,0至5重量%的钼,0至5重量%的硅,余量为铁。 还公开了一种用于生产复合体的铸造方法。
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