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1.发明授权Zr-Ti-Ni (Cu) based brazing filler alloy compositions with lower melting point for the brazing of titanium alloys 有权用于钛合金钎焊的熔点较低的Zr-Ti-Ni（Cu）基钎焊合金组合物公开(公告)号：US08486330B2
公开(公告)日：2013-07-16
申请号：US12672675
申请日：2008-08-07
申请人： Seung-Yong Shin , Dong-Myoung Lee , Ju-Hyun Sun , Yong-Hwan Kim , Dong-Han Kang
发明人： Seung-Yong Shin , Dong-Myoung Lee , Ju-Hyun Sun , Yong-Hwan Kim , Dong-Han Kang
IPC分类号： C22C16/00
摘要： Disclosed is Zr—Ti—Ni(Cu)-based filler alloy composition having low melting point for brazing titanium and titanium alloys. The Zr—Ti—Ni(Cu)-based alloy composition is expressed as: ZraTibNic (Formula 1) where a, b and c denote atomic % of Zr, Ti and Ni, respectively; 47≦a≦52; 24≦b≦30; 22≦c≦26; and 0.3
摘要翻译： 公开了用于钎焊钛和钛合金的具有低熔点的Zr-Ti-Ni（Cu）基填充合金组合物。 Zr-Ti-Ni（Cu）基合金组成表示为：ZraTibNic（式1）其中a，b和c分别表示Zr，Ti和Ni的原子％; 47 @ a @ 52; 24 @ b @ 30; 22 @ c @ 26; 和0.3
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2.发明申请ZR-TI-NI (CU) BASED BRAZING FILLER ALLOY COMPOSITIONS WITH LOWER MELTING POINT FOR THE BRAZING OF TITANIUM ALLOYS 有权基于ZR-TI-NI（CU）的具有下拉熔融点的熔融填充合金组合物用于钛合金的烧结公开(公告)号：US20120275947A1
公开(公告)日：2012-11-01
申请号：US13541582
申请日：2012-07-03
申请人： SEUNG-YONG SHIN , DONG-MYOUNG LEE , JU-HYUN SUN , YONG-HWAN KIM , DONG-HAN KANG
发明人： SEUNG-YONG SHIN , DONG-MYOUNG LEE , JU-HYUN SUN , YONG-HWAN KIM , DONG-HAN KANG
摘要： Zr—Ti—Ni(Cu)-based filler alloy composition having low melting point for brazing titanium and titanium alloys is expressed as: ZraTibNic (Formula 1) where a,b and c denote atomic % of Zr, Ti and Ni, respectively; 47≦a≦52; 24≦b≧30; 22≦c≦26; and 0.3
摘要翻译： 用于钎焊钛和钛合金的具有低熔点的Zr-Ti-Ni（Cu）基填充合金组合物表示为：ZraTibNic（式1）其中a，b和c分别表示Zr，Ti和Ni的原子％; 47＆nlE; a＆nlE; 52; 24＆nlE;b≥30; 22＆nlE; c＆nlE; 26; 和0.3
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3.发明申请ZR-TI-NI (CU) BASED BRAZING FILLER ALLOY COMPOSITIONS WITH LOWER MELTING POINT FOR THE BRAZING OF TITANIUM ALLOYS 有权基于ZR-TI-NI（CU）的具有下拉熔融点的熔融填充合金组合物用于钛合金的烧结公开(公告)号：US20110211987A1
公开(公告)日：2011-09-01
申请号：US12672675
申请日：2008-08-07
申请人： Seung-Yong Shin , Dong-Myoung Lee , Ju-Hyun Sun , Yong-Hwan Kim , Dong-Han Kang
发明人： Seung-Yong Shin , Dong-Myoung Lee , Ju-Hyun Sun , Yong-Hwan Kim , Dong-Han Kang
摘要： Disclosed is Zr—Ti—Ni (Cu)-based filler alloy composition having low melting point for brazing titanium and titanium alloys. The Zr—Ti—Ni (Cu)-based alloy composition is expressed as: ZraTibNic (Formula 1) where a,b and c denote atomic % of Zr, Ti and Ni, respectively; 47
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4.发明授权Zr—Ti—Ni (Cu) based brazing filler alloy compositions with lower melting point for the brazing of titanium alloys 有权用于钛合金钎焊的熔点较低的Zr-Ti-Ni（Cu）基钎焊合金组合物公开(公告)号：US08691142B2
公开(公告)日：2014-04-08
申请号：US13541582
申请日：2012-07-03
申请人： Seung-Yong Shin , Dong-Myoung Lee , Ju-Hyun Sun , Yong-Hwan Kim , Dong-Han Kang
发明人： Seung-Yong Shin , Dong-Myoung Lee , Ju-Hyun Sun , Yong-Hwan Kim , Dong-Han Kang
IPC分类号： C22C16/00
摘要： Zr—Ti—Ni(Cu)-based filler alloy composition having low melting point for brazing titanium and titanium alloys is expressed as: ZraTibNic (Formula 1) where a, b and c denote atomic % of Zr, Ti and Ni, respectively; 47≦a≦52; 24≦b≦30; 22≦c≦26; and 0.3
摘要翻译： 用于钎焊钛和钛合金的具有低熔点的Zr-Ti-Ni（Cu）基填充合金组合物表示为：ZraTibNic（式1）其中a，b和c分别表示Zr，Ti和Ni的原子％; 47＆nlE; a＆nlE; 52; 24＆nlE; b＆nlE; 30; 22＆nlE; c＆nlE; 26; 和0.3
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5.发明申请SPUTTERING TARGET OF MULTI-COMPONENT SINGLE BODY AND METHOD FOR PREPARATION THEREOF, AND METHOD FOR PRODUCING MULTI-COMPONENT ALLOY-BASED NANOSTRUCTURED THIN FILMS USING SAME 审中-公开多组分单体的溅射目标及其制备方法以及使用其制备多组分合金的纳米结构薄膜的方法公开(公告)号：US20120247948A1
公开(公告)日：2012-10-04
申请号：US13510708
申请日：2010-11-19
申请人： Seung Yong Shin , Kyoung II Moon , Ju Hyun Sun , Chang Hun Lee , Jung Chan Bae
发明人： Seung Yong Shin , Kyoung II Moon , Ju Hyun Sun , Chang Hun Lee , Jung Chan Bae
CPC分类号： C23C14/0036 , B22D7/005 , B22D21/00 , B22F2998/10 , C22C1/045 , C22C16/00 , C22C45/10 , C23C14/025 , C23C14/06 , C23C14/0688 , C23C14/3414 , B22F3/02 , B22F3/1035 , B22F9/082
摘要： The present invention relates to a sputtering target of a multi-component single body, a preparation method thereof, and a method for fabricating a multi-component alloy-based nanostructured thin film using the same. The sputtering target according to the present invention comprises an amorphous or partially crystallized glass-forming alloy system composed of a nitride forming metal element, which is capable of reacting with nitrogen to form a nitride, and a non-nitride forming element which has no or low solid solubility in the nitride forming metal element and does not react with nitrogen or has low reactivity with nitrogen, wherein the nitrogen forming metal element comprises at least one element selected from Ti, Zr, Hf, V, Nb, Ta, Cr, Y, Mo, W, Al, and Si, and the non-nitride forming element comprises at least one element selected from Mg, Ca, Sc, Ni, Cu, Ag, In, Sn, La, Au, and Pb.
摘要翻译： 本发明涉及多组分单体的溅射靶，其制备方法和使用其的多组分合金基纳米结构薄膜的制造方法。 根据本发明的溅射靶包括由氮化物形成金属元素组成的无定形或部分结晶的玻璃形成合金系统，该氮化物形成金属元素能够与氮反应以形成氮化物，以及非氮化物形成元件， 在氮化物形成金属元素中具有低固溶度并且不与氮反应或与氮具有低反应性，其中形成氮的金属元素包括选自Ti，Zr，Hf，V，Nb，Ta，Cr，Y中的至少一种元素 Mo，W，Al和Si，非氮化物形成元素包括选自Mg，Ca，Sc，Ni，Cu，Ag，In，Sn，La，Au和Pb中的至少一种元素。
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