公开(公告)号：US12075898B2

公开(公告)日：2024-09-03

申请号：US16969095

申请日：2019-04-10

Applicant: LG CHEM, LTD.

Inventor： Yong Chan Kim ,  Ki Hwan Kim ,  Nansra Heo ,  Jeong Woo Shon ,  Pilsung Jo

IPC: A45D33/18 ,  A45D34/00 ,  A45D40/00 ,  B29C45/00 ,  B29C45/26 ,  B32B3/30 ,  B32B7/023 ,  B32B15/08 ,  B32B27/06 ,  B44F1/02 ,  B44F1/08 ,  C01B21/082 ,  C08J7/04 ,  G02B5/00 ,  G02B5/22 ,  B29C45/16 ,  B29K101/00 ,  B65D1/02 ,  C23C14/00

CPC classification number: A45D33/18 ,  A45D34/00 ,  A45D40/00 ,  B29C45/0001 ,  B29C45/26 ,  B32B3/30 ,  B32B7/023 ,  B32B15/08 ,  B32B27/06 ,  B44F1/02 ,  B44F1/08 ,  C01B21/0825 ,  C08J7/0423 ,  G02B5/003 ,  G02B5/223 ,  A45D2034/007 ,  A45D2040/0012 ,  A45D2200/053 ,  B29C45/1679 ,  B29K2101/00 ,  B29K2901/12 ,  B29K2995/002 ,  B32B2255/28 ,  B32B2307/4026 ,  B32B2307/416 ,  B32B2439/40 ,  B32B2451/00 ,  B65D1/0207 ,  C08J2367/02 ,  C23C14/0036

Abstract: The present application relates to a decorative member including a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on one surface of the color developing layer, wherein the light absorbing layer includes a copper oxide (CuaOx).

公开(公告)号：US20240274728A1

公开(公告)日：2024-08-15

申请号：US18439921

申请日：2024-02-13

Applicant: KingRay Technology Co., Ltd.

Inventor： Cheng-Hsing Tsou ,  Wei-Hao Cheng ,  Pei-Yuan Ni

IPC: H01L31/0216 ,  C23C14/00 ,  G02B5/20

CPC classification number: H01L31/0216 ,  C23C14/0036 ,  G02B5/208

Abstract: The present invention discloses an optical bandpass filter structure targeting an arbitrary combination of the spectral ranges of R (red), G (green), B (blue) and IR (infrared) light, which comprises a substrate that is a wafer-based semiconductor sensing element, and a filter layer that is formed on one side of the substrate. The filter layer includes a plurality of basic units organized as a two-dimensional array, in which each of the basic units is composed of a plurality of pixel filter films fabricated by a vacuum coating method.

公开(公告)号：US20240209493A1

公开(公告)日：2024-06-27

申请号：US18557430

申请日：2022-03-21

Applicant: Hydromecanique Et Frottement

Inventor： Christophe Heau ,  Maxime Villard

IPC: C23C14/34 ,  C23C14/00 ,  C23C14/02 ,  C23C14/06 ,  C23C14/35 ,  C23C14/50 ,  G21C3/07 ,  G21C21/02 ,  H01J37/32 ,  H01J37/34

CPC classification number: C23C14/345 ,  C23C14/0036 ,  C23C14/025 ,  C23C14/0641 ,  C23C14/357 ,  C23C14/505 ,  G21C3/07 ,  G21C21/02 ,  H01J37/3244 ,  H01J37/3405 ,  H01J37/3426 ,  H01J2237/332

Abstract: The invention relates to a method for depositing a chromium-based material from a target onto a metal substrate, by continuous magnetron sputtering, using a plasma generated in a gas.
According to the invention:



the ratio between the flow of gaseous ions directed toward the substrate and the flow of neutral chromium atoms directed toward the substrate is adjusted to between 0.5 and 1.7; and
a bias voltage of between −50V and −100V is applied to the substrates.

公开(公告)号：US20240158954A1

公开(公告)日：2024-05-16

申请号：US17772972

申请日：2020-10-27

Applicant: TOSOH CORPORATION ,  National Institute for Materials Science

Inventor： Yuya TSUCHIDA ,  Yuya SUEMOTO ,  Yoshihiro UEOKA ,  Masami MESUDA ,  Hideto KURAMOCHI ,  Takahiro NAGATA ,  Liwen SANG ,  Toyohiro CHIKYOW

IPC: C30B29/68 ,  C23C14/00 ,  C23C14/02 ,  C23C14/06 ,  C23C14/34 ,  C23C14/35 ,  C30B23/02 ,  C30B25/06 ,  C30B25/18 ,  C30B29/40 ,  H01L21/02 ,  H01L29/20 ,  H01L29/205 ,  H01L33/32 ,  H01S5/02

CPC classification number: C30B29/68 ,  C23C14/0036 ,  C23C14/021 ,  C23C14/0617 ,  C23C14/3407 ,  C23C14/35 ,  C30B23/025 ,  C30B25/06 ,  C30B25/186 ,  C30B29/403 ,  C30B29/406 ,  H01L21/02381 ,  H01L21/0254 ,  H01L21/02631 ,  H01L21/02661 ,  H01L29/2003 ,  H01L29/205 ,  H01L33/32 ,  H01S5/021

Abstract: The present invention provides: a multilayer film structure which has high crystallinity and planarity; and a method for producing this multilayer film structure. This multilayer film structure is provided with: an Si (111) substrate; a first thin film that is arranged on the Si (111) substrate, while being formed of a nitride material and/or aluminum; and a second thin film that is arranged on the first thin film, while being formed of a nitride material. An amorphous layer having a thickness of 0 nm or more but less than 1.0 nm are present on the Si (111) substrate; and the full width at half maximum (FWHM) of a rocking curve of the (0002) plane at the surface of this multilayer film structure is 1.50° or less.

公开(公告)号：US11971564B2

公开(公告)日：2024-04-30

申请号：US16768289

申请日：2018-07-04

Applicant: LG CHEM, LTD.

Inventor： Pilsung Jo ,  Song Ho Jang ,  Yong Chan Kim ,  Jeong Woo Shon ,  Jin Suk Song ,  Ki Hwan Kim

IPC: C03C17/245 ,  A45C11/00 ,  B44F1/04 ,  B44F1/08 ,  C23C14/00 ,  C23C14/18 ,  C23C14/20 ,  C23C14/34 ,  G02B5/08 ,  G02B5/26 ,  B44C3/02

CPC classification number: G02B5/26 ,  A45C11/00 ,  B44F1/045 ,  B44F1/08 ,  C03C17/245 ,  C23C14/0036 ,  C23C14/185 ,  C23C14/205 ,  C23C14/34 ,  G02B5/085 ,  A45C2011/002 ,  B44C3/02 ,  C03C2217/72 ,  C03C2218/11 ,  C03C2218/155

Abstract: A decoration element is described. The decoration element includes a light reflective layer; a light absorbing layer provided on the light reflective layer; and a color developing layer comprising a color film, wherein the color developing layer is provided: on a surface of the light reflective layer opposite to a surface of the light reflective layer facing the light absorbing layer; between the light reflective layer and the light absorbing layer; or on a surface of the light absorbing layer opposite to a surface of the light absorbing layer facing the light reflective layer.

公开(公告)号：US11940636B2

公开(公告)日：2024-03-26

申请号：US16966167

申请日：2019-06-14

Applicant: LG CHEM, LTD.

Inventor： Yong Chan Kim ,  Ki Hwan Kim ,  Nansra Heo ,  Jeong Woo Shon ,  Pilsung Jo

IPC: G02B5/04 ,  B32B15/20 ,  C03C17/245 ,  C08J7/04 ,  C23C14/00 ,  G02B5/00 ,  G02B5/26 ,  G02B5/28 ,  A45D33/18 ,  A45D34/00 ,  A45D40/00 ,  B29C45/26 ,  B32B15/082

CPC classification number: G02B5/045 ,  B32B15/20 ,  C03C17/245 ,  C08J7/0423 ,  C23C14/0036 ,  G02B5/003 ,  G02B5/26 ,  G02B5/285 ,  A45D33/18 ,  A45D34/00 ,  A45D2034/007 ,  A45D40/00 ,  A45D2040/0012 ,  B29C45/26 ,  B29K2901/12 ,  B29K2995/002 ,  B32B15/082 ,  B32B2307/4023 ,  B32B2307/416 ,  B32B2311/04 ,  B32B2311/08 ,  B32B2311/18 ,  B32B2311/22 ,  B32B2311/24 ,  B32B2439/00 ,  C03C2217/72 ,  C03C2218/155 ,  C08J2367/02

Abstract: The present disclosure relates to a decoration member comprising: a color expression layer comprising a light reflection layer and a light absorption layer provided on the light reflection layer; and a substrate provided on one surface of the color expression layer, in which the light absorption layer comprises a copper nickel oxide (CuaNibOx).

公开(公告)号：US11929512B2

公开(公告)日：2024-03-12

申请号：US16420890

申请日：2019-05-23

Applicant: The Board of Trustees of the Leland Stanford Junior University

Inventor： Melissa E. Kreider ,  Michaela Burke Stevens ,  Alessandro Gallo ,  Hadi Abroshan ,  Seoin Back ,  Samira Siahrostami ,  Jens K. Nørskov ,  Laurie A. King ,  Thomas Francisco Jaramillo

IPC: H01M4/90 ,  C23C14/00 ,  C23C14/06 ,  H01M4/88 ,  H01M4/86

CPC classification number: H01M4/9075 ,  C23C14/0036 ,  C23C14/0641 ,  H01M4/8853 ,  H01M4/8871 ,  H01M4/9016 ,  H01M2004/8689

Abstract: An electrode catalyst for an Oxygen Reduction Reaction (ORR) is provided that includes a transition metal nitride layer on a substrate, an ORR surface oxide layer deposited on the transition metal nitride layer, where the ORR surface oxide layer includes from sub-monolayer to 20 surface oxide monolayers.

公开(公告)号：US11906760B2

公开(公告)日：2024-02-20

申请号：US17058584

申请日：2019-06-17

Applicant: LG CHEM, LTD.

Inventor： Yong Chan Kim ,  Ki Hwan Kim

IPC: G02B5/04 ,  C08J7/04 ,  C03C17/245 ,  G02B5/00 ,  G02B5/26 ,  G02B5/28 ,  B32B15/20 ,  C23C14/00 ,  A45D33/18 ,  A45D34/00 ,  A45D40/00 ,  B29C45/26 ,  B32B15/082

CPC classification number: G02B5/045 ,  B32B15/20 ,  C03C17/245 ,  C08J7/0423 ,  C23C14/0036 ,  G02B5/003 ,  G02B5/26 ,  G02B5/285 ,  A45D33/18 ,  A45D34/00 ,  A45D40/00 ,  A45D2034/007 ,  A45D2040/0012 ,  B29C45/26 ,  B29K2901/12 ,  B29K2995/002 ,  B32B15/082 ,  B32B2307/4023 ,  B32B2307/416 ,  B32B2311/04 ,  B32B2311/08 ,  B32B2311/18 ,  B32B2311/22 ,  B32B2311/24 ,  B32B2439/00 ,  C03C2217/72 ,  C03C2218/155 ,  C08J2367/02

Abstract: This specification relates to a decoration member including: a substrate; a pattern layer comprising two or more unit pattern provided on one surface of the substrate; and an inorganic layer formed on the pattern layer, in which the inorganic layer includes a region in which a thickness t(x) of the inorganic layer formed on each unit pattern increases in a direction x in which the unit patterns are arranged.

公开(公告)号：US11867935B2

公开(公告)日：2024-01-09

申请号：US17449149

申请日：2021-09-28

Applicant: VIAVI Solutions Inc.

Inventor： Jinhui Yang ,  Marius Grigonis ,  Georg J. Ockenfuss ,  Karen Denise Hendrix

IPC: G02B5/28 ,  B32B7/023 ,  B32B7/02 ,  B32B17/10 ,  C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  C23C14/35 ,  G02B5/20

CPC classification number: G02B5/285 ,  B32B7/02 ,  B32B7/023 ,  B32B17/10229 ,  C23C14/0036 ,  C23C14/0617 ,  C23C14/3464 ,  C23C14/35 ,  G02B5/207 ,  Y10T428/24942 ,  Y10T428/266

Abstract: In some implementations, an optical interference filter includes a substrate; and a set of layers that are disposed on the substrate. The set of layers includes a first subset of layers, wherein the first subset of layers comprises an aluminum nitride (AlN) material; and a second subset of layers, wherein the second subset of layers comprises a hydrogenated silicon (Si:H) material.

公开(公告)号：US11817328B2

公开(公告)日：2023-11-14

申请号：US18104681

申请日：2023-02-01

Applicant: AGC Inc.

Inventor： Hirofumi Yamamoto ,  Yasuhiko Akao ,  Teruo Fujiwara ,  Nobuhiko Imajo

IPC: H01L21/56 ,  C03C3/087 ,  C03C17/22 ,  C23C14/00 ,  C23C14/06 ,  C23C14/08 ,  C23C14/34

CPC classification number: H01L21/568 ,  C03C3/087 ,  C03C17/225 ,  C23C14/0036 ,  C23C14/0652 ,  C23C14/083 ,  C23C14/3407 ,  H01L21/561 ,  H01L21/566 ,  C03C2218/155

Abstract: A laminate including a glass plate and a coating layer, wherein the coating layer includes one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride, wherein a ratio (dc/dg) of a thickness dc of the coating layer to a thickness dg of the glass plate is in a range of 0.05×10−3 to 1.2×10−3, and wherein a radius of curvature r1 of the laminate with negating of self-weight deflection is 10 m to 150 m.