STATIC CHEMICAL VAPOR DEPOSITION OF y-Ni + y'-Ni3AI COATINGS
    2.
    发明申请
    STATIC CHEMICAL VAPOR DEPOSITION OF y-Ni + y'-Ni3AI COATINGS 审中-公开
    y-Ni + y'-Ni3AI涂料的静态化学气相沉积

    公开(公告)号:US20100159136A1

    公开(公告)日:2010-06-24

    申请号:US12641060

    申请日:2009-12-17

    CPC classification number: C23C10/14 C23C10/16

    Abstract: A static chemical vapor deposition (CVD) process may be used to deposit a coating including a γ-Ni+γ′-Ni3Al phase constitution over a substrate. A static CVD process is performed in a closed system that may include the substrate, and coating material and an activator. The γ-Ni+γ′-Ni3Al coating may be modified by one or more additional elements, including, for example, Hf, Y, Zr, Ce, La, Si, Cr, Pt, or additional elements present in the substrate. A static CVD process may include co-deposition of two or more elements, and may also include sequential static CVD steps, each of which is performed in a closed system.

    Abstract translation: 可以使用静电化学气相沉积(CVD)工艺在衬底上沉积包括γ-Ni +γ'-Ni3Al相构成的涂层。 在封闭系统中进行静电CVD工艺,其可以包括基底,涂层材料和活化剂。 γ-Ni +γ'-Ni3Al涂层可以被一种或多种附加元素改性,包括例如Hf,Y,Zr,Ce,La,Si,Cr,Pt或存在于底物中的附加元素。 静态CVD工艺可以包括两个或更多个元件的共沉积,并且还可以包括顺序静电CVD步骤,每个步骤在闭合系统中执行。

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