Carbon material and method of manufacturing the same
    3.
    发明授权
    Carbon material and method of manufacturing the same 有权
    碳材料及其制造方法

    公开(公告)号:US08896099B2

    公开(公告)日:2014-11-25

    申请号:US13983788

    申请日:2012-02-21

    摘要: By inhibiting generation of particles, a carbon material and a method of manufacturing the carbon material are provided that can be used in the field of semiconductor manufacturing or the like, in which low dust emission is considered important.A carbon material having a chromium carbide layer formed on a surface of a carbon substrate. The chromium carbide layer is composed of Cr3C2. The carbon material can be manufactured through a first step of forming a chromium carbide layer containing a chromium carbide other than Cr3C2 on a surface of a carbon substrate, and a second step of heat-treating the carbon substrate under a reducing atmosphere to convert the chromium carbide other than Cr3C2 into Cr3C2.

    摘要翻译: 通过抑制颗粒的产生,可以提供碳材料和碳材料的制造方法,其可以用于半导体制造等领域,其中低尘发射被认为是重要的。 在碳基板的表面上形成有碳化铬层的碳材料。 碳化铬层由Cr3C2组成。 碳材料可以通过在碳基板的表面上形成含有Cr 3 C 2以外的碳化铬的碳化铬层的第一工序,以及在还原气氛下对碳基板进行热处理以将铬 Cr3C2以外的碳化物进入Cr3C2。

    High delivery temperature isopipe materials
    5.
    发明授权
    High delivery temperature isopipe materials 有权
    高输送温度等压管材料

    公开(公告)号:US08028544B2

    公开(公告)日:2011-10-04

    申请号:US12391750

    申请日:2009-02-24

    IPC分类号: C03B7/00 C04B35/584

    摘要: Isopipes (13) for making a glass or a glass-ceramic using a fusion process are provided. The isopipes are made from a silicon nitride refractory material that is: (a) produced in block form in an atmosphere having a pO2 of less than 0.1 using less than 10 weight percent of one or more sintering aids, (b) machined into an isopipe configuration, and (c) exposed to a partial pressure of oxygen equal to or greater than 0.1 for a period of time and at a temperature sufficient to form a SiO2 layer (31) which exhibits substantially only a passive oxidation mechanism. The SiO2 layer (31) serves as a protective barrier for further oxidation of the silicon nitride during use of the isopipe (13). The isopipes (13) exhibit less sag during use than isopipes composed of zircon.

    摘要翻译: 提供了使用熔融法制造玻璃或玻璃陶瓷的等离子管(13)。 等压槽由氮化硅耐火材料制成,该材料为:(a)在小于10重量%的一种或多种烧结助剂的情况下,在pO2小于0.1的气氛中以块状形式制备,(b)加工成等压管 配置,和(c)暴露于等于或大于0.1的氧分压持续一段时间,并且在足以形成基本上仅显示被动氧化机理的SiO 2层(31)的温度下。 SiO 2层(31)用作在使用等压管(13)期间氮化硅的进一步氧化的保护屏障。 等压槽(13)在使用期间表现出较小的凹陷,而不是由锆石构成的等压槽。

    REFORMED ALUMINUM NITRIDE SINTERED BODY AND METHOD OF PRODUCING THE SAME
    9.
    发明申请
    REFORMED ALUMINUM NITRIDE SINTERED BODY AND METHOD OF PRODUCING THE SAME 失效
    改性的氮化铝烧结体及其制造方法

    公开(公告)号:US20100183860A1

    公开(公告)日:2010-07-22

    申请号:US12676033

    申请日:2008-09-02

    IPC分类号: C01B21/072

    摘要: [Problems] To provide a method of producing, easily and in a high yield, a reformed aluminum nitride sintered body having very excellent light transmission property which can be favorably used as a light-transmitting cover particularly for light sources having high luminous efficiencies.[Means for Solution] An aluminum nitride sintered body having a concentration of metal impurities excluding aluminum of not more than 150 ppm, an oxygen concentration of not more than 0.5% by weight and a relative density of not less than 95% is used as a starting material. The aluminum nitride sintered body is heat-treated in an oxidizing atmosphere in a temperature region of 1400 to 2000° C. to increase the oxygen concentration by not less than 0.03% by weight.

    摘要翻译: 本发明提供一种具有非常优异的透光性的改性氮化铝烧结体的制造方法,该方法可有利地用作具有高发光效率的光源的透光罩。 [解决方案]使用铝不超过150ppm,氧浓度不超过0.5重量%,相对密度不低于95%的氮化铝烧结体作为 起始材料 在1400〜2000℃的温度区域的氧化气氛中对氮化铝烧结体进行热处理,使氧浓度增加0.03重量%以上。

    Process for obtaining silicon nitride (SI3N4) surface coatings on ceramic components and pieces
    10.
    发明授权
    Process for obtaining silicon nitride (SI3N4) surface coatings on ceramic components and pieces 失效
    用于获得陶瓷部件和件上的氮化硅(SI3N4)表面涂层的方法

    公开(公告)号:US07651726B2

    公开(公告)日:2010-01-26

    申请号:US10545985

    申请日:2004-02-18

    IPC分类号: B05D3/00

    摘要: A process of obtaining silicon nitride (Si3N4) surface coatings on ceramic pieces and components by impregnation of the surfaces of the ceramic pieces with silicon powder suspensions with a particle size preferably less than 200 μm. The thickness of the coatings depends on the impregnation time and on the properties of the slip and the ceramic piece. The subsequent nitridation of the coating by thermal treatment at temperatures between 1300° C. and 1500° C. in N2 atmospheres leads to a continuous Si3N4 coating. The chemical stability and compatibility between Si3N4 and molten silicon enables its application in silicon metallurgy, in manufacturing crucibles for silicon fusion or for housing said molten silicon, in manufacturing pipes and chutes for its transport or in manufacturing different components for its subsequent purification.

    摘要翻译: 通过用粒度优选小于200μm的硅粉末悬浮液浸渍陶瓷片的表面来获得陶瓷片和部件上的氮化硅(Si 3 N 4)表面涂层的方法。 涂层的厚度取决于浸渍时间和滑动和陶瓷件的性能。 随后在N2气氛中在1300℃和1500℃之间的温度下热处理使涂层氮化,导致连续的Si 3 N 4涂层。 Si3N4和熔融硅之间的化学稳定性和相容性使其能够应用于硅冶金,制造用于硅熔化的坩埚或用于容纳所述熔融硅的制造管道和滑槽用于其输送或制造不同的组分以用于随后的纯化。