公开(公告)号：US4917136A

公开(公告)日：1990-04-17

申请号：US198079

申请日：1988-05-24

申请人： Tadahiro Ohmi ,  Kazuhiko Sugiyawa ,  Fumio Nakahara ,  Masaru Umeda

发明人： Tadahiro Ohmi ,  Kazuhiko Sugiyawa ,  Fumio Nakahara ,  Masaru Umeda

IPC分类号： F17D1/04 ,  B01J4/00 ,  B08B9/02 ,  B08B9/032 ,  C23C16/455 ,  F17D1/02 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31

CPC分类号： B08B9/0325 ,  B08B9/0328 ,  C23C16/455 ,  C23C16/45561 ,  H01J37/3244 ,  Y10S134/902 ,  Y10T137/0419 ,  Y10T137/4259

摘要： This invention relates to the supply piping system of the process gas for various types of thin-film making and fine pattern dry etching process, and more particularly to the process gas supply system, which makes it possible to form high quality thin films and to perform high quality etching.Specifically, when there are a unit in operation with process gas supplied and a unit not in operation with no process gas supplied in a process gas supply piping system, supplying the process gas to two or more process units from a cylinder cabinet piping system, this invention provides a gas supply piping system, where the process gas supply piping line to the process unit not in operation can be purged with purge gas all the time and where gas flows all the time through all of gas supply piping lines to eliminate the stagnation of gas.

摘要翻译： 本发明涉及用于各种薄膜制造和精细图案干蚀刻工艺的工艺气体的供应管道系统，更具体地涉及工艺气体供应系统，这使得可以形成高质量的薄膜并执行 高品质蚀刻。 具体地说，当在处理气体供给管道系统中存在具有工业气体运转的单元和不进行工艺气体运转的单元时，将处理气体从筒柜配管系统供给到两个以上的处理单元时， 本发明提供了一种气体供应管道系统，其中不处于操作的处理单元的工艺气体供应管线可以一直被吹扫气体吹扫，并且其中气体始终流过所有气体供应管线，以消除停滞 加油站。