公开(公告)号：US07625262B2

公开(公告)日：2009-12-01

申请号：US10549294

申请日：2004-03-18

申请人： Mitsugu Abe ,  Nobuyoshi Nambu ,  Osamu Ito ,  Masaaki Ogitsu ,  Kazuo Inomata

发明人： Mitsugu Abe ,  Nobuyoshi Nambu ,  Osamu Ito ,  Masaaki Ogitsu ,  Kazuo Inomata

IPC分类号： B24B7/22

CPC分类号： B24B37/00 ,  B01J45/00 ,  B01J47/127 ,  B24B57/02 ,  C23F1/46

摘要： A material for purification of a semiconductor polishing slurry that without changing of pH value, is capable of efficiently purifying a polishing slurry to thereby not only prevent metal contamination of a polished object as effectively as possible but also achieve recycling of a polishing slurry without any problem; a relevant module for purification of a semiconductor polishing slurry; and a process for purifying a semiconductor polishing slurry with the use thereof. In particular, a material for purification of a semiconductor polishing slurry characterized in that it comprises a fibrous substrate having a functional group capable of forming a metal chelate or such a functional group together with hydroxyl fixed onto at least the surface thereof. This material for purification of a semiconductor polishing slurry is, for example, used in such a manner that it is inserted in a container fitted with polishing slurry inflow port and outflow port while ensuring passage of polishing slurry flow.

摘要翻译： 用于净化半导体抛光浆料的材料，其不改变pH值，能够有效地净化研磨浆料，从而不仅可以有效地防止抛光对象的金属污染，而且可以无任何问题地回收抛光浆料。 ; 用于净化半导体抛光浆料的相关模块; 以及使用该方法纯化半导体研磨浆料的方法。 特别是，用于半导体研磨浆料的净化的材料，其特征在于，它包括具有能够形成金属螯合物的官能团的纤维基质或这样的官能团以及至少固定在其表面上的羟基。 例如，这种用于半导体抛光浆料净化的材料以这样的方式使用，即将其插入装有抛光浆料流入口和流出口的容器中，同时确保抛光浆料流动。

公开(公告)号：US5401557A

公开(公告)日：1995-03-28

申请号：US104050

申请日：1993-08-17

申请人： Kazuo Inomata ,  Kenichi Imabori ,  Masao Kogure

发明人： Kazuo Inomata ,  Kenichi Imabori ,  Masao Kogure

IPC分类号： B32B29/02 ,  C09J7/04 ,  D21H15/06 ,  D21H27/34 ,  B32B5/12

CPC分类号： B32B29/02 ,  C09J7/042 ,  D21H15/06 ,  D21H27/34 ,  Y10T428/24099 ,  Y10T428/24463 ,  Y10T428/283 ,  Y10T428/2848 ,  Y10T428/31982

摘要： A thread-reinforced paper sheet comprises upper and lower paper layers and a reinforcing thread interposed therebetween. A thread-reinforced gummed tape comprises a tape base material which consists of upper and lower paper layers and a reinforcing thread interposed between the upper and lower paper layers, and a moisture activated adhesive layer formed on one of surfaces of the tape base material. In each of the thread-reinforced paper sheet and the thread-reinforced gummed tape, a water-soluble or water-dispersible adhesive is used to laminate the upper and lower paper layers, and a water-soluble thread is used as the reinforcing thread. Each of such thread-reinforced paper sheet and such thread-reinforced gummed tape exhibits a strength equivalent to that of the prior art article and moreover, has a complete disintegratability. Thus, a regeneratable thread-reinforced paper sheet as well as a regeneratable thread-reinforced gummed tape is provided.

摘要翻译： PCT No.PCT / JP93 / 00892 Sec。 371日期：1993年8月17日 102（e）日期1993年8月17日PCT提交1993年6月29日PCT公布。 第WO94 / 02317号公报 日期1994年2月3日。一种螺纹增强纸片包括上下纸层和插入其间的加强线。 线增强胶带包括由上下纸层构成的带基材料和插入在上下纸层之间的加强线，以及形成在带基材的一个表面上的水分活化粘合剂层。 在每个螺纹增强纸和螺纹增强胶带中，使用水溶性或水分散性粘合剂来层压上下纸层，并且使用水溶性线作为加强线。 每个这种螺纹增强纸片和这种螺纹增强的胶带表现出与现有技术制品相当的强度，而且具有完全的分解性。 因此，提供可再生的螺纹增强纸片以及可再生的螺纹增强胶带。

公开(公告)号：US20060205325A1

公开(公告)日：2006-09-14

申请号：US10549294

申请日：2004-03-18

申请人： Mitsugu Abe ,  Nobuyoshi Nambu ,  Osamu Ito ,  Masaaki Ogitsu ,  Kazuo Inomata

发明人： Mitsugu Abe ,  Nobuyoshi Nambu ,  Osamu Ito ,  Masaaki Ogitsu ,  Kazuo Inomata

IPC分类号： B24B1/00

CPC分类号： B24B37/00 ,  B01J45/00 ,  B01J47/127 ,  B24B57/02 ,  C23F1/46

摘要： A material for purification of a semiconductor polishing slurry that without changing of pH value, is capable of efficiently purifying a polishing slurry to thereby not only prevent metal contamination of a polished object as effectively as possible but also achieve recycling of a polishing slurry without any problem; a relevant module for purification of a semiconductor polishing slurry; and a process for purifying a semiconductor polishing slurry with the use thereof. In particular, a material for purification of a semiconductor polishing slurry characterized in that it comprises a fibrous substrate having a functional group capable of forming a metal chelate or such a functional group together with hydroxyl fixed onto at least the surface thereof. This material for purification of a semiconductor polishing slurry is, for example, used in such a manner that it is inserted in a container fitted with polishing slurry inflow port and outflow port while ensuring passage of polishing slurry flow.