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公开(公告)号：US20080213503A1
公开(公告)日：2008-09-04
申请号：US11956924
申请日：2007-12-14
IPC分类号： C23C14/16
CPC分类号： C23C8/02 , C23C14/58 , C23C14/5833 , C23C26/00 , C25D5/48
摘要： Substrates comprising a surface comprising chromium, said surface being adapted to exhibit reduced coefficient of friction and/or increased hardness.
摘要翻译： 底物包括含铬的表面，所述表面适于表现出降低的摩擦系数和/或增加的硬度。
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公开(公告)号：US06723177B2
公开(公告)日：2004-04-20
申请号：US09901364
申请日：2001-07-09
IPC分类号： C23C2200
CPC分类号： C23C14/5833 , C23C8/02 , C23C14/58 , C23C26/00 , C25D5/48
摘要： A process for treating a chromium coating and/or the surface of a chromium alloy to increase hardness, and/or to decrease coefficient of friction; chromium alloys and/or chromium coatings with surfaces having increased hardness and/or decreased coefficient of friction; and, components comprising chromium alloys and/or chromium coatings with surfaces having increased hardness and/or decreased coefficient of friction.
摘要翻译： 一种用于处理铬涂层和/或铬合金表面以提高硬度和/或降低摩擦系数的方法; 铬合金和/或铬涂层，其表面具有增加的硬度和/或降低的摩擦系数; 以及包括具有增加的硬度和/或降低的摩擦系数的表面的铬合金和/或铬涂层的组分。
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公开(公告)号：US5458927A
公开(公告)日：1995-10-17
申请号：US401110
申请日：1995-03-08
申请人： Gerard W. Malaczynski , Xiaohong Qiu , Joseph V. Mantese , Alaa A. Elmoursi , Aboud H. Hamdi , Blake P. Wood , Kevin C. Walter , Michael A. Nastasi
发明人： Gerard W. Malaczynski , Xiaohong Qiu , Joseph V. Mantese , Alaa A. Elmoursi , Aboud H. Hamdi , Blake P. Wood , Kevin C. Walter , Michael A. Nastasi
CPC分类号： C23C16/26 , C23C16/0245
摘要： A process for forming an adherent diamond-like carbon coating on a workpiece of suitable material such as an aluminum alloy is disclosed. The workpiece is successively immersed in different plasma atmospheres and subjected to short duration, high voltage, negative electrical potential pulses or constant negative electrical potentials or the like so as to clean the surface of oxygen atoms, implant carbon atoms into the surface of the alloy to form carbide compounds while codepositing a carbonaceous layer on the surface, bombard and remove the carbonaceous layer, and to thereafter deposit a generally amorphous hydrogen-containing carbon layer on the surface of the article.
摘要翻译： 公开了一种在诸如铝合金的合适材料的工件上形成粘附的类金刚石碳涂层的方法。 将工件连续地浸渍在不同的等离子体气氛中，经受短时间，高电压，负电势脉冲或恒定负电位等，以清洁氧原子的表面，将碳原子注入合金表面 形成碳化物，同时在表面上共沉积碳质层，轰击并除去碳质层，然后在制品的表面上沉积一般无定形的含氢碳层。
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公开(公告)号：US07572345B2
公开(公告)日：2009-08-11
申请号：US11956924
申请日：2007-12-14
IPC分类号： C22C22/00
CPC分类号： C23C8/02 , C23C14/58 , C23C14/5833 , C23C26/00 , C25D5/48
摘要： Substrates comprising a surface comprising chromium, said surface being adapted to exhibit reduced coefficient of friction and/or increased hardness.
摘要翻译： 底物包括含铬的表面，所述表面适于表现出降低的摩擦系数和/或增加的硬度。
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公开(公告)号：US06572933B1
公开(公告)日：2003-06-03
申请号：US09160227
申请日：1998-09-24
IPC分类号： H05H124
CPC分类号： C23C16/56 , C23C8/36 , C23C16/0245 , C23C16/029 , C23C16/32 , H01J37/32412
摘要： Process for forming adherent coatings using plasma processing. Plasma Immersion Ion Processing (PIIP) is a process where energetic (hundreds of eV to many tens of keV) metallic and metalloid ions derived from high-vapor-pressure organometallic compounds in a plasma environment are employed to deposit coatings on suitable substrates, which coatings are subsequently relieved of stress using inert ion bombardment, also in a plasma environment, producing thereby strongly adherent coatings having chosen composition, thickness and density. Four processes are utilized: sputter-cleaning, ion implantation, material deposition, and coating stress relief. Targets are placed directly in a plasma and pulse biased to generate a non-line-of-sight deposition without the need for complex fixturing. If the bias is a relatively high negative potential (20 kV-100 kV) ion implantation will result. At lower voltages (50 V-10 kV), deposition occurs, and the extent of the surface modification can routinely be extended between 1 &mgr;m and 10 &mgr;m. By combining plasma based implantation and film deposition, coatings with greatly reduced stress are possible, allowing the ultimate coating thickness to be expanded to tens of microns.
摘要翻译： 使用等离子体处理形成粘附涂层的方法。 等离子体浸入离子处理（PIIP）是一种在等离子体环境中由高蒸气压的有机金属化合物衍生的能量（几百eV至几十keV）的金属和准金属离子用于将涂层沉积在合适的基材上的工艺， 随后在等离子体环境中使用惰性离子轰击释放应力，由此产生具有所选组成，厚度和密度的强粘附性涂层。 利用四个工艺：溅射清洗，离子注入，材料沉积和涂层应力消除。 目标直接放置在等离子体中，脉冲偏置以产生非视距沉积，而不需要复杂的夹持。 如果偏置是相对较高的负电位（20 kV-100 kV），则会产生离子注入。 在较低的电压（50V-10kV）下，发生沉积，并且表面改性的程度可以常规地在1m和10um之间延伸。 通过组合基于等离子体的植入和膜沉积，可以大大降低应力的涂层，使最终的涂层厚度扩展到几十微米。
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公开(公告)号：US06572935B1
公开(公告)日：2003-06-03
申请号：US09428269
申请日：1999-10-27
IPC分类号： C23C1627
CPC分类号： C23C16/26 , H01J37/32412 , Y10S427/103 , Y10S427/104
摘要： A plasma-based method for the deposition of diamond-like carbon (DLC) coatings is described. The process uses a radio-frequency inductively coupled discharge to generate a plasma at relatively low gas pressures. The deposition process is environmentally friendly and scaleable to large areas, and components that have geometrically complicated surfaces can be processed. The method has been used to deposit adherent 100-400 nm thick DLC coatings on metals, glass, and polymers. These coatings are between three and four times harder than steel and are therefore scratch resistant, and transparent to visible light. Boron and silicon doping of the DLC coatings have produced coatings having improved optical properties and lower coating stress levels, but with slightly lower hardness.
摘要翻译： 描述了用于沉积类金刚石（DLC）涂层的基于等离子体的方法。 该过程使用射频感应耦合放电在相对低的气体压力下产生等离子体。 沉积工艺对于大面积的环境友好和可扩展，并且可以处理具有几何复杂表面的部件。 该方法已用于在金属，玻璃和聚合物上沉积100-400nm厚的DLC涂层。 这些涂层比钢硬三至四倍，因此具有耐划伤性，对可见光透明。 DLC涂层的硼和硅掺杂已经产生具有改善的光学性能和较低涂层应力水平但具有稍低的硬度的涂层。
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