公开(公告)号：US08256722B2

公开(公告)日：2012-09-04

申请号：US12579040

申请日：2009-10-14

申请人： Krassimir Todorov Krastev

发明人： Krassimir Todorov Krastev

IPC分类号： F16L3/22 ,  F16G13/00 ,  G03B27/42

CPC分类号： F16L3/015 ,  G03B27/42 ,  G03F7/70991

摘要： A guide for guiding cables and/or hoses between two parts that are moveable relative to each other, the guide including a band having a length, width and thickness, and having a torsional stiffness about a longitudinal axis of the band, a bending stiffness about an axis in the width direction, and a shear stiffness in the thickness direction, multiple blocks fitted to the band, and a deformable member provided between two adjacent blocks, the deformable member being connected to the adjacent blocks and having a torsional stiffness about the longitudinal axis of the band, a shear stiffness in the thickness direction, and a bending stiffness about the axis in the width direction, wherein the torsional stiffness of the deformable member is substantially greater than the torsional stiffness of the band, and wherein the shear stiffness of the deformable member is substantially greater than the shear stiffness of the band.

摘要翻译： 用于在相对于彼此可移动的两个部件之间引导电缆和/或软管的引导件，所述引导件包括具有长度，宽度和厚度的带，并且具有围绕所述带的纵向轴线的扭转刚度， 在宽度方向上的轴线，以及厚度方向上的剪切刚度，装配到带的多个块以及设置在两个相邻块之间的可变形构件，所述可变形构件连接到相邻的块，并且具有围绕纵向的扭转刚度 带的剪切刚度，以及在宽度方向上围绕轴的弯曲刚度，其中可变形构件的扭转刚度基本上大于带的扭转刚度，并且其中剪切刚度 可变形构件基本上大于带的剪切刚度。

公开(公告)号：US20100096512A1

公开(公告)日：2010-04-22

申请号：US12579040

申请日：2009-10-14

申请人： Krassimir Todorov KRASTEV

发明人： Krassimir Todorov KRASTEV

IPC分类号： F16L3/22 ,  F16L3/08 ,  G03B27/42

CPC分类号： F16L3/015 ,  G03B27/42 ,  G03F7/70991

摘要： A guide for guiding cables and/or hoses between two parts that are moveable relative to each other, the guide including a band having a length, width and thickness, and having a torsional stiffness about a longitudinal axis of the band, a bending stiffness about an axis in the width direction, and a shear stiffness in the thickness direction, multiple blocks fitted to the band, and a deformable member provided between two adjacent blocks, the deformable member being connected to the adjacent blocks and having a torsional stiffness about the longitudinal axis of the band, a shear stiffness in the thickness direction, and a bending stiffness about the axis in the width direction, wherein the torsional stiffness of the deformable member is substantially greater than the torsional stiffness of the band, and wherein the shear stiffness of the deformable member is substantially greater than the shear stiffness of the band.

摘要翻译： 用于在相对于彼此可移动的两个部件之间引导电缆和/或软管的引导件，所述引导件包括具有长度，宽度和厚度的带，并且具有围绕所述带的纵向轴线的扭转刚度， 在宽度方向上的轴线，以及厚度方向上的剪切刚度，装配到带的多个块以及设置在两个相邻块之间的可变形构件，所述可变形构件连接到相邻的块，并且具有围绕纵向的扭转刚度 带的剪切刚度，以及在宽度方向上围绕轴的弯曲刚度，其中可变形构件的扭转刚度基本上大于带的扭转刚度，并且其中剪切刚度 可变形构件基本上大于带的剪切刚度。

公开(公告)号：US07517211B2

公开(公告)日：2009-04-14

申请号：US11312659

申请日：2005-12-21

申请人： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon

发明人： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon

IPC分类号： B29C59/00

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US08753557B2

公开(公告)日：2014-06-17

申请号：US13331985

申请日：2011-12-20

申请人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

发明人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC分类号： B28B11/08

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US20120091629A1

公开(公告)日：2012-04-19

申请号：US13331985

申请日：2011-12-20

申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychencko ,  Karel Diederick Van Der Mast ,  Klaus Simon

发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychencko ,  Karel Diederick Van Der Mast ,  Klaus Simon

IPC分类号： B29C59/02

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US08100684B2

公开(公告)日：2012-01-24

申请号：US12391954

申请日：2009-02-24

申请人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

发明人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC分类号： B29C59/00 ,  B29C35/08 ,  B28B17/00

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US07943080B2

公开(公告)日：2011-05-17

申请号：US11316361

申请日：2005-12-23

申请人： Johan Frederik Dijksman ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Ivar Schram

发明人： Johan Frederik Dijksman ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Ivar Schram

IPC分类号： B29C35/08 ,  B29C59/02 ,  B29C41/00

CPC分类号： G03F9/7053 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7042 ,  Y10S977/877 ,  Y10S977/888

摘要： A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.

摘要翻译： 公开了一种将压印模板相对于衬底的目标区域对准的方法，该方法包括在目标区域内沉积一定量的可压印介质; 将压印模板接触到可压印介质，使得可压印介质被压缩并且允许压印模板，目标区域或两者在目标区域和压印模板之间的界面张力下相对于彼此横向移动，其中 提供了比衬底少润湿的材料，其形式至少部分地围绕衬底的目标区域。

公开(公告)号：US20090212462A1

公开(公告)日：2009-08-27

申请号：US12391954

申请日：2009-02-24

申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karal Diederick Van Der Mast ,  Klaus Simon

发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karal Diederick Van Der Mast ,  Klaus Simon

IPC分类号： B28B3/00 ,  B29C59/02

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US20080206385A1

公开(公告)日：2008-08-28

申请号：US11913328

申请日：2006-04-28

申请人： Krassimir Todorov Krastev ,  Raymond Jacobus Wilhelmus Knaapen ,  Marinus Josephus Jakobus Dona ,  Patericus Dijk ,  Johannes Martinus Maria Swinkels ,  Johannes Cornelis Van Den Ven

发明人： Krassimir Todorov Krastev ,  Raymond Jacobus Wilhelmus Knaapen ,  Marinus Josephus Jakobus Dona ,  Patericus Dijk ,  Johannes Martinus Maria Swinkels ,  Johannes Cornelis Van Den Ven

IPC分类号： B29C33/38

CPC分类号： B21J7/46

摘要： The invention relates to an indentation apparatus (1) comprising a force frame (13) and a positioning frame (14). An indentation tool (5) is pressed into a work piece (7) in order to master a mould. The work piece (7) is supported by the base (6). An actuator (2) is mounted in the force frame (13). The actuator (2) and the indentation tool head (4) are connected with a rod (3). The rod (3) is fixed with flexible (swivel) joints (15) to said indentation tool (4) and said actuator (2) in order to physically decouple said force frame (13) and said positioning frame (14) from forces. Also a force sensor (9) is installed between the indentation tool (4) and the positioning frame (14). In order to keep the positioning frame unloaded, the balance force delivered by said force frame actuator (2) should be approximately equal to the indentation force. The signal of the force sensor (9) is interpreted by control electronics (10). The control electronics determine the force of actuator (2) such that the force measured at the force sensor (9) is approximately at zero level. In order to align actuator (2), rod (3) and indentation tool (4) axially, the actuator (2) will be moved as follower of the indentation tool head (5) movement.

摘要翻译： 本发明涉及一种包括力框架（13）和定位框架（14）的压痕装置（1）。 压入工具（5）被压入工件（7）中以便掌握模具。 工件（7）由基座（6）支撑。 致动器（2）安装在力框架（13）中。 致动器（2）和压痕工具头（4）与杆（3）连接。 杆（3）用柔性（旋转）接头（15）固定到所述压痕工具（4）和所述致动器（2）上，以便将力框架（13）和所述定位框架（14）物理地分离开。 此外，力传感器（9）安装在压痕工具（4）和定位框架（14）之间。 为了保持定位架的卸载，由所述力架致动器（2）传递的平衡力应近似等于压痕力。 控制电路（10）解释力传感器（9）的信号。 控制电子装置确定致动器（2）的力，使得在力传感器（9）处测量的力大致为零电平。 为了使致动器（2），杆（3）和压痕工具（4）轴向对齐，致动器（2）将作为压痕工具头（5）的随动件移动而移动。