Polyolefin foams for footwear foam applications
    2.
    发明申请
    Polyolefin foams for footwear foam applications 审中-公开
    用于鞋类泡沫应用的聚烯烃泡沫

    公开(公告)号:US20050288440A1

    公开(公告)日:2005-12-29

    申请号:US11157895

    申请日:2005-06-21

    IPC分类号: C08L1/00

    摘要: A composition that can be used as foam composition is disclosed, which comprises or is produced from about 40 to about 95 wt %, or about 50 to about 95 wt %, of an ethylene acrylate copolymer and about 5 to about 60 wt %, or about 5 to about 50 wt %, of a soft ethylene polymer wherein the ethylene acrylate copolymer comprises repeat units derived from ethylene and at least one alkyl acrylate and the soft ethylene polymer comprises copolymer of ethylene and an α-olefin, copolymer of ethylene and vinyl acetate, or combinations thereof.

    摘要翻译: 公开了可用作泡沫组合物的组合物,其包含约40至约95重量%,或约50至约95重量%的乙烯丙烯酸酯共聚物或约5至约60重量% 约5至约50重量%的软质乙烯聚合物,其中乙烯丙烯酸酯共聚物包含衍生自乙烯和至少一种丙烯酸烷基酯的重复单元,软质乙烯聚合物包括乙烯和α-烯烃的共聚物,乙烯和乙烯的共聚物 乙酸盐或其组合。

    Polyolefin foams for footwear foam applications
    3.
    发明申请
    Polyolefin foams for footwear foam applications 审中-公开
    用于鞋类泡沫应用的聚烯烃泡沫

    公开(公告)号:US20050288442A1

    公开(公告)日:2005-12-29

    申请号:US11157893

    申请日:2005-06-21

    摘要: A composition that can be used as foam composition is disclosed, which comprises or is produced from an ethylene acrylate copolymer, an acid copolymer or an ionomer of the acid copolymer or both, or combinations thereof, and optionally a soft ethylene polymer. The ethylene acrylate copolymer comprises repeat units derived from ethylene and at least one alkylacrylate. The acid copolymer comprises repeat units derived from ethylene and acrylic acid, methacrylic acid, or combinations thereof. The soft ethylene polymer comprises ethylene and an α-olefin, vinyl acetate, or combinations thereof.

    摘要翻译: 公开了可用作泡沫组合物的组合物,其包含或由乙烯丙烯酸酯共聚物,酸共聚物或酸共聚物的离聚物或两者的组合或其组合,以及任选的软质乙烯聚合物制备。 乙烯丙烯酸酯共聚物包含衍生自乙烯和至少一种丙烯酸烷基酯的重复单元。 酸共聚物包含衍生自乙烯和丙烯酸,甲基丙烯酸或其组合的重复单元。 软的乙烯聚合物包括乙烯和α-烯烃,乙酸乙烯酯或其组合。

    Device and method for optimally detecting a surface condition of wafers
    4.
    发明授权
    Device and method for optimally detecting a surface condition of wafers 有权
    用于最佳检测晶片表面状态的装置和方法

    公开(公告)号:US06285199B1

    公开(公告)日:2001-09-04

    申请号:US09229991

    申请日:1999-01-14

    申请人: Tae-Kye Kim

    发明人: Tae-Kye Kim

    IPC分类号: G01R31302

    CPC分类号: G01R31/2656

    摘要: A device and method for optimally detecting the surface conditions of different types of wafers are disclosed. The device includes a light generating unit for impinging light on a wafer to generate a reflected light from the wafer, a combining unit including a plurality of filters having different light cut-off ratios for reducing the amount of the reflected light to generate a reduced amount of the reflected light depending on the reflection rate of the wafer, and a detection unit for processing the appropriately reduced amount of the reflected light to detect the surface condition of the wafer. A different filter or a different combination of the filters are selected depending on the reflection rate of the wafer being processed in order to appropriately reduce the amount of reflected light to be processed by the detection unit.

    摘要翻译: 公开了一种用于最佳地检测不同类型晶片的表面状况的装置和方法。 该装置包括用于将光照射在晶片上以产生来自晶片的反射光的光产生单元,包括具有不同遮光率的多个滤光器的组合单元,用于减少反射光的量以产生减少的量 取决于晶片的反射率的反射光;以及检测单元,用于处理适当减少的反射光量以检测晶片的表面状态。 根据正在处理的晶片的反射率来选择不同的滤光器或滤光片的不同组合,以便适当地减少由检测单元处理的反射光的量。