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公开(公告)号:US11134739B1
公开(公告)日:2021-10-05
申请号:US17213233
申请日:2021-03-26
申请人: Yifei Jenny Jin , Naixin Angela Tang , Liangxi Nick Chen , Songhe Bill Shen , Lisa Ruosha Wang , Richard Prince Wang , Jian Jim Wang , Qing Ye
发明人: Yifei Jenny Jin , Naixin Angela Tang , Liangxi Nick Chen , Songhe Bill Shen , Lisa Ruosha Wang , Richard Prince Wang , Jian Jim Wang , Qing Ye
IPC分类号: H04M1/00 , A42B3/06 , A42B3/30 , H04B1/3827 , H04M1/05 , H04M1/60 , H04M1/19 , G02B27/01 , H04R1/10 , A62B18/04 , H04M1/72409 , H04M1/72454 , A42B3/28 , A42B3/04 , A62B23/02 , G10K11/162
摘要: A flexible method to provide a variety of value-added coatings to a piece of jewelry or a group of jewelries is disclosed. Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) technique is implemented to deposit a layer of conformal coating on intended jewelry surfaces, including both exterior and interior surfaces, to enhance a vast majority of process-driven or end of use driven properties. The coating compositions include dielectrics material, metals, organic materials or organic-inorganic hybrid materials. The method steps of forming a layer of coating are straightforward and can be tailed to different purposes.
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公开(公告)号:US11185139B1
公开(公告)日:2021-11-30
申请号:US17192591
申请日:2021-03-04
IPC分类号: C23C16/455 , A44C17/00 , C23C16/40 , C23C16/02
摘要: A flexible method to provide a variety of value-added coatings to a piece of jewelry or a group of jewelries is disclosed. Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) technique is implemented to deposit a layer of conformal coating on intended jewelry surfaces, including both exterior and interior surfaces, to enhance a vast majority of process-driven or end of use driven properties. The coating compositions include dielectrics material, metals, organic materials or organic-inorganic hybrid materials. The method steps of forming a layer of coating are straightforward and can be tailed to different purposes.
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