公开(公告)号：US07486391B2

公开(公告)日：2009-02-03

申请号：US11520538

申请日：2006-09-13

申请人： Xiaoming Chen ,  Maihan Nguyen ,  Osamu Arasaki ,  Tammy Maraquin ,  Daniel Sawyer ,  Pedro Morrison

发明人： Xiaoming Chen ,  Maihan Nguyen ,  Osamu Arasaki ,  Tammy Maraquin ,  Daniel Sawyer ,  Pedro Morrison

IPC分类号： G01N21/00

CPC分类号： G03F1/84 ,  G03F1/82 ,  Y02P80/30

摘要： A method for haze control on a semiconductor reticle, the method including performing a reticle inspection of a semiconductor reticle to detect haze formation on a periodic basis, performing a wafer inspection to detect haze defects, forecasting haze formation, and cleaning the semiconductor reticle. Also included is a haze forecasting method for haze control on a semiconductor reticle, including scanning a plurality of semiconductor wafers, identifying repeating defects in the semiconductor wafers, storing the repeating defects in a database as known repeating defects, and identifying an additional repeating defect that is not a known repeating defect, the additional repeating defect caused by semiconductor reticle haze.

摘要翻译： 一种半导体掩模版上的雾度控制方法，该方法包括对半导体掩模版进行掩模版检查以周期性地检测雾度形成，执行晶片检查以检测雾度缺陷，预测雾度形成和清洁半导体掩模版。 还包括用于半导体掩模版上的雾度控制的雾度预测方法，包括扫描多个半导体晶片，识别半导体晶片中的重复缺陷，将重复缺陷存储在数据库中作为已知的重复缺陷，以及识别附加的重复缺陷， 不是已知的重复缺陷，由半导体掩模版雾度引起的附加重复缺陷。

公开(公告)号：US20080062414A1

公开(公告)日：2008-03-13

申请号：US11520538

申请日：2006-09-13

申请人： Xiaoming Chen ,  Maihan Nguyen ,  Osamu Arasaki ,  Tammy Maraquin ,  Daniel Sawyer ,  Pedro Morrison

发明人： Xiaoming Chen ,  Maihan Nguyen ,  Osamu Arasaki ,  Tammy Maraquin ,  Daniel Sawyer ,  Pedro Morrison

IPC分类号： G01N21/00

CPC分类号： G03F1/84 ,  G03F1/82 ,  Y02P80/30

摘要： A method for haze control on a semiconductor reticle, the method including performing a reticle inspection of a semiconductor reticle to detect haze formation on a periodic basis, performing a wafer inspection to detect haze defects, forecasting haze formation, and cleaning the semiconductor reticle. Also included is a haze forecasting method for haze control on a semiconductor reticle, including scanning a plurality of semiconductor wafers, identifying repeating defects in the semiconductor wafers, storing the repeating defects in a database as known repeating defects, and identifying an additional repeating defect that is not a known repeating defect, the additional repeating defect caused by semiconductor reticle haze.

摘要翻译： 一种半导体掩模版上的雾度控制方法，该方法包括对半导体掩模版进行掩模版检查以周期性地检测雾度形成，执行晶片检查以检测雾度缺陷，预测雾度形成和清洁半导体掩模版。 还包括用于半导体掩模版上的雾度控制的雾度预测方法，包括扫描多个半导体晶片，识别半导体晶片中的重复缺陷，将重复缺陷存储在数据库中作为已知的重复缺陷，以及识别附加的重复缺陷， 不是已知的重复缺陷，由半导体掩模版雾度引起的附加重复缺陷。