Laser heated discharge plasma EUV source
    1.
    发明授权
    Laser heated discharge plasma EUV source 有权
    激光加热放电等离子体EUV源

    公开(公告)号:US08269199B2

    公开(公告)日:2012-09-18

    申请号:US12277623

    申请日:2008-11-25

    IPC分类号: G21K5/02

    摘要: A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.

    摘要翻译: 也可以具有施加的轴向磁场的自限制的锂离子等离子体以亚临界密度被二氧化碳激光器照射,以高效率,高功率和小的源尺寸产生13.5nm波长的极紫外光子。

    Z-PINCH PLASMA GENERATOR AND PLASMA TARGET
    2.
    发明申请
    Z-PINCH PLASMA GENERATOR AND PLASMA TARGET 审中-公开
    Z-PINCH等离子体发生器和等离子体目标

    公开(公告)号:US20110089834A1

    公开(公告)日:2011-04-21

    申请号:US12854375

    申请日:2010-08-11

    IPC分类号: H05H1/24

    CPC分类号: H05H1/06

    摘要: A configuration of two opposed electrodes with conical depressions and symmetry around an axis along which there is an applied steady magnetic field, is supplied with a pulsed voltage and current to create an azimuthally very uniform pre-ionization cylinder of a working gas as a precursor to stable and accurate compression of the working gas into a Z-pinch plasma photon source or plasma target for laser-pumped photon sources. A further compound hollow electrode configuration permits the generation of a cool, dense, core plasma surrounded and compressed by a hot liner plasma. Modulation of the radial density profile within this core can provide optical guiding for a laser-pumped recombination laser.

    摘要翻译: 具有锥形凹陷和围绕着施加的稳定磁场的对称的两个相对电极的配置被提供脉冲电压和电流,以产生工作气体的方位非常均匀的预电离圆柱体作为前体的前体 将工作气体稳定和精确地压缩成激光泵浦光子源的Z夹点等离子体光子源或等离子体靶。 另外的复合中空电极构造允许产生由热衬里等离子体包围和压缩的冷却密集的核心等离子体。 该芯内的径向密度分布的调制可为激光泵浦复合激光器提供光学引导。

    Extreme ultraviolet based on colliding neutral beams
    3.
    发明授权
    Extreme ultraviolet based on colliding neutral beams 失效
    基于碰撞中性梁的极紫外光源

    公开(公告)号:US06421421B1

    公开(公告)日:2002-07-16

    申请号:US09815633

    申请日:2001-03-23

    IPC分类号: G21G400

    CPC分类号: H05G2/003

    摘要: A source of photons includes a discharge chamber, a plurality of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams enter the plasma discharge region and form a hot plasma that radiates photons. The photons may be in the soft X-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.

    摘要翻译: 光子源包括放电室,放电室中的多个离子束源和中和机构。 每个离子束源将等离子体放电区域的工作气体的离子束静电加速。 中和机构在进入等离子体放电区域之前至少部分地中和离子束。 中和的光束进入等离子体放电区域并形成辐射光子的热等离子体。 光子可以在软X射线或极紫外波长范围内,并且在一个实施例中,波长具有在约10-15纳米的范围内。

    Induction heated buffer gas heat pipe for use in an extreme ultraviolet source
    4.
    发明授权
    Induction heated buffer gas heat pipe for use in an extreme ultraviolet source 失效
    用于极紫外光源的感应加热缓冲气体热管

    公开(公告)号:US08569724B2

    公开(公告)日:2013-10-29

    申请号:US13326043

    申请日:2011-12-14

    IPC分类号: H05G2/00

    CPC分类号: H05B6/36 H05B6/105

    摘要: The successful use of lithium vapor in an extreme ultraviolet (EUV) light source depends upon an intense localized heat source at the center of conical structures that evaporate, condense and re-supply liquid lithium. Induction heating of a hollow structure with toroidal topology via an internal helical field coil, can supply intense heat at its innermost radius. The resulting slim radio frequency heated structure has high optical transmission from a central EUV producing plasma to collection mirrors outside of the structure, improving EUV source efficiency and reliability.

    摘要翻译: 在极紫外(EUV)光源中成功使用锂蒸气取决于蒸发,冷凝和再供应液态锂的锥形结构中心处的强烈局部热源。 通过内部螺旋磁场线圈对具有环形拓扑结构的中空结构的感应加热可在其最内半径处提供强热。 所得到的细长射频加热结构具有从产生中央EUV的等离子体到结构外部的收集反射镜的高光传输,提高了EUV源的效率和可靠性。

    LASER HEATED DISCHARGE PLASMA EUV SOURCE
    5.
    发明申请
    LASER HEATED DISCHARGE PLASMA EUV SOURCE 有权
    激光加热放电等离子体源

    公开(公告)号:US20090212241A1

    公开(公告)日:2009-08-27

    申请号:US12277623

    申请日:2008-11-25

    IPC分类号: G01J3/10

    摘要: A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.

    摘要翻译: 也可以具有施加的轴向磁场的自限制的锂离子等离子体以亚临界密度被二氧化碳激光器照射,以高效率,高功率和小的源尺寸产生13.5nm波长的极紫外光子。

    Star pinch X-ray and extreme ultraviolet photon source

    公开(公告)号:US06567499B2

    公开(公告)日:2003-05-20

    申请号:US09876469

    申请日:2001-06-07

    IPC分类号: G21K400

    CPC分类号: H05G2/003 G03F7/70033

    摘要: A source of photons includes a discharge chamber, first and second groups of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The first group of ion beam sources acts as a cathode and the second group of ion beam sources acts as an anode for delivering a heating current to the plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams and the heating current form a hot plasma that radiates photons. The photons may be in the soft x-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.

    Stabilized radial pseudospark switch
    7.
    发明授权
    Stabilized radial pseudospark switch 失效
    稳定的径向pseudospark开关

    公开(公告)号:US5502356A

    公开(公告)日:1996-03-26

    申请号:US237010

    申请日:1994-05-02

    CPC分类号: H01J17/30 H01J17/40 H01T2/02

    摘要: A pseudospark switch performs the rapid commutation of high electric currents at moderately high voltage, with minimal statistical uncertainty in the delay between triggering and commutation. The switch includes multiple parallel pseudospark channels, the channels being arranged radially. The switch is triggered by an injection of electrons from an auxiliary discharge present in a common hollow cathode region of the pseudospark channels. Structures within the cathode inhibit spontaneous firing of the switch. In particular, the operating voltage of the switch is greatly increased by the presence of an axial stabilizing electrode element inside the hollow cathode, which stabilizes the open circuit state of the switch. A bias electrode within the hollow cathode provides further stabilization when held at positive potential and enhances triggering when biased negatively relative to the hollow cathode.

    摘要翻译: 伪脉冲开关在中等高电压下执行高电流的快速换向,触发和换向之间的延迟具有最小的统计不确定性。 该开关包括多个并行的伪线通道,通道径向设置。 该开关是通过从伪脉冲通道的共用空心阴极区域中存在的辅助放电射入来触发的。 阴极内的结构阻止开关的自发点火。 特别地,通过在中空阴极内存在轴向稳定电极元件,开关的工作电压大大增加,这稳定了开关的开路状态。 空心阴极内的偏置电极在保持在正电位时提供进一步的稳定性,并且当相对于中空阴极偏置负极时,增强触发。

    Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator
    9.
    发明授权
    Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator 失效
    光学寻址极限紫外线调制器和光刻系统并入调制器

    公开(公告)号:US07079306B2

    公开(公告)日:2006-07-18

    申请号:US10921567

    申请日:2004-08-19

    IPC分类号: G02B26/08

    CPC分类号: G03F7/7045 G03F7/70291

    摘要: An optically addressed extreme ultraviolet (EUV) modulator in which a spatial amplitude or phase pattern is provided to an EUV beam that is reflected from, or transmitted through the modulator. The modulator includes a modulator structure that includes a material with a high coefficient of thermal expansion. When a thermal impulse is incident on one part of the modulator, the resulting expansion changes the reflected phase or amplitude of the EUV beam from that part. A thermal pattern is imprinted on the modulator by absorption of a visible or ultraviolet pattern, resulting in a corresponding modulation of the EUV beam. A lithography system is based on the optically addressed EUV modulator.

    摘要翻译: 一种光学寻址的极紫外(EUV)调制器,其中空间幅度或相位图案被提供给从该调制器反射或通过调制器透射的EUV波束。 调制器包括具有高热膨胀系数的材料的调制器结构。 当热脉冲入射到调制器的一部分时,所产生的扩展会改变来自该部分的EUV波束的反射相位或振幅。 热图案通过吸收可见光或紫外线图案印在调制器上,导致EUV光束的相应调制。 光刻系统基于光学寻址的EUV调制器。

    Plasma X-ray source
    10.
    发明授权
    Plasma X-ray source 失效
    等离子X射线源

    公开(公告)号:US5504795A

    公开(公告)日:1996-04-02

    申请号:US383889

    申请日:1995-02-06

    IPC分类号: H05G2/00 H01J35/00

    CPC分类号: H05G2/003

    摘要: A plasma x-ray source includes a chamber containing a gas at a prescribed pressure, the chamber defining a pinch region having a central axis, an RF electrode disposed around the pinch region for preionizing the gas in the pinch region to form a plasma shell that is symmetrical around the central axis, and a pinch anode and a pinch cathode disposed at opposite ends of the pinch region. The pinch anode and the pinch cathode produce a current through the plasma shell in an axial direction and produce an azimuthal magnetic field in the pinch region in response to a high energy electrical pulse. The azimuthal magnetic field causes the plasma shell to collapse to the central axis and to generate x-rays. Prior to collapse, the plasma shell may have a cylindrical shape or a spherical shape.

    摘要翻译: 等离子体X射线源包括容纳规定压力的气体的腔室,所述室限定具有中心轴的夹持区域,设置在夹持区域周围的RF电极,用于使夹紧区域中的气体前体化以形成等离子体壳体, 围绕中心轴对称,并且夹紧阳极和夹紧阴极设置在夹紧区域的相对端。 夹紧阳极和夹紧阴极在轴向方向上产生通过等离子体壳体的电流,并且响应于高能量电脉冲在夹紧区域中产生方位磁场。 方位角磁场使等离子体壳体塌陷到中心轴线并产生X射线。 在崩溃之前,等离子体壳可以具有圆柱形或球形。