公开(公告)号：US20140014838A1

公开(公告)日：2014-01-16

申请号：US13943596

申请日：2013-07-16

申请人： Karen Denise Hendrix ,  Richard A. Bradley, JR. ,  Marius Grigonis

发明人： Karen Denise Hendrix ,  Richard A. Bradley, JR. ,  Marius Grigonis

IPC分类号： G02B5/28 ,  G01J5/08

CPC分类号： G02B5/281 ,  G01J5/0862 ,  G02B1/11 ,  G02B5/207 ,  G02B5/285 ,  G06K9/00335 ,  H04N5/33 ,  H04N13/254

摘要： An optical filter having a passband at least partially overlapping with a wavelength range of 800 nm to 1100 nm is provided. The optical filter includes a filter stack formed of hydrogenated silicon layers and lower-refractive index layers stacked in alternation. The hydrogenated silicon layers each have a refractive index of greater than 3 over the wavelength range of 800 nm to 1100 nm and an extinction coefficient of less than 0.0005 over the wavelength range of 800 nm to 1100 nm.

摘要翻译： 提供具有与800nm至1100nm的波长范围至少部分重叠的通带的滤光器。 滤光器包括由氢化硅层和交替堆叠的低折射率层形成的滤光片叠层。 氢化硅层在800nm至1100nm的波长范围内的折射率大于3，在800nm至1100nm的波长范围内的消光系数小于0.0005。

公开(公告)号：US08864958B2

公开(公告)日：2014-10-21

申请号：US12041959

申请日：2008-03-04

申请人： Markus K. Tilsch ,  Joseph Smith ,  Marius Grigonis

发明人： Markus K. Tilsch ,  Joseph Smith ,  Marius Grigonis

IPC分类号： C23C14/34 ,  C23C14/54 ,  H01J37/32 ,  C23C14/52 ,  H01J37/34

CPC分类号： C23C14/34 ,  C23C14/3492 ,  C23C14/52 ,  C23C14/54 ,  H01J37/32935 ,  H01J37/34

摘要： A method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index are provided. The sputter-deposition system includes a plurality of target cathodes, each of which comprises a target material having a different composition, that are powered by a single DC power supply. The plurality of target cathodes are cosputtered to deposit a layer composed of a mixture of materials on a substrate. The composite refractive index of the layer is controlled by adjusting an operating parameter of the plurality of target cathodes. Suitable operating parameters include cathode power, cathode voltage, cathode current, an angle between a cathode support and the substrate, and a flow rate of a reactive gas.

摘要翻译： 提供了一种用于沉积由材料混合物构成并具有预定折射率的层的溅射沉积系统。 溅射沉积系统包括多个目标阴极，每个靶阴极包括由单个DC电源供电的具有不同组成的靶材料。 多个目标阴极被分散以在衬底上沉积由材料混合物组成的层。 通过调整多个目标阴极的操作参数来控制该层的复合折射率。 合适的操作参数包括阴极功率，阴极电压，阴极电流，阴极支撑件和衬底之间的角度以及反应气体的流速。

公开(公告)号：US20080223714A1

公开(公告)日：2008-09-18

申请号：US12041959

申请日：2008-03-04

申请人： Markus K. Tilsch ,  Joseph Smith ,  Marius Grigonis

发明人： Markus K. Tilsch ,  Joseph Smith ,  Marius Grigonis

IPC分类号： C23C14/32

CPC分类号： C23C14/34 ,  C23C14/3492 ,  C23C14/52 ,  C23C14/54 ,  H01J37/32935 ,  H01J37/34

摘要： A method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index are provided. The sputter-deposition system includes a plurality of target cathodes, each of which comprises a target material having a different composition, that are powered by a single DC power supply. The plurality of target cathodes are cosputtered to deposit a layer composed of a mixture of materials on a substrate. The composite refractive index of the layer is controlled by adjusting an operating parameter of the plurality of target cathodes. Suitable operating parameters include cathode power, cathode voltage, cathode current, an angle between a cathode support and the substrate, and a flow rate of a reactive gas.

摘要翻译： 提供了一种用于沉积由材料混合物构成并具有预定折射率的层的溅射沉积系统。 溅射沉积系统包括多个目标阴极，每个靶阴极包括由单个DC电源供电的具有不同组成的靶材料。 多个目标阴极被分散以在衬底上沉积由材料混合物组成的层。 通过调整多个目标阴极的操作参数来控制该层的复合折射率。 合适的操作参数包括阴极功率，阴极电压，阴极电流，阴极支撑件和衬底之间的角度以及反应气体的流速。