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1.发明授权公开(公告)号：US08864958B2
公开(公告)日：2014-10-21
申请号：US12041959
申请日：2008-03-04
申请人： Markus K. Tilsch , Joseph Smith , Marius Grigonis
发明人： Markus K. Tilsch , Joseph Smith , Marius Grigonis
CPC分类号： C23C14/34 , C23C14/3492 , C23C14/52 , C23C14/54 , H01J37/32935 , H01J37/34
摘要： A method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index are provided. The sputter-deposition system includes a plurality of target cathodes, each of which comprises a target material having a different composition, that are powered by a single DC power supply. The plurality of target cathodes are cosputtered to deposit a layer composed of a mixture of materials on a substrate. The composite refractive index of the layer is controlled by adjusting an operating parameter of the plurality of target cathodes. Suitable operating parameters include cathode power, cathode voltage, cathode current, an angle between a cathode support and the substrate, and a flow rate of a reactive gas.
摘要翻译： 提供了一种用于沉积由材料混合物构成并具有预定折射率的层的溅射沉积系统。 溅射沉积系统包括多个目标阴极，每个靶阴极包括由单个DC电源供电的具有不同组成的靶材料。 多个目标阴极被分散以在衬底上沉积由材料混合物组成的层。 通过调整多个目标阴极的操作参数来控制该层的复合折射率。 合适的操作参数包括阴极功率，阴极电压，阴极电流，阴极支撑件和衬底之间的角度以及反应气体的流速。
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2.发明申请Method And Sputter-Deposition System For Depositing A Layer Composed Of A Mixture Of Materials And Having A Predetermined Refractive Index 有权用于沉积由材料混合物构成的层并具有预定折射率的方法和溅射沉积系统公开(公告)号：US20080223714A1
公开(公告)日：2008-09-18
申请号：US12041959
申请日：2008-03-04
申请人： Markus K. Tilsch , Joseph Smith , Marius Grigonis
发明人： Markus K. Tilsch , Joseph Smith , Marius Grigonis
IPC分类号： C23C14/32
CPC分类号： C23C14/34 , C23C14/3492 , C23C14/52 , C23C14/54 , H01J37/32935 , H01J37/34
摘要： A method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index are provided. The sputter-deposition system includes a plurality of target cathodes, each of which comprises a target material having a different composition, that are powered by a single DC power supply. The plurality of target cathodes are cosputtered to deposit a layer composed of a mixture of materials on a substrate. The composite refractive index of the layer is controlled by adjusting an operating parameter of the plurality of target cathodes. Suitable operating parameters include cathode power, cathode voltage, cathode current, an angle between a cathode support and the substrate, and a flow rate of a reactive gas.
摘要翻译： 提供了一种用于沉积由材料混合物构成并具有预定折射率的层的溅射沉积系统。 溅射沉积系统包括多个目标阴极，每个靶阴极包括由单个DC电源供电的具有不同组成的靶材料。 多个目标阴极被分散以在衬底上沉积由材料混合物组成的层。 通过调整多个目标阴极的操作参数来控制该层的复合折射率。 合适的操作参数包括阴极功率，阴极电压，阴极电流，阴极支撑件和衬底之间的角度以及反应气体的流速。
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公开(公告)号：US08658001B2
公开(公告)日：2014-02-25
申请号：US12045473
申请日：2008-03-10
IPC分类号： C23C14/34
CPC分类号： C23C14/34 , C23C14/3492 , C23C14/52 , C23C14/54 , H01J37/32935 , H01J37/34
摘要： A method and control system are provided for depositing a layer in a sputter-deposition system having a target cathode. A first dependence relationship of a deposition rate of the layer on an operating parameter, selected from cathode voltage, cathode current, and cathode power, is provided prior to deposition of the layer. A second dependence relationship of the operating parameter on time is measured during deposition of the layer, while a different operating parameter, also selected from cathode voltage, cathode current, and cathode power, is held substantially constant. On the basis of the first and second dependence relationships, a deposition time for the layer is dynamically determined during deposition of the layer.
摘要翻译： 提供了一种用于在具有目标阴极的溅射沉积系统中沉积层的方法和控制系统。 在层的沉积之前提供了层的沉积速率与从阴极电压，阴极电流和阴极功率中选择的工作参数的第一依赖关系。 在层的沉积期间测量操作参数随时间的第二依赖关系，而从阴极电压，阴极电流和阴极功率中选择的不同操作参数保持基本恒定。 基于第一和第二依赖关系，在层的沉积期间动态地确定该层的沉积时间。
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公开(公告)号：US07879209B2
公开(公告)日：2011-02-01
申请号：US11177465
申请日：2005-07-08
IPC分类号： C23C14/42
CPC分类号： H01J37/34 , H01J37/32541 , H01J37/3438
摘要： A magnetron sputtering cathode for use in a vacuum deposition process is disclosed wherein the cathode is coated on its sides with an electrically insulating material such as alumina to prevent arcing, and wherein the first end surface of the cathode supports a material to be sputtered. The bottom of the cathode may also be coated with an electrically insulating coating or may be resting upon an insulating platform.
摘要翻译： 公开了一种用于真空沉积工艺中的磁控溅射阴极，其中阴极通过电绝缘材料如氧化铝在其侧面上涂覆以防止电弧，并且其中阴极的第一端面支撑待溅射的材料。 阴极的底部也可以涂覆有电绝缘涂层，或者可以搁置在绝缘平台上。
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公开(公告)号：US07785456B2
公开(公告)日：2010-08-31
申请号：US10968642
申请日：2004-10-19
CPC分类号： C23C14/505 , C23C16/4584 , C23C16/4586 , H01J37/32715 , H01J37/34 , H01J37/3417 , H01L21/68764 , H01L21/68771 , H01L21/68785 , H01L21/68792
摘要： The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The magnetic latch includes a permanent magnetic, which is moveable between a latching position, in which the permanent magnet magnetizes the latch for attracting a substrate holder, and an unlatching position, in which the permanent magnet is connected in a bypass circuit, thereby demagnetizing the latch for releasing the substrate holder.
摘要翻译： 本发明涉及一种用于将基板固定在悬浮在气相沉积系统的真空室中的涂覆源上方的行星旋转平台上的磁性闩锁， 化学气相沉积（CVD）系统或物理气相沉积（PVD）系统。 磁性闩锁包括永久磁铁，该永久磁铁可以在其中永磁体磁化闩锁以吸引衬底保持器的闩锁位置与永久磁铁连接在旁路电路中的解锁位置之间移动，从而使 用于释放衬底保持器的闩锁。
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公开(公告)号：US20080223716A1
公开(公告)日：2008-09-18
申请号：US12045473
申请日：2008-03-10
CPC分类号： C23C14/34 , C23C14/3492 , C23C14/52 , C23C14/54 , H01J37/32935 , H01J37/34
摘要： A method and control system are provided for depositing a layer in a sputter-deposition system having a target cathode. A first dependence relationship of a deposition rate of the layer on an operating parameter, selected from cathode voltage, cathode current, and cathode power, is provided prior to deposition of the layer. A second dependence relationship of the operating parameter on time is measured during deposition of the layer, while a different operating parameter, also selected from cathode voltage, cathode current, and cathode power, is held substantially constant. On the basis of the first and second dependence relationships, a deposition time for the layer is dynamically determined during deposition of the layer.
摘要翻译： 提供了一种用于在具有目标阴极的溅射沉积系统中沉积层的方法和控制系统。 在层的沉积之前提供了层的沉积速率与从阴极电压，阴极电流和阴极功率中选择的工作参数的第一依赖关系。 在层的沉积期间测量操作参数随时间的第二依赖关系，而从阴极电压，阴极电流和阴极功率中选择的不同操作参数保持基本恒定。 基于第一和第二依赖关系，在层的沉积期间动态地确定该层的沉积时间。
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公开(公告)号：US07062122B2
公开(公告)日：2006-06-13
申请号：US10700193
申请日：2003-11-03
申请人： Adam Bergeron , Robert E. Klinger , Georg J. Ockenfuss , Markus K. Tilsch , Frederik Kevin Zernik
发明人： Adam Bergeron , Robert E. Klinger , Georg J. Ockenfuss , Markus K. Tilsch , Frederik Kevin Zernik
IPC分类号： G02B6/28
CPC分类号： G02B6/29361 , G02B6/29383 , G02B6/29395
摘要： A wavelength-tunable add/drop device for adding or dropping n channels having different center wavelengths is disclosed. A first multicavity variable optical filter for selectably operable to passing one channel while reflecting n−1 other channels depends upon a location where light is launched into an end of the multicavity optical filter. A broadband optical reflector is disposed directly adjacent to the multicavity variable optical filter and disposed between planes coincident with the first and second surfaces of the variable filter, the broadband reflector having a reflectivity that will reflect all n channels of light. Preferably, the broadband reflector is disposed distal from the bottom and top layers of the multicavity filter and is adjacent to the middle layers or near the middle of the multicavity filter layers.
摘要翻译： 公开了一种用于添加或丢弃具有不同中心波长的n个通道的波长可调加/减装置。 用于可选择地可操作以在反射n-1个其它通道的同时通过一个通道的第一多腔可变滤光器取决于将光发射到多腔滤光器的一端的位置。 宽带光学反射器直接设置在多重可变滤光器附近，并且设置在与可变滤光片的第一和第二表面重合的平面之间，宽带反射器具有将反射所有n个光通道的反射率。 优选地，宽带反射器设置在多腔过滤器的底层和顶层的远侧，并且与多层过滤层的中间层或中间附近相邻。
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公开(公告)号：US08163144B2
公开(公告)日：2012-04-24
申请号：US11205398
申请日：2005-08-17
IPC分类号： C23C14/00
CPC分类号： H01J37/34 , H01J37/32541 , H01J37/3438
摘要： The present invention relates to a magnetron sputtering device and technique for depositing materials onto a substrate at a high production rate in which the deposited films have predictive thickness distribution and in which the apparatus can operate continuously and repeatedly for very long periods. The present invention has realized increased production by reducing cycle time. Increased coating rates are achieved by coupling a planetary drive system with a large cathode. The cathode diameter is greater than the diameter of a planet and less than twice the diameter of the planet. Lower defect rates are obtained through the lower power density at the cathode which suppresses arcing, while runoff is minimized by the cathode to planet geometry without the use of a mask.
摘要翻译： 磁控溅射装置及其制造方法技术领域本发明涉及一种磁控溅射装置及其制造方法，其特征在于，以高生产率将基板上的材料沉积在基板上，其中沉积膜具有预测的厚度分布，并且该装置能够连续且重复地操作非常长的 本发明通过减少循环时间实现了增加的生产。 通过将行星驱动系统与大阴极联接来实现涂层速率的提高。 阴极直径大于行星的直径，小于行星直径的两倍。 通过阴极处的较低的功率密度获得较低的缺陷率，其抑制电弧，同时径流通过阴极至行星几何形状而被最小化，而不使用掩模。
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公开(公告)号：US07954219B2
公开(公告)日：2011-06-07
申请号：US11851779
申请日：2007-09-07
IPC分类号： B25B27/04
CPC分类号： C23C14/50 , H01L21/68721 , H01L21/68728 , H01L21/68764 , Y10T29/49895 , Y10T29/49998 , Y10T29/53957
摘要： A device for mounting and removing a substrate from a baseplate, in particular a substrate holder assembly device, including automated features for latching and unlatching a substrate, for use in a coating mechanism, from a baseplate, which includes an adjustable snap ring holder.
摘要翻译： 一种用于从基板，特别是基板保持器组件装置安装和移除基板的装置，包括用于从包括可调节卡环的基板在用于涂覆机构中的用于锁定和解锁基板的自动特征。
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公开(公告)号：US20090250341A1
公开(公告)日：2009-10-08
申请号：US12402322
申请日：2009-03-11
IPC分类号： C23C14/34
CPC分类号： H01J37/3405 , H01J37/3438
摘要： A sputtering anode is disclosed wherein the anode is in the form of a container or vessel; and, wherein the conducting surface communicating with a cathode is the inside surface of the container or vessel. The anode can be mounted outside of a coating chamber having its opening communicating with the chamber or alternatively may be mounted within the chamber. The anode may be an inlet port for receiving inert gas for use in forming the plasma and for pressurizing the anode.
摘要翻译： 公开了一种溅射阳极，其中阳极是容器或容器的形式; 并且其中与阴极连通的导电表面是容器或容器的内表面。 阳极可以安装在其开口与腔室连通的涂覆室的外部，或者可以安装在腔室内。 阳极可以是用于接收用于形成等离子体和用于对阳极加压的惰性气体的入口。
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