-
1.
公开(公告)号:US20070097476A1
公开(公告)日:2007-05-03
申请号:US11261856
申请日:2005-10-28
申请人: Martha Truninger , Melinda Valencia , Steve Hanson , Loreli Fister , Arjang Fartash , George Radominski , Timothy Emery , Robert Shreeve , Matthew Rocha , Alexander Govyadinov
发明人: Martha Truninger , Melinda Valencia , Steve Hanson , Loreli Fister , Arjang Fartash , George Radominski , Timothy Emery , Robert Shreeve , Matthew Rocha , Alexander Govyadinov
IPC分类号: G02F1/03
CPC分类号: G02F1/0128 , G02B26/0833 , G02F1/29 , G02F2203/12 , H04N9/312
摘要: A display system includes a housing having at least one optical window and at least one charge-controlled spatial light-modulator disposed within the housing. The at least one spatial light-modulator is configured to project an image-bearing light beam to a viewing surface through the at least one optical window. The system further includes at least one electron gun selectively positioned at a predetermined angle with respect to the at least one spatial light-modulator. The electron gun is configured to project an electron beam into the housing to impinge a front surface of the at least one spatial light-modulator.
摘要翻译: 显示系统包括具有至少一个光学窗口的壳体和设置在壳体内的至少一个电荷控制的空间光调制器。 所述至少一个空间光调制器被配置为通过所述至少一个光学窗口将图像承载光束投射到观察表面。 该系统还包括相对于至少一个空间光调制器选择性地以预定角度定位的至少一个电子枪。 电子枪被配置为将电子束投射到壳体中以撞击至少一个空间光调制器的前表面。
-
公开(公告)号:US20070076176A1
公开(公告)日:2007-04-05
申请号:US11239865
申请日:2005-09-30
申请人: Timothy Emery , George Radominski , Steve Hanson , Robert Shreeve , Alexander Govyadinov , Martha Truninger , Sriram Ramamoorthi , Harold Van Nice
发明人: Timothy Emery , George Radominski , Steve Hanson , Robert Shreeve , Alexander Govyadinov , Martha Truninger , Sriram Ramamoorthi , Harold Van Nice
IPC分类号: G03B21/28
CPC分类号: G03B21/28
摘要: One embodiment of a display system includes a first array that defines multiple reflective devices each movable between an inactive position to reflect light to a light dump and an active position to reflect light to an imaging region, a second array that defines multiple reflective devices each movable between an inactive position to reflect light to the light dump and an active position to reflect light to the imaging region, and an activation device that projects an activation beam to the devices to move individual ones of the devices between the active position and the inactive position, wherein the first array, the second array and the activation device are housed within a single vacuum enclosure.
摘要翻译: 显示系统的一个实施例包括限定多个反射装置的第一阵列,每个反射装置可以在将光反射到光倾倒的非活动位置和将光反射到成像区域的活动位置之间移动;限定多个反射装置的第二阵列, 在反射光到所述光倾倒的非活动位置和将光反射到所述成像区域的活动位置之间;以及激活装置,其将激活光束投影到所述装置以在所述主动位置和所述不活动位置之间移动所述装置中的各个装置 ,其中所述第一阵列,所述第二阵列和所述激活装置容纳在单个真空封壳内。
-
3.
公开(公告)号:US20050157096A1
公开(公告)日:2005-07-21
申请号:US11041773
申请日:2005-01-24
申请人: Martha Truninger , Charles Haluzak , Steven Leith
发明人: Martha Truninger , Charles Haluzak , Steven Leith
CPC分类号: B41J2/14201 , B41J2/1433 , B41J2/1607 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1646 , B41J2002/1437 , B41J2202/15 , H01L41/0973 , H01L41/316 , Y10T29/49401
摘要: A method of forming an opening through a substrate having a first side and a second side opposite the first side includes forming a trench in the first side of the substrate, forming a mask layer within the trench, filling the trench with a fill material, forming a first portion of the opening in the substrate from the second side of the substrate toward the mask layer, and forming a second portion of the opening in the substrate through the mask layer and the fill material, including communicating the second portion of the opening with the first portion of the opening and the first side of the substrate.
摘要翻译: 通过具有第一侧和与第一侧相对的第二侧的衬底形成开口的方法包括在衬底的第一侧中形成沟槽,在沟槽内形成掩模层,用填充材料填充沟槽,形成 从衬底的第二侧到掩模层的衬底中的开口的第一部分,以及通过掩模层和填充材料在衬底中形成开口的第二部分,包括使开口的第二部分与第 开口的第一部分和基底的第一侧。
-
4.
公开(公告)号:US20050088491A1
公开(公告)日:2005-04-28
申请号:US10992159
申请日:2004-11-18
CPC分类号: B41J2/1628 , B41J2/1601 , B41J2/1607 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634
摘要: A method of forming an opening through a substrate having a first side and a second side opposite the first side includes forming a trench in the first side of the substrate, forming a mask layer within the trench, forming at least one hole in the mask layer, filling the trench and the at least one hole, forming a first portion of the opening in the substrate from the second side of the substrate to the mask layer, and forming a second portion of the opening in the substrate from the second side of the substrate through the at least one hole in the mask layer to the first side of the substrate.
摘要翻译: 通过具有第一侧和与第一侧相对的第二侧的衬底形成开口的方法包括在衬底的第一侧中形成沟槽,在沟槽内形成掩模层,在掩模层中形成至少一个孔 填充所述沟槽和所述至少一个孔,从所述衬底的所述第二侧到所述掩模层形成所述衬底中的所述开口的第一部分,以及从所述衬底的所述第二侧形成所述衬底中的所述开口的第二部分 衬底通过掩模层中的至少一个孔到衬底的第一侧。
-
公开(公告)号:US20070058236A1
公开(公告)日:2007-03-15
申请号:US11225319
申请日:2005-09-12
IPC分类号: G02F1/03
CPC分类号: G02B26/0841 , G09G3/346
摘要: A light modulator array includes a plurality of light modulator devices, each the light modulator device including a resistor, a conductor coupled to a first end of the resistor, a post coupled to a second end of the resistor, and a reflective plate supported by the post, an insulator separating a first of the modulator devices from an adjacent light modulator device, and an energy penetration reducer configured to prevent the insulator from becoming conductive in a region between a resistor of the first light modulator device and a conductor of the adjacent device.
摘要翻译: 光调制器阵列包括多个光调制器装置,每个光调制器装置包括电阻器,耦合到电阻器的第一端的导体,耦合到电阻器的第二端的柱和由该电阻器支撑的反射板 将一个调制器装置中的第一个与相邻的光调制装置分开的绝缘体,以及能够防止绝缘体在第一光调制装置的电阻与相邻装置的导体之间的区域内导电的能量穿透减少器 。
-
公开(公告)号:US20050275072A1
公开(公告)日:2005-12-15
申请号:US10854110
申请日:2004-05-26
CPC分类号: B81C1/00269
摘要: A package for containing microelectromechanical devices includes a first substrate wafer, and a second substrate wafer made of an optical quality material. An underbump is interposed between the first and second substrate wafers. The underbump is composed of a standoff region and a localized bond region. The first and second substrate wafers and the underbump define a chamber that contains at least one microelectronic device.
摘要翻译: 用于容纳微机电器件的封装包括第一衬底晶片和由光学质量材料制成的第二衬底晶片。 在第一和第二基板晶片之间插入底部凹凸。 底部凹坑由间隔区域和局部粘结区域组成。 第一和第二衬底晶片和底部凹部限定包含至少一个微电子器件的腔室。
-
公开(公告)号:US06204182B1
公开(公告)日:2001-03-20
申请号:US09033487
申请日:1998-03-02
申请人: Martha Truninger , Phillip R. Coffman , Charles C. Haluzak , John P. Whitlock , Douglas A. Sexton
发明人: Martha Truninger , Phillip R. Coffman , Charles C. Haluzak , John P. Whitlock , Douglas A. Sexton
IPC分类号: H01L21461
CPC分类号: B41J2/1631 , B41J2/1603 , B41J2/1607 , B41J2/1628 , B41J2/1629 , B41J2/1642 , B41J2/1645
摘要: A process for creating and an apparatus employing reentrant (pointing or directed inward) shaped orifices in a semiconductor substrate. A layer of graded dielectric material is deposited on the semiconductor substrate. A masked photoimagable material is deposited upon the graded dielectric material and exposed to electromagnetic energy such that a patterned photoimagable material is created. The patterned photoimagable material is developed to unveil the graded dielectric material which is then anisotropically etched. The bore in the graded dielectric material is then isotropically etched to complete the creation of holes in the substrate.
-
公开(公告)号:US20060292748A1
公开(公告)日:2006-12-28
申请号:US11447764
申请日:2006-06-06
IPC分类号: H01L21/00
CPC分类号: B81C1/00269
摘要: A package for containing microelectromechanical devices includes a first substrate wafer, and a second substrate wafer made of an optical quality material. An underbump is interposed between the first and second substrate wafers. The underbump is composed of a standoff region and a localized bond region. The first and second substrate wafers and the underbump define a chamber that contains at least one microelectronic device.
-
公开(公告)号:US20050012772A1
公开(公告)日:2005-01-20
申请号:US10619639
申请日:2003-07-15
申请人: Martha Truninger , Steven Leith , Jeffery Hess
发明人: Martha Truninger , Steven Leith , Jeffery Hess
CPC分类号: B41J2/1629 , B41J2/1603 , B41J2/1628 , B41J2/1634
摘要: A method of forming an opening through a substrate having a first side and a second side opposite the first side includes forming spaced stops in the first side of the substrate, partially forming a first portion of the opening in the substrate from the second side by a first process, further forming the first portion of the opening in the substrate from the second side by a second process, including forming the first portion of the opening to the spaced stops, and forming a second portion of the opening in the substrate from the first side, including forming the second portion of the opening between the spaced stops.
-
公开(公告)号:US06315397B2
公开(公告)日:2001-11-13
申请号:US09736653
申请日:2000-12-13
申请人: Martha Truninger , Phillip R. Coffman , Charles C. Haluzak , John P. Whitlock , Douglas A. Sexton
发明人: Martha Truninger , Phillip R. Coffman , Charles C. Haluzak , John P. Whitlock , Douglas A. Sexton
IPC分类号: B41J205
CPC分类号: B41J2/1631 , B41J2/1603 , B41J2/1607 , B41J2/1628 , B41J2/1629 , B41J2/1642 , B41J2/1645
摘要: A process for creating and an apparatus employing reentrant (pointing or directed inward) shaped orifices in a semiconductor substrate. A layer of graded dielectric material is deposited on the semiconductor substrate. A masked photoimagable material is deposited upon the graded dielectric material and exposed to electromagnetic energy such that a patterned photoimagable material is created. The patterned photoimagable material is developed to unveil the graded dielectric material which is then anisotropically etched. The bore in the graded dielectric material is then isotropically etched to complete the creation of holes in the substrate.
-
-
-
-
-
-
-
-
-