公开(公告)号：US08384879B2

公开(公告)日：2013-02-26

申请号：US12499612

申请日：2009-07-08

申请人： Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Tom Van Zutphen

发明人： Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Tom Van Zutphen

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： H01L31/02024 ,  G03F7/70775 ,  G03F7/7085

摘要： A sensor includes a semiconductor body having a top and bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of a second and opposite conductivity type at the bottom surface, wherein a sensitive area is defined where the first region overlaps with the second region. A resistive layer is partially arranged in the sensitive area. The sensor includes two first electrode contacts and two second electrode contacts, wherein the first electrode contacts are placed on the resistive layer to define a first detection area in the sensitive area between the first electrode contacts, and wherein the second electrode contacts are placed partially in the sensitive area on the bottom surface of the body, the surfaces of the second electrodes in the sensitive area defining a second detection area that overlaps with the first detection area.

摘要翻译： 传感器包括具有顶表面和底表面的半导体本体，在顶表面处具有第一导电类型的第一掺杂表面取向区域和位于底表面处的第二和相反导电类型的第二掺杂表面取向区域，其中 限定第一区域与第二区域重叠的敏感区域。 电阻层部分地布置在敏感区域中。 传感器包括两个第一电极触点和两个第二电极触点，其中第一电极触点放置在电阻层上以限定第一电极触点之间的敏感区域中的第一检测区域，并且其中第二电极触点部分地放置在 身体底表面上的敏感区域，敏感区域中第二电极的表面限定与第一检测区域重叠的第二检测区域。

公开(公告)号：US20090015246A1

公开(公告)日：2009-01-15

申请号：US11822867

申请日：2007-07-10

申请人： Olaf Hubertus Wilhelmus Van Bruggen ,  Frank Auer ,  Marcel Koenraad Marie Baggen ,  Frits Van Der Meulen ,  Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Johannes Roland Dassel ,  Stoyan Nihtianov ,  Remko Wakker ,  Tom Van Zutphen

发明人： Olaf Hubertus Wilhelmus Van Bruggen ,  Frank Auer ,  Marcel Koenraad Marie Baggen ,  Frits Van Der Meulen ,  Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Johannes Roland Dassel ,  Stoyan Nihtianov ,  Remko Wakker ,  Tom Van Zutphen

IPC分类号： G03B27/42 ,  G01B7/14

CPC分类号： G03F7/70758 ,  G01D5/145 ,  G01D5/2451 ,  G03F7/70775

摘要： A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.

摘要翻译： 具有用于驱动诸如衬底支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备可以设置有测量系统以测量所讨论的支撑件的位置，例如提供安全系统以防止 支撑与另一部分的碰撞。 测量系统可以被配置为测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度，和/或测量金属层中产生的涡流，屏蔽磁体组件与电感测量 产生导致涡流的交变磁场的电磁体，和/或使用位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。

公开(公告)号：US07321416B2

公开(公告)日：2008-01-22

申请号：US11152849

申请日：2005-06-15

申请人： Martinus Cornelis Reijnen ,  Andrej Makarovic ,  Lambertus Gerardus Maria Kessels ,  Stoyan Nihtianov ,  Petrus Wilhelmus Josephus Maria Kemper ,  Kamen Hristov Chilov

发明人： Martinus Cornelis Reijnen ,  Andrej Makarovic ,  Lambertus Gerardus Maria Kessels ,  Stoyan Nihtianov ,  Petrus Wilhelmus Josephus Maria Kemper ,  Kamen Hristov Chilov

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70291

摘要： The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.

摘要翻译： 本发明包括光刻设备和器件制造方法，其使用图案化装置，其增加同时编程的单独可控元件的数量，以增加单独可控元件阵列的更新速率。 降低了阵列所需的高速模拟输入的数量。 减少阵列的复杂性，并增加阵列的最大更新速度。 此外，阵列中的元素的数量可以容易地扩展。 图案形成装置可以分成多组单元，并且光刻设备可以包括多个供应通道。 每个供应通道可以被布置成向相应的单元组中的每个单元提供电压信号。 这可以减少用于单独寻址每个单元的图案形成装置的所需输入的数量。

公开(公告)号：US07830495B2

公开(公告)日：2010-11-09

申请号：US11822867

申请日：2007-07-10

申请人： Olaf Hubertus Wilhelmus Van Bruggen ,  Marcel Koenraad Marie Baggen ,  Johannes Roland Dassel ,  Remko Wakker ,  Stoyan Nihtianov ,  Frank Auer ,  Frits Van Der Meulen ,  Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Tom Van Zutphen

发明人： Olaf Hubertus Wilhelmus Van Bruggen ,  Marcel Koenraad Marie Baggen ,  Johannes Roland Dassel ,  Remko Wakker ,  Stoyan Nihtianov ,  Frank Auer ,  Frits Van Der Meulen ,  Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Tom Van Zutphen

IPC分类号： G03B27/42 ,  G01B7/14

CPC分类号： G03F7/70758 ,  G01D5/145 ,  G01D5/2451 ,  G03F7/70775

摘要： A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.

摘要翻译： 具有用于驱动诸如衬底支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备可以设置有测量系统以测量所讨论的支撑件的位置，例如提供安全系统以防止 支撑与另一部分的碰撞。 测量系统可以被配置为测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度，和/或测量金属层中产生的涡流，屏蔽磁体组件与电感测量 产生导致涡流的交变磁场的电磁体，和/或使用位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。

公开(公告)号：US20100033697A1

公开(公告)日：2010-02-11

申请号：US12499612

申请日：2009-07-08

申请人： Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Tom Van Zutphen

发明人： Patrick David Vogelsang ,  Martinus Cornelis Reijnen ,  Tom Van Zutphen

IPC分类号： G03B27/42 ,  H01L31/105 ,  G01R27/08

CPC分类号： H01L31/02024 ,  G03F7/70775 ,  G03F7/7085

摘要： A sensor includes a semiconductor body having a top and bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of a second and opposite conductivity type at the bottom surface, wherein a sensitive area is defined where the first region overlaps with the second region. A resistive layer is partially arranged in the sensitive area. The sensor includes two first electrode contacts and two second electrode contacts, wherein the first electrode contacts are placed on the resistive layer to define a first detection area in the sensitive area between the first electrode contacts, and wherein the second electrode contacts are placed partially in the sensitive area on the bottom surface of the body, the surfaces of the second electrodes in the sensitive area defining a second detection area that overlaps with the first detection area.

摘要翻译： 传感器包括具有顶表面和底表面的半导体本体，在顶表面处具有第一导电类型的第一掺杂表面取向区域和位于底表面处的第二和相反导电类型的第二掺杂表面取向区域，其中 限定第一区域与第二区域重叠的敏感区域。 电阻层部分地布置在敏感区域中。 传感器包括两个第一电极触点和两个第二电极触点，其中第一电极触点放置在电阻层上以限定第一电极触点之间的敏感区域中的第一检测区域，并且其中第二电极触点部分地放置在 身体底表面上的敏感区域，敏感区域中第二电极的表面限定与第一检测区域重叠的第二检测区域。