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公开(公告)号：US07830495B2
公开(公告)日：2010-11-09
申请号：US11822867
申请日：2007-07-10
申请人： Olaf Hubertus Wilhelmus Van Bruggen , Marcel Koenraad Marie Baggen , Johannes Roland Dassel , Remko Wakker , Stoyan Nihtianov , Frank Auer , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
发明人： Olaf Hubertus Wilhelmus Van Bruggen , Marcel Koenraad Marie Baggen , Johannes Roland Dassel , Remko Wakker , Stoyan Nihtianov , Frank Auer , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
CPC分类号： G03F7/70758 , G01D5/145 , G01D5/2451 , G03F7/70775
摘要： A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.
摘要翻译： 具有用于驱动诸如衬底支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备可以设置有测量系统以测量所讨论的支撑件的位置，例如提供安全系统以防止 支撑与另一部分的碰撞。 测量系统可以被配置为测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度，和/或测量金属层中产生的涡流，屏蔽磁体组件与电感测量 产生导致涡流的交变磁场的电磁体，和/或使用位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。
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2.发明申请OPTICAL POSITION SENSOR, A POSITION SENSITIVE DETECTOR, A LITHOGRAPHIC APPARATUS AND A METHOD FOR DETERMINING AN ABSOLUTE POSITION OF A MOVABLE OBJECT TO BE USED IN A RELATIVE POSITION MEASUREMENT SYSTEM 有权光学位置传感器，位置敏感探测器，光刻设备和确定相对位置测量系统中使用的可移动物体的绝对位置的方法公开(公告)号：US20100033697A1
公开(公告)日：2010-02-11
申请号：US12499612
申请日：2009-07-08
IPC分类号： G03B27/42 , H01L31/105 , G01R27/08
CPC分类号： H01L31/02024 , G03F7/70775 , G03F7/7085
摘要： A sensor includes a semiconductor body having a top and bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of a second and opposite conductivity type at the bottom surface, wherein a sensitive area is defined where the first region overlaps with the second region. A resistive layer is partially arranged in the sensitive area. The sensor includes two first electrode contacts and two second electrode contacts, wherein the first electrode contacts are placed on the resistive layer to define a first detection area in the sensitive area between the first electrode contacts, and wherein the second electrode contacts are placed partially in the sensitive area on the bottom surface of the body, the surfaces of the second electrodes in the sensitive area defining a second detection area that overlaps with the first detection area.
摘要翻译： 传感器包括具有顶表面和底表面的半导体本体，在顶表面处具有第一导电类型的第一掺杂表面取向区域和位于底表面处的第二和相反导电类型的第二掺杂表面取向区域，其中 限定第一区域与第二区域重叠的敏感区域。 电阻层部分地布置在敏感区域中。 传感器包括两个第一电极触点和两个第二电极触点，其中第一电极触点放置在电阻层上以限定第一电极触点之间的敏感区域中的第一检测区域，并且其中第二电极触点部分地放置在 身体底表面上的敏感区域，敏感区域中第二电极的表面限定与第一检测区域重叠的第二检测区域。
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公开(公告)号：US20090015246A1
公开(公告)日：2009-01-15
申请号：US11822867
申请日：2007-07-10
申请人： Olaf Hubertus Wilhelmus Van Bruggen , Frank Auer , Marcel Koenraad Marie Baggen , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Johannes Roland Dassel , Stoyan Nihtianov , Remko Wakker , Tom Van Zutphen
发明人： Olaf Hubertus Wilhelmus Van Bruggen , Frank Auer , Marcel Koenraad Marie Baggen , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Johannes Roland Dassel , Stoyan Nihtianov , Remko Wakker , Tom Van Zutphen
CPC分类号： G03F7/70758 , G01D5/145 , G01D5/2451 , G03F7/70775
摘要： A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.
摘要翻译： 具有用于驱动诸如衬底支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备可以设置有测量系统以测量所讨论的支撑件的位置，例如提供安全系统以防止 支撑与另一部分的碰撞。 测量系统可以被配置为测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度，和/或测量金属层中产生的涡流，屏蔽磁体组件与电感测量 产生导致涡流的交变磁场的电磁体，和/或使用位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。
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公开(公告)号：US08952328B2
公开(公告)日：2015-02-10
申请号：US13566828
申请日：2012-08-03
申请人： Albertus Aemillius Seyno Sluijterman , Eric Gerardus Theodoor Bosch , Patrick David Vogelsang , Johannes Adrianus Carolus Cooijmans
发明人： Albertus Aemillius Seyno Sluijterman , Eric Gerardus Theodoor Bosch , Patrick David Vogelsang , Johannes Adrianus Carolus Cooijmans
IPC分类号： H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2441 , H01J2237/2443 , H01J2237/24445 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/24585 , H01J2237/2802 , H01J2237/31749
摘要： The invention relates to a charged particle detector system comprising a conversion plate (110) to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (120), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S1) and mean energy (S2) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.
摘要翻译： 本发明涉及带电粒子检测器系统，其包括将入射辐射转换成二次电子的转换板（110）。 这些二次电子然后由二次电子检测器（120）检测，从而提供入射辐射的信息。 通常，该信息在第一近似中被限制为入射辐射的通量。 在例如背向散射电子的情况下，这是进入的后向散射电子的电流。 本发明提出将转换板形成为例如能量相关检测器，例如用于检测电子的光电二极管，使得检测器系统同时提供例如电流（S1）和平均能量（S2）的信息 入射辐射。 检测器系统特别适用于SEM或DualBeam仪器。
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公开(公告)号：US20130056634A1
公开(公告)日：2013-03-07
申请号：US13566828
申请日：2012-08-03
申请人： Albertus Aemillius Seyno Sluijterman , Eric Gerardus Theodoor Bosch , Patrick David Vogelsang , Johannes Adrianus Carolus Cooijmans
发明人： Albertus Aemillius Seyno Sluijterman , Eric Gerardus Theodoor Bosch , Patrick David Vogelsang , Johannes Adrianus Carolus Cooijmans
IPC分类号： H01J37/244 , H01J37/26
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2441 , H01J2237/2443 , H01J2237/24445 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/24585 , H01J2237/2802 , H01J2237/31749
摘要： The invention relates to a charged particle detector system comprising a conversion plate (110) to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (120), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S1) and mean energy (S2) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.
摘要翻译： 本发明涉及带电粒子检测器系统，其包括将入射辐射转换成二次电子的转换板（110）。 这些二次电子然后由二次电子检测器（120）检测，从而提供入射辐射的信息。 通常，该信息在第一近似中被限制为入射辐射的通量。 在例如背向散射电子的情况下，这是进入的后向散射电子的电流。 本发明提出将转换板形成为例如能量相关检测器，例如用于检测电子的光电二极管，使得检测器系统同时提供例如电流（S1）和平均能量（S2）的信息 入射辐射。 检测器系统特别适用于SEM或DualBeam仪器。
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6.发明授权Optical position sensor, a position sensitive detector, a lithographic apparatus and a method for determining an absolute position of a movable object to be used in a relative position measurement system 有权光学位置传感器，位置敏感检测器，光刻设备和用于确定在相对位置测量系统中使用的可移动物体的绝对位置的方法公开(公告)号：US08384879B2
公开(公告)日：2013-02-26
申请号：US12499612
申请日：2009-07-08
CPC分类号： H01L31/02024 , G03F7/70775 , G03F7/7085
摘要： A sensor includes a semiconductor body having a top and bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of a second and opposite conductivity type at the bottom surface, wherein a sensitive area is defined where the first region overlaps with the second region. A resistive layer is partially arranged in the sensitive area. The sensor includes two first electrode contacts and two second electrode contacts, wherein the first electrode contacts are placed on the resistive layer to define a first detection area in the sensitive area between the first electrode contacts, and wherein the second electrode contacts are placed partially in the sensitive area on the bottom surface of the body, the surfaces of the second electrodes in the sensitive area defining a second detection area that overlaps with the first detection area.
摘要翻译： 传感器包括具有顶表面和底表面的半导体本体，在顶表面处具有第一导电类型的第一掺杂表面取向区域和位于底表面处的第二和相反导电类型的第二掺杂表面取向区域，其中 限定第一区域与第二区域重叠的敏感区域。 电阻层部分地布置在敏感区域中。 传感器包括两个第一电极触点和两个第二电极触点，其中第一电极触点放置在电阻层上以限定第一电极触点之间的敏感区域中的第一检测区域，并且其中第二电极触点部分地放置在 身体底表面上的敏感区域，敏感区域中第二电极的表面限定与第一检测区域重叠的第二检测区域。
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