公开(公告)号：US06030541A

公开(公告)日：2000-02-29

申请号：US100542

申请日：1998-06-19

申请人： James W. Adkisson ,  Michael Caterer ,  James T. Marsh ,  Hung Ng ,  James M. Oberschmidt ,  Jed H. Rankin

发明人： James W. Adkisson ,  Michael Caterer ,  James T. Marsh ,  Hung Ng ,  James M. Oberschmidt ,  Jed H. Rankin

IPC分类号： H01L21/027 ,  H01L21/28 ,  H01L21/3213 ,  H01L21/033

CPC分类号： H01L21/0276 ,  H01L21/28123 ,  H01L21/32139

摘要： A pattern in a surface is defined by providing on the surface a hard mask material; depositing an anti-reflective coating on the hard mask material; applying a photoresist layer on the anti-reflective coating; patterning the photoresist layer, anti-reflective layer and hard mask material; and removing the remaining portions of the photoresist layer and anti-reflective layer; and then patterning the substrate using the hard mask as the mask. Also provided is a structure for defining a pattern in a surface which comprises a surface having a hard mask material thereon; an anti-reflective coating located on the hard mask material; and a photoresist located on the anti-reflective coating. Also provided is an etchant composition for removing the hard mask material which comprises an aqueous composition of HF and chlorine.

摘要翻译： 通过在表面上提供硬掩模材料来限定表面中的图案; 在所述硬掩模材料上沉积抗反射涂层; 在抗反射涂层上施加光致抗蚀剂层; 图案化光致抗蚀剂层，抗反射层和硬掩模材料; 并除去光致抗蚀剂层和抗反射层的剩余部分; 然后使用硬掩模作为掩模来图案化衬底。 还提供了一种用于在表面上限定图案的结构，其包括其上具有硬掩模材料的表面; 位于硬掩模材料上的抗反射涂层; 以及位于抗反射涂层上的光致抗蚀剂。 还提供了用于除去硬掩模材料的蚀刻剂组合物，其包含HF和氯的水性组合物。