公开(公告)号：US06660394B1

公开(公告)日：2003-12-09

申请号：US09711532

申请日：2000-11-14

申请人： Kenji Ishizuki ,  Tatsuya Shimizu ,  Michiaki Ando ,  Mibuko Shimada ,  Hiroshi Shiho

发明人： Kenji Ishizuki ,  Tatsuya Shimizu ,  Michiaki Ando ,  Mibuko Shimada ,  Hiroshi Shiho

IPC分类号： B32B2700

CPC分类号： C09D143/04 ,  C08L83/04 ,  C09D183/04 ,  Y10T428/31663 ,  C08L2666/14 ,  C08L2666/28 ,  C08L2666/04

摘要： Disclosed are a coating composition comprising a polymer dispersed in an aqueous medium, the polymer containing (a) a hydrolysate of an organosilane and/or a condensation product thereof and (b) a vinyl polymer containing a silyl group having a silicon atom bound to a hydrolytic group and/or a hydroxyl group, and further comprising (c) an oxazoline derivative as a crosslinking agent and a hardened film obtained therefrom. The above coating composition completes the hardening reaction of a coating film at low temperature for a short period of time, high in hardness immediately after hardening, and having water resistance, weather resistance, organic chemical resistance, acid resistance, alkali resistance, wear resistance and durable adhesion.

摘要翻译： 公开了一种涂料组合物，其包含分散在水性介质中的聚合物，所述聚合物含有（a）有机硅烷和/或其缩合产物的水解产物和（b）含有具有硅原子的甲硅烷基的乙烯基聚合物， 水解基和/或羟基，并且还包含（c）作为交联剂的恶唑啉衍生物和由其获得的硬化膜。 上述涂料组合物在低温下短时间完成涂膜的硬化反应，硬化后刚刚硬化，耐水性，耐候性，耐有机化学性，耐酸性，耐碱性，耐磨性和耐酸性， 耐用的粘合力。

公开(公告)号：US06786944B2

公开(公告)日：2004-09-07

申请号：US10412385

申请日：2003-04-14

申请人： Masayuki Hattori ,  Michiaki Ando ,  Kazuo Nishimoto ,  Nobuo Kawahashi

发明人： Masayuki Hattori ,  Michiaki Ando ,  Kazuo Nishimoto ,  Nobuo Kawahashi

IPC分类号： C09G102

CPC分类号： C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053

摘要： An aqueous dispersion for chemical mechanical polishing that is hard to putrefy, scarcely causes scratches, causes only small dishing and is suitable for used in a micro isolating step or a planarizing step of an inter layer dielectric in production of semiconductor devices, which dispersion comprises ceria particles, a preservative composed of a compound having a heterocyclic structure containing a nitrogen atom and a sulfur atom in the ring, such as an isothiazolone compound, and an organic component such as organic abrasive grains composed of resin particles, a dispersing agent composed of a water-soluble polymer having a specific molecular weight or the like, a surfactant and/or an organic acid or a salt thereof contained in an aqueous medium, wherein the ceria particles, preservative and organic component are contained in proportions of 0.1 to 20% by mass, 0.001 to 0.2% by mass and 0.1 to 30% by mass, respectively, when the total proportion of the aqueous medium, ceria particles, preservative and organic component is 100% by mass, and wherein the pH of this aqueous dispersion can be kept in a neutral range.

摘要翻译： 用于化学机械抛光的水性分散体难以腐蚀，几乎不引起划痕，仅导致小的凹陷，并且适合用于半导体器件生产中的微层间电介质的微隔离步骤或平面化步骤，该分散体包括二氧化铈 颗粒，由具有在环中含有氮原子和硫原子的杂环结构的化合物组成的防腐剂，例如异噻唑酮化合物，以及有机成分，例如由树脂颗粒组成的分散剂，由 包含在水性介质中的具有特定分子量的水溶性聚合物，表面活性剂和/或有机酸或其盐，其中二氧化铈颗粒，防腐剂和有机组分的含量为0.1〜20％ 质量，0.001〜0.2质量％和0.1〜30质量％，当水性介质，二氧化铈颗粒， 防腐剂和有机成分为100质量％，并且其中该水分散体的pH可以保持在中性范围。

公开(公告)号：US06740629B2

公开(公告)日：2004-05-25

申请号：US10166111

申请日：2002-06-11

申请人： Michiaki Ando ,  Nobuo Kawahashi ,  Masayuki Hattori

发明人： Michiaki Ando ,  Nobuo Kawahashi ,  Masayuki Hattori

IPC分类号： C11D322

CPC分类号： C11D7/06 ,  C11D7/265 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047

摘要： An object of the present invention is to provide a composition for washing a polishing pad which removes a water-insoluble compound which was separated from a surface to be polished during polishing, formed at least on the surface of a polishing pad, and comprised a metal ion ionized, and a method for washing a polishing pad using the same. The composition for washing a polishing pad of the present invention is obtained by, in the case a water-insoluble compound is a copper quinaldinic acid complex, blending ammonia as a component for rendering the water-insoluble compound water-soluble and glycine as a water-soluble complex forming component for forming a water-soluble complex with a copper ion, and stirring them. In addition, in a method for washing a polishing pad using the composition for washing a polishing pad, a polishing pad can be washed effectively, the productivity can be improved and, further, consumption of a polishing pad can be inhibited.

摘要翻译： 本发明的目的是提供一种用于清洗抛光垫的组合物，该组合物至少在抛光垫的表面上形成一抛光垫，该组合物除去在抛光过程中从抛光表面分离的水不溶性化合物， 离子电离，以及使用其抛光垫的洗涤方法。 用于洗涤本发明的抛光垫的组合物是通过在水不溶性化合物是铜喹喔啉酸络合物的情况下，将氨作为使水不溶性化合物水溶性和甘氨酸作为水的组分混合而获得的 用于与铜离子形成水溶性络合物，并搅拌它们。 此外，在使用洗涤抛光垫的组合物洗涤抛光垫的方法中，可以有效地洗涤抛光垫，可以提高生产率，并且还可以抑制抛光垫的消耗。