公开(公告)号：US20080066339A1

公开(公告)日：2008-03-20

申请号：US11531905

申请日：2006-09-14

申请人： Mike Wallis ,  Sean Harbison ,  John McEntee

发明人： Mike Wallis ,  Sean Harbison ,  John McEntee

IPC分类号： F26B19/00 ,  F26B25/00 ,  F26B3/00

CPC分类号： H01L21/67034 ,  H01L21/67757 ,  H01L21/68707

摘要： A system for drying a work piece is provided. The system includes a chamber containing a cleaning fluid in a first portion of the chamber and a drying region. The system includes a wet transition arm configured to support a plurality of work pieces while disposed in the cleaning fluid. A dry transition arn configured to accept the plurality of work pieces from the wet transition arm as the wet transition arm is being raised is also included. The dry transition arm and the wet transition arm are coupled to a common drive mechanism, wherein the common drive mechanism includes a first and a second motor. The first motor is configured to drive both the wet and dry transition arms. The second motor is configured to control an amount of separation between the wet and dry transition arms. A transition arm and method for drying a work piece are provided.

摘要翻译： 提供了一种干燥工件的系统。 该系统包括在腔室的第一部分中包含清洁流体的腔室和干燥区域。 该系统包括被配置为在设置在清洁流体中时支撑多个工件的湿过渡臂。 还包括一个干式过渡段，用于随着湿式过渡臂的升高而从湿过渡臂接收多个工件。 干式过渡臂和湿过渡臂联接到公共驱动机构，其中公共驱动机构包括第一和第二电动机。 第一个电机被配置为驱动潮湿和干燥的过渡臂。 第二马达被配置为控制湿式和干式过渡臂之间的分离量。 提供了一种用于干燥工件的过渡臂和方法。

公开(公告)号：US06464796B2

公开(公告)日：2002-10-15

申请号：US09866031

申请日：2001-05-25

申请人： Jim Vail ,  Mike Wallis

发明人： Jim Vail ,  Mike Wallis

IPC分类号： B08B100

CPC分类号： H01L21/67046 ,  B08B1/04 ,  B08B3/02 ,  Y10S118/15

摘要： A method of applying a fluid to a brush is provided. The method includes outputting a flow of fluid from a shaft to an area between the shaft and a distributor where the flow of fluid is restricted by the distributor to generate a uniform pressure buildup inside of the distributor. The method further includes delivering the fluid from the area through at least one opening in the distributor to an outer surface of the distributor where the outer surface of the distributor abuts an inner surface of a housing. The method additionally includes dispensing the fluid from between the outer surface of the distributor and the inner surface of the housing to an outer surface of the housing through at least one perforation in the housing, the housing being attached to a brush. The method also includes applying the fluid through the brush where the fluid is received from the outer surface of the housing. The uniform pressure buildup inside of the distributor enables the brush from end to end to receive an approximate equal amount of liquid.

摘要翻译： 提供了将流体施加到刷子的方法。 该方法包括将流体从轴输送到轴与分配器之间的区域，其中流体流被分配器限制，以在分配器内部产生均匀的压力累积。 该方法还包括将流体从区域中通过分配器中的至少一个开口输送到分配器的外表面，其中分配器的外表面邻接壳体的内表面。 该方法还包括通过壳体中的至少一个穿孔将流体从分配器的外表面和壳体的内表面分配到壳体的外表面，壳体附接到刷子。 该方法还包括将流体从壳体的外表面上施加流体通过刷子接收流体。 分配器内部均匀的压力累积使刷子从端到端接收大致相等量的液体。

公开(公告)号：US06457199B1

公开(公告)日：2002-10-01

申请号：US09687622

申请日：2000-10-12

申请人： David T. Frost ,  Oliver David Jones ,  Mike Wallis

发明人： David T. Frost ,  Oliver David Jones ,  Mike Wallis

IPC分类号： B08B1102

CPC分类号： H01L21/67178 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67057 ,  H01L21/67207 ,  H01L21/67745 ,  Y10S134/902

摘要： A system and methods for substrate preparation are provided. In one example, a wafer processing system includes a system enclosure that contains wafer processing apparatus within an isolated wafer processing environment. The wafer processing apparatus include a pair of immersion tanks in the lower front region of the system with a pair of wafer pickers behind the immersion tanks to extract wafers from the tanks. In the rear of the system, a pair of brush boxes are located in a lower region with a pair of dryer units positioned above the brush boxes. A robot arm is positioned between the pair of immersion tanks and the pair of brush boxes in a middle region of the system, and is configured to transition wafers between the processing apparatus. A pair of output shelves holding output cassettes is positioned over the immersion tanks. The output cassettes receive clean wafers after processing. In another example, a method for preparing a substrate is provided. The method includes the batch processing of substrates through substrate processing apparatus arranged within a substrate processing system.

摘要翻译： 提供了一种用于底物制备的系统和方法。 在一个示例中，晶片处理系统包括在隔离晶片处理环境内包含晶片处理装置的系统外壳。 晶片处理装置包括在系统的下前部区域中的一对浸没池，在浸没池之后具有一对晶片拾取器，以从罐中提取晶片。 在系统的后部，一对刷盒位于下部区域中，一对干燥器单元位于刷盒的上方。 机器人臂位于系统的中间区域中的一对浸入池和一对刷盒之间，并且被配置为在处理装置之间转移晶片。 保持输出盒的一对输出架被放置在浸没池的上方。 输出盒在处理后接收干净的晶圆。 在另一个实例中，提供了制备衬底的方法。 该方法包括通过设置在基板处理系统内的基板处理装置批量处理基板。

公开(公告)号：US06637446B2

公开(公告)日：2003-10-28

申请号：US10211714

申请日：2002-08-01

申请人： David T. Frost ,  Oliver David Jones ,  Mike Wallis

发明人： David T. Frost ,  Oliver David Jones ,  Mike Wallis

IPC分类号： B08B312

CPC分类号： H01L21/67178 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67057 ,  H01L21/67207 ,  H01L21/67745 ,  Y10S134/902

摘要： A system and methods for substrate preparation are provided. In one example, a wafer processing system includes a system enclosure that contains wafer processing apparatus within an isolated wafer processing environment. The wafer processing apparatus include a pair of immersion tanks in the lower front region of the system with a pair of wafer pickers behind the immersion tanks to extract wafers from the tanks. In the rear of the system, a pair of brush boxes are located in a lower region with a pair of dryer units positioned above the brush boxes. A robot arm is positioned between the pair of immersion tanks and the pair of brush boxes in a middle region of the system, and is configured to transition wafers between the processing apparatus. A pair of output shelves holding output cassettes is positioned over the immersion tanks. The output cassettes receive clean wafers after processing.

摘要翻译： 提供了一种用于底物制备的系统和方法。 在一个示例中，晶片处理系统包括在隔离晶片处理环境内包含晶片处理装置的系统外壳。 晶片处理装置包括在系统的下前部区域中的一对浸没池，在浸没池之后具有一对晶片拾取器，以从罐中提取晶片。 在系统的后部，一对刷盒位于下部区域中，一对干燥器单元位于刷盒的上方。 机器人臂位于系统的中间区域中的一对浸入池和一对刷盒之间，并且被配置为在处理装置之间转移晶片。 保持输出盒的一对输出架被放置在浸没池的上方。 输出盒在处理后接收干净的晶圆。

公开(公告)号：US08707971B2

公开(公告)日：2014-04-29

申请号：US12122571

申请日：2008-05-16

申请人： Kenneth C. Miller ,  Mike Wallis

发明人： Kenneth C. Miller ,  Mike Wallis

IPC分类号： H01L21/02

CPC分类号： H01L21/6719 ,  B05D3/0272 ,  H01L21/67034 ,  Y10T137/85938

摘要： A chamber with a fluid distribution network for uniform fluid flow within the chamber is provided. The chamber includes a first chamber wall that has a first surface and an opposing interior surface. The first surface is formed with a first set of channels, and the interior surface is exposed to the interior of the chamber and includes a plurality of interior ports that are connected to a plurality of the first set of channels. The chamber also includes a second chamber wall that has a second surface and an opposing exterior surface. The second surface has a second set of channels that partially intersect the first set of channels when the first surface is mated with the second surface. The exterior surface also includes at least one exterior port that provides access to the second set of channels.

摘要翻译： 提供了具有流体分配网络的腔室，用于在腔室内均匀地流动流体。 该室包括具有第一表面和相对的内表面的第一室壁。 所述第一表面形成有第一组通道，并且所述内表面暴露于所述室的内部，并且包括连接到多个所述第一组通道的多个内部端口。 该室还包括具有第二表面和相对的外表面的第二室壁。 当第一表面与第二表面配合时，第二表面具有与第一组通道部分相交的第二组通道。 外表面还包括提供对第二组通道的访问的至少一个外部端口。

公开(公告)号：US06247197B1

公开(公告)日：2001-06-19

申请号：US09112666

申请日：1998-07-09

申请人： Jim Vail ,  Mike Wallis

发明人： Jim Vail ,  Mike Wallis

IPC分类号： B08B104

CPC分类号： H01L21/67046 ,  B08B1/04 ,  B08B3/02 ,  Y10S118/15

摘要： A brush assembly includes a distributor having a slot matrix formed in an outer surface of the distributor, the slot matrix including a plurality of longitudinal slots intersecting a plurality of annular slots. The brush assembly further includes a housing having an inner surface abutting the outer surface of the distributor, a brush mounted on the housing and a shaft. During use, the flow of liquid from the shaft to the housing flows through the longitudinal slots and annular slots of the distributor. By appropriately selecting the dimensions and numbers of these slots, the flow of liquid from the shaft to the housing is readily redistributed. For example, the flow of liquid is redistributed to provide a greater amount of liquid to the ends of the brush than to the center of the brush.

摘要翻译： 刷组件包括具有形成在分配器的外表面中的槽矩阵的分配器，所述槽矩阵包括与多个环形槽交叉的多个纵向槽。 刷子组件还包括具有邻接分配器的外表面的内表面的外壳，安装在外壳上的电刷和轴。 在使用期间，液体从轴流到壳体的流动通过分配器的纵向槽和环形槽。 通过适当地选择这些槽的尺寸和数量，液体从轴到外壳的流动很容易重新分配。 例如，重新分配液体的流动，以向刷子的端部提供比刷子的中心更大量的液体。

公开(公告)号：US20100293810A1

公开(公告)日：2010-11-25

申请号：US12850541

申请日：2010-08-04

申请人： Mike Wallis ,  Sean Harbison ,  John McEntee

发明人： Mike Wallis ,  Sean Harbison ,  John McEntee

IPC分类号： F26B19/00 ,  F26B25/00

CPC分类号： H01L21/67034 ,  H01L21/67757 ,  H01L21/68707

摘要： A method for drying a work piece is provided. The method includes raising a plurality of submerged workpieces supported on a first transition arm partially above a fluid/air interface and capturing the plurality of partially submerged workpieces during the raising by a second transition arm located above the fluid/air interface. A system for drying a workpiece is also included.

摘要翻译： 提供了干燥工件的方法。 该方法包括将多个被浸没的工件支撑在第一过渡臂部分地位于流体/空气界面上方，并且在通过位于流体/空气界面上方的第二过渡臂在升高期间捕获多个部分浸没的工件。 还包括用于干燥工件的系统。

公开(公告)号：US20090283158A1

公开(公告)日：2009-11-19

申请号：US12122571

申请日：2008-05-16

申请人： KENNETH C. MILLER ,  Mike Wallis

发明人： KENNETH C. MILLER ,  Mike Wallis

IPC分类号： F16L41/02 ,  C23C16/00 ,  B05B1/36

CPC分类号： H01L21/6719 ,  B05D3/0272 ,  H01L21/67034 ,  Y10T137/85938

摘要： A chamber with a fluid distribution network for uniform fluid flow within the chamber is provided. The chamber includes a first chamber wall that has a first surface and an opposing interior surface. The first surface is formed with a first set of channels, and the interior surface is exposed to the interior of the chamber and includes a plurality of interior ports that are connected to a plurality of the first set of channels. The chamber also includes a second chamber wall that has a second surface and an opposing exterior surface. The second surface has a second set of channels that partially intersect the first set of channels when the first surface is mated with the second surface. The exterior surface also includes at least one exterior port that provides access to the second set of channels.

摘要翻译： 提供了具有流体分配网络的腔室，用于在腔室内均匀地流动流体。 该室包括具有第一表面和相对的内表面的第一室壁。 所述第一表面形成有第一组通道，并且所述内表面暴露于所述室的内部，并且包括连接到多个所述第一组通道的多个内部端口。 该室还包括具有第二表面和相对的外表面的第二室壁。 当第一表面与第二表面配合时，第二表面具有与第一组通道部分相交的第二组通道。 外表面还包括提供对第二组通道的访问的至少一个外部端口。