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公开(公告)号：US07330308B2
公开(公告)日：2008-02-12
申请号：US11074447
申请日：2005-03-08
申请人： Noriyasu Kiryu , Naoto Miki
发明人： Noriyasu Kiryu , Naoto Miki
IPC分类号： G02B21/26
CPC分类号： G02B27/62 , G02B6/3616 , G02B6/4225 , G02B6/4226 , G02B7/003 , G02B21/26
摘要： An alignment method of micro-alignment members includes a first step for moving a reticle, which is movably disposed between a first position and a second position, to face a first microscope in the first position, and for aligning a center of the reticle with an optical axis of the first microscope while observing the reticle by the first microscope, a second step for moving the reticle to the second position to face a second microscope in the second position, and for aligning the center of the reticle with an optical axis of the second microscope while observing the reticle by the second microscope, a third step for disposing a first micro-alignment member such that a center of the first micro-alignment member aligns with the optical axis of the second microscope, and a fourth step for disposing a second micro-alignment member instead of the reticle to face the first micro-alignment member.
摘要翻译： 微对准构件的对准方法包括：第一步骤，用于移动可移动地设置在第一位置和第二位置之间的掩模版，以在第一位置面对第一显微镜，并且用于将掩模版的中心与 通过第一显微镜观察掩模版的第一显微镜的光轴;第二步骤，用于在第二位置将光罩移动到第二位置以面对第二显微镜，并且用于使标线的中心与 第二显微镜，同时通过第二显微镜观察掩模版，第三步骤，用于设置第一微对准构件，使得第一微取向构件的中心与第二显微镜的光轴对准，第四步骤， 第二微取向构件代替掩模版以面对第一微取向构件。
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公开(公告)号：US07064820B2
公开(公告)日：2006-06-20
申请号：US10393833
申请日：2003-03-21
申请人： Hisashi Isozaki , Michihiro Yamazaki , Hiroshi Yoshikawa , Naoto Miki , Hiroyuki Maekawa , Naohiro Takahashi
发明人： Hisashi Isozaki , Michihiro Yamazaki , Hiroshi Yoshikawa , Naoto Miki , Hiroyuki Maekawa , Naohiro Takahashi
摘要： A surface inspection method in a surface inspection system which comprises a photodetection unit and a photodetection polarizing angle changing means, comprising the step of receiving a scattered reflection light from a substrate surface where standard particles are coated by changing a photodetection polarizing angle by the photodetection polarizing angle changing means, and the step of performing surface inspection by setting the photodetection polarizing angle to a condition where an S/N ratio of photodetection output is at the highest.
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公开(公告)号：US08179522B2
公开(公告)日：2012-05-15
申请号：US13223888
申请日：2011-09-01
申请人： Isao Minegishi , Masahiro Ohishi , Naoto Miki , Yuichi Yoshimura
发明人： Isao Minegishi , Masahiro Ohishi , Naoto Miki , Yuichi Yoshimura
IPC分类号： G01C3/08
CPC分类号： G01S17/36
摘要： A distance measuring device measures a distance from a phase difference of beaten down processing signals even when fluctuations occur in a frequency of an oscillator. The distance measuring device includes a laser unit, a dividing device, a reference light receiving unit, and a measuring light receiving unit. The distance measuring device further includes an oscillator, a first mixer, a second mixer, a fourth filter, a fifth filter, a third mixer, a sixth filter, a second filter, a phase difference measuring unit, and a distance measuring unit. The phase difference measuring unit measures a phase difference of the two beat signals extracted by the sixth filter and the second filter. The distance measuring unit measures a distance based on the phase difference measured by the phase difference measuring unit.
摘要翻译： 距离测量装置即使在振荡器的频率发生波动的情况下，也可以测量与殴打处理信号的相位差的距离。 该距离测量装置包括激光单元，分割装置，参考光接收单元和测量光接收单元。 测距装置还包括振荡器，第一混频器，第二混频器，第四滤波器，第五滤波器，第三混频器，第六滤波器，第二滤波器，相位差测量单元和距离测量单元。 相位差测量单元测量由第六滤波器和第二滤波器提取的两个拍频信号的相位差。 距离测量单元基于由相位差测量单元测量的相位差来测量距离。
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公开(公告)号：US20120033197A1
公开(公告)日：2012-02-09
申请号：US13223888
申请日：2011-09-01
申请人： Isao Minegishi , Masahiro Ohishi , Naoto Miki , Yuichi Yoshimura
发明人： Isao Minegishi , Masahiro Ohishi , Naoto Miki , Yuichi Yoshimura
IPC分类号： G01C3/08
CPC分类号： G01S17/36
摘要： A distance measuring device measures a distance from a phase difference of beaten down processing signals even when fluctuations occur in a frequency of an oscillator. The distance measuring device includes a laser unit, a dividing device, a reference light receiving unit, and a measuring light receiving unit. The distance measuring device further includes an oscillator, a first mixer, a second mixer, a fourth filter, a fifth filter, a third mixer, a sixth filter, a second filter, a phase difference measuring unit, and a distance measuring unit. The phase difference measuring unit measures a phase difference of the two beat signals extracted by the sixth filter and the second filter. The distance measuring unit measures a distance based on the phase difference measured by the phase difference measuring unit.
摘要翻译： 距离测量装置即使在振荡器的频率发生波动的情况下，也可以测量与殴打处理信号的相位差的距离。 该距离测量装置包括激光单元，分割装置，参考光接收单元和测量光接收单元。 测距装置还包括振荡器，第一混频器，第二混频器，第四滤波器，第五滤波器，第三混频器，第六滤波器，第二滤波器，相位差测量单元和距离测量单元。 相位差测量单元测量由第六滤波器和第二滤波器提取的两个拍频信号的相位差。 距离测量单元基于由相位差测量单元测量的相位差来测量距离。
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公开(公告)号：US6104481A
公开(公告)日：2000-08-15
申请号：US184075
申请日：1998-11-02
申请人： Akihiko Sekine , Yoichiro Iwa , Hiroaki Soma , Naoto Miki , Hisashi Isozaki , Hisakazu Yoshino
发明人： Akihiko Sekine , Yoichiro Iwa , Hiroaki Soma , Naoto Miki , Hisashi Isozaki , Hisakazu Yoshino
CPC分类号： G01N21/9501
摘要： A wafer surface inspection apparatus comprises a light source, an optical system for focusing the light beams from the light source onto the wafer surface, a scanning means for scanning the focused point over a predetermined range on the wafer surface, a photo detector including an photoelectric converter for sensing scattered light from the focused point, and a signal detector for detecting signals from the photo detector, in which the light source is a light source for emitting two different wavelengths, the optical system is adapted to focus the light beams of the two wavelengths on one and the same point on the wafer surface, and the photo detector is adapted to sense the two wavelengths separately, and further comprises a discriminating portion for discriminating between a foreign matter or a scratch on the wafer surface and a recess in a spot form existing on the wafer surface by utilizing outputs from the signal detector.
摘要翻译： 晶片表面检查装置包括光源，用于将来自光源的光束聚焦到晶片表面上的光学系统，用于在晶片表面上的预定范围上扫描聚焦点的扫描装置，包括光电 转换器，用于感测来自聚焦点的散射光;以及信号检测器，用于检测来自光检测器的信号，其中光源是用于发射两个不同波长的光源，光学系统适于聚焦两个光束 波长在晶片表面上的同一点上，并且光电检测器适于分别感测两个波长，并且还包括用于区分晶片表面上的异物或划痕和斑点中的凹陷的鉴别部分 通过利用来自信号检测器的输出在晶片表面上存在的形式。
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公开(公告)号：US07474388B2
公开(公告)日：2009-01-06
申请号：US11666669
申请日：2006-05-10
申请人： Fumio Ohtomo , Naoto Miki
发明人： Fumio Ohtomo , Naoto Miki
IPC分类号： G01C3/08
CPC分类号： G01S7/497 , G01C3/08 , G01C15/002 , G01S17/36 , G01S17/42
摘要： The present invention provides a distance measuring device, which comprises a light projecting unit for projecting a distance measuring light (22) to an object to be measured, a reference reflection unit (55) provided relatively movable and arranged at a known position so as to traverse the projected distance measuring light, a photodetection unit (7) for receiving a reflection light from the object to be measured as a reflected distance measuring light (22′) and a reflection light from said reference reflection unit as an internal reference light (22″), and a control arithmetic unit (15) for calculating a distance to the object to be measured based on a photodetection signal relating to the reflected distance measuring light and based on a photodetection signal relating to the internal reference light.
摘要翻译： 本发明提供了一种距离测量装置，其包括用于将测距光（22）投射到被测量物体的投光单元，设置为相对可移动并布置在已知位置的参考反射单元（55），以便于 横穿投影距离测量光;光检测单元（7），用于接收来自被测量物体的反射光作为反射距离测量光（22'）和来自所述参考反射单元的反射光作为内部参考光（22 “），以及控制算术单元（15），用于基于与反射距离测量光相关的光电检测信号，并且基于与内部参考光相关的光检测信号来计算到被测量物体的距离。
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公开(公告)号：US20070263202A1
公开(公告)日：2007-11-15
申请号：US11666669
申请日：2006-05-10
申请人： Fumio Ohtomo , Naoto Miki
发明人： Fumio Ohtomo , Naoto Miki
IPC分类号： G01C3/08
CPC分类号： G01S7/497 , G01C3/08 , G01C15/002 , G01S17/36 , G01S17/42
摘要： The present invention provides a distance measuring device, which comprises a light projecting unit for projecting a distance measuring light (22) to an object to be measured, a reference reflection unit (55) provided relatively movable and arranged at a known position so as to traverse the projected distance measuring light, a photodetection unit (7) for receiving a reflection light from the object to be measured as a reflected distance measuring light (22′) and a reflection light from said reference reflection unit as an internal reference light (22″), and a control arithmetic unit (15) for calculating a distance to the object to be measured based on a photodetection signal relating to the reflected distance measuring light and based on a photodetection signal relating to the internal reference light.
摘要翻译： 本发明提供了一种距离测量装置，其包括用于将测距光（22）投射到被测量物体的投光单元，设置为相对可移动并布置在已知位置的参考反射单元（55），以便于 横穿投影距离测量光;光检测单元（7），用于接收来自被测量物体的反射光作为反射距离测量光（22'）和来自所述参考反射单元的反射光作为内部参考光（22 “），以及控制算术单元（15），用于基于与反射距离测量光相关的光电检测信号，并且基于与内部参考光相关的光检测信号来计算到被测量物体的距离。
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公开(公告)号：US20050200981A1
公开(公告)日：2005-09-15
申请号：US11074447
申请日：2005-03-08
申请人： Noriyasu Kiryu , Naoto Miki
发明人： Noriyasu Kiryu , Naoto Miki
CPC分类号： G02B27/62 , G02B6/3616 , G02B6/4225 , G02B6/4226 , G02B7/003 , G02B21/26
摘要： An alignment method of micro-alignment members includes a first step for moving a reticle, which is movably disposed between a first position and a second position, to face a first microscope in the first position, and for aligning a center of the reticle with an optical axis of the first microscope while observing the reticle by the first microscope, a second step for moving the reticle to the second position to face a second microscope in the second position, and for aligning the center of the reticle with an optical axis of the second microscope while observing the reticle by the second microscope, a third step for disposing a first micro-alignment member such that a center of the first micro-alignment member aligns with the optical axis of the second microscope, and a fourth step for disposing a second micro-alignment member instead of the reticle to face the first micro-alignment member.
摘要翻译： 微对准构件的对准方法包括：第一步骤，用于移动可移动地设置在第一位置和第二位置之间的掩模版，以在第一位置面对第一显微镜，并且将掩模版的中心与 通过第一显微镜观察掩模版的第一显微镜的光轴;第二步骤，用于在第二位置将光罩移动到第二位置以面对第二显微镜，并且用于使标线的中心与 第二显微镜，同时通过第二显微镜观察掩模版，第三步骤，用于设置第一微对准构件，使得第一微取向构件的中心与第二显微镜的光轴对准，第四步骤， 第二微取向构件代替掩模版以面对第一微取向构件。
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