公开(公告)号：US07525115B2

公开(公告)日：2009-04-28

申请号：US10554048

申请日：2004-04-20

申请人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

发明人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

IPC分类号： G01N23/04 ,  G01N21/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N21/956 ,  G03F1/24 ,  G03F1/84

摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.

摘要翻译： 用于检查物体的装置，特别是在微光刻中的掩模，其设置在真空室中。 该装置包括用于将从物体发射的照射辐射转换成更高波长的辐射的转换器。 用于记录图像的传感器设置在真空室的外部并且被布置为从真空室到转换器的传感器的光学界面，或者将图像透镜的至少一部分布置成在真空室中的窗口。

公开(公告)号：US20060262306A1

公开(公告)日：2006-11-23

申请号：US10554048

申请日：2004-04-20

申请人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

发明人： Hans-Juergen Dobschal ,  Wolfgang Harnisch ,  Thomas Scheruebl ,  Nobert Rosenkranz ,  Ralph Semmler

IPC分类号： G01N21/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N21/956 ,  G03F1/24 ,  G03F1/84

摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.