公开(公告)号：US20090197017A1

公开(公告)日：2009-08-06

申请号：US12362105

申请日：2009-01-29

申请人： Koichiro TANAKA ,  Takahiro IBE ,  Kohei YOKOYAMA ,  Hisao IKEDA ,  Norifumi TAKESUE

发明人： Koichiro TANAKA ,  Takahiro IBE ,  Kohei YOKOYAMA ,  Hisao IKEDA ,  Norifumi TAKESUE

IPC分类号： B01J19/12

CPC分类号： H01L51/0013 ,  B05D5/12 ,  B41M5/38214 ,  C23C14/048 ,  H01L51/56

摘要： A first substrate which includes a reflective layer having an opening, a light-absorbing layer, and a material layer formed in contact with the light-absorbing layer over one of surfaces is provided; the surface of the first substrate over which the material layer is formed and a deposition target surface of the second substrate are disposed to face each other; and irradiation with laser light whose repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat a part of the material layer at a position overlapping with the opening of the reflective layer and deposit the part of the material layer over the deposition target surface of the second substrate.

摘要翻译： 提供一种第一基板，其包括具有开口的反射层，光吸收层和在一个表面上与所述光吸收层接触形成的材料层; 形成材料层的第一基板的表面和第二基板的沉积目标表面相对配置; 并且从第一基板的另一表面侧进行重复频率大于或等于10MHz并且脉冲宽度大于或等于100fs且小于或等于10ns的激光的照射，以选择性地加热 在与反射层的开口重叠的位置处的材料层的一部分，并将材料层的一部分沉积在第二基板的沉积靶表面上。

公开(公告)号：US08821963B2

公开(公告)日：2014-09-02

申请号：US12362105

申请日：2009-01-29

申请人： Koichiro Tanaka ,  Takahiro Ibe ,  Kohei Yokoyama ,  Hisao Ikeda ,  Norifumi Takesue

发明人： Koichiro Tanaka ,  Takahiro Ibe ,  Kohei Yokoyama ,  Hisao Ikeda ,  Norifumi Takesue

IPC分类号： H01L51/00 ,  B41M5/382 ,  B41M5/40 ,  B05D5/12

CPC分类号： H01L51/0013 ,  B05D5/12 ,  B41M5/38214 ,  C23C14/048 ,  H01L51/56

摘要： A first substrate which includes a reflective layer having an opening, a light-absorbing layer, and a material layer formed in contact with the light-absorbing layer over one of surfaces is provided; the surface of the first substrate over which the material layer is formed and a deposition target surface of the second substrate are disposed to face each other; and irradiation with laser light whose repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat a part of the material layer at a position overlapping with the opening of the reflective layer and deposit the part of the material layer over the deposition target surface of the second substrate.

摘要翻译： 提供一种第一基板，其包括具有开口的反射层，光吸收层和在一个表面上与所述光吸收层接触形成的材料层; 形成材料层的第一基板的表面和第二基板的沉积目标表面相对配置; 并且从第一基板的另一表面侧进行重复频率大于或等于10MHz并且脉冲宽度大于或等于100fs且小于或等于10ns的激光的照射，以选择性地加热 在与反射层的开口重叠的位置处的材料层的一部分，并将材料层的一部分沉积在第二基板的沉积靶表面上。