公开(公告)号：US06958123B2

公开(公告)日：2005-10-25

申请号：US10167272

申请日：2002-06-10

申请人： Jason S. Reid ,  Nungavaram S. Viswanathan

发明人： Jason S. Reid ,  Nungavaram S. Viswanathan

IPC分类号： B81B3/00 ,  C23F1/00 ,  H01L21/00

CPC分类号： B81C1/00476 ,  B81B2201/045 ,  B81C2201/0108 ,  B81C2201/112 ,  B81C2201/117 ,  B82Y30/00

摘要： A method comprises depositing an organic material on a substrate; depositing additional material different from the organic material after depositing the organic material; and removing the organic material with a compressed fluid. Also disclosed is a method comprising: providing an organic layer on a substrate; after providing the organic layer, providing one or more layers of a material different than the organic material of the organic layer; removing the organic layer with a compressed fluid; and providing an anti-stiction agent with a compressed fluid to material remaining after removal of the organic layer.

摘要翻译： 一种方法包括在衬底上沉积有机材料; 在沉积有机材料之后沉积与有机材料不同的附加材料; 并用压缩流体除去有机材料。 还公开了一种方法，包括：在衬底上提供有机层; 在提供有机层之后，提供与有机层的有机材料不同的一层或多层材料; 用压缩流体去除有机层; 并且在去除有机层之后向剩余的材料提供具有压缩流体的抗静电剂。

公开(公告)号：UST973008I4

公开(公告)日：1978-08-01

申请号：US858985

申请日：1977-12-09

申请人： Leon H. Kaplan ,  Nungavaram S. Viswanathan ,  Steven M. Zimmerman

发明人： Leon H. Kaplan ,  Nungavaram S. Viswanathan ,  Steven M. Zimmerman

IPC分类号： H05K3/06 ,  G03F7/42 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/423

摘要： organic materials, such as organic polymer resist layers, are removed from substrates by contacting the materials with a mixture consisting essentially of an alkali metal persulfate and concentrated (96%) sulfuric acid wherein the mixture contains from above about 13 to about 50 grams of alkali metal persulfate per 100 milliliters of sulfuric acid.