摘要:
A method of forming a thin film includes: forming a thin film on a substrate by discharging liquid material as a droplet; discharging the liquid material to a liquid material disposing-region that is wider than a thin film forming region; and drying the liquid material thereby to dispose a raising portion at the edge of the thin film in the outside of the thin film forming region.
摘要:
A droplet discharge device includes: a discharge unit discharging a droplet; an information obtaining unit obtaining workload information of the discharge unit while a predetermined pattern is formed on a discharged object; a temperature calculation unit calculating a prediction temperature of the discharge unit while the pattern is formed based on the workload information obtained by the information obtaining unit; and a temperature control unit controlling a temperature of the discharge unit at the prediction temperature calculated by the temperature calculation unit. In the device, the discharge unit and the discharged object of the droplet are relatively moved so as to form the predetermined pattern on the discharged object.
摘要:
A method is for controlling a droplet discharge device including at least a droplet discharge head having a plurality of nozzles for discharging droplets of a functional liquid, a plurality of drive elements provided corresponding to each of the nozzles, and a vibrating plate which is vibrated by the drive elements to discharge the functional liquid from the nozzles; and a flushing unit in which the vibrating plate undergoes microvibration when the droplet discharge head is in a standby period. The method for controlling a droplet discharge device includes selecting one of a plurality of predetermined microvibration control programs for causing the vibrating plate to undergo microvibration in accordance with information relating to the functional liquid, and controlling the drive elements to cause the vibrating plate to undergo microvibration when the droplet discharge head is in the standby period in accordance with the selected microvibration control program.
摘要:
A droplet discharge device includes: a discharge unit discharging a droplet and being moved relatively to a discharged object, on which the droplet is discharged, so as to form a predetermined pattern on the discharged object; a discharge amount measurement unit measuring a discharge amount of the droplet discharged from the discharge unit; a temperature acquisition unit acquiring a temperature of the droplet in the formation of the predetermined pattern; a temperature adjustment unit adjusting the temperature of the discharge unit; and a discharge amount adjustment unit adjusting the discharge amount of the discharge unit. In the device, the temperature adjustment unit adjusts a temperature of the droplet in the measurement of the discharge amount by the discharge amount measurement unit to the temperature in the formation of the predetermined pattern.
摘要:
A droplet discharge device includes: a discharge unit discharging a droplet and being moved relatively to a discharged object, on which the droplet is discharged, so as to form a predetermined pattern on the discharged object; a discharge amount measurement unit measuring a discharge amount of the droplet discharged from the discharge unit; a temperature acquisition unit acquiring a temperature of the droplet in the formation of the predetermined pattern; a temperature adjustment unit adjusting the temperature of the discharge unit; and a discharge amount adjustment unit adjusting the discharge amount of the discharge unit. In the device, the temperature adjustment unit adjusts a temperature of the droplet in the measurement of the discharge amount by the discharge amount measurement unit to the temperature in the formation of the predetermined pattern.
摘要:
A droplet discharge device includes: a discharge unit discharging a droplet and being moved relatively to a discharged object, on which the droplet is discharged, so as to form a predetermined pattern on the discharged object; a discharge amount measurement unit measuring a discharge amount of the droplet discharged from the discharge unit; a temperature acquisition unit acquiring a temperature of the discharge unit in the formation of the predetermined pattern; a temperature adjustment unit adjusting the temperature of the discharge unit; and a discharge amount adjustment unit adjusting the discharge amount of the discharge unit. In the device, the temperature adjustment unit adjusts a temperature of the discharge unit in the measurement of the discharge amount by the discharge amount measurement unit to the temperature in the formation of the predetermined pattern.
摘要:
A method of forming a thin film includes: forming a thin film on a substrate by discharging liquid material as a droplet; discharging the liquid material to a liquid material disposing-region that is wider than a thin film forming region; and drying the liquid material thereby to dispose a raising portion at the edge of the thin film in the outside of the thin film forming region.
摘要:
A plurality of element substrates are defined on a glass wafer. A seal portion containing a spacer is defined on a peripheral portion of each of the element substrates. A width measurement portion measures the width of each of the seal portions. A liquid ejecting portion ejects a droplet of liquid crystal onto a liquid crystal seal section encompassed by each seal portion by the amount corresponding to the width. This provides uniform distances between the element substrates and the associated color filter substrates.
摘要:
A droplet ejection apparatus includes a reservoir tank that retains liquid crystal, a substrate stage on which a mother substrate is mounted, and an ejection head that opposes the substrate stage. The ejection head and the stage are movable relative to each other. The ejection head includes a nozzle plate in which nozzles are defined. The ejection head pressurizes the liquid crystal supplied from the reservoir tank and thus ejects the liquid crystal from the nozzles onto the mother substrate. An ejection heat heater is provided around the ejection head for regulating the temperature of the liquid crystal. The ejection head heater has a projecting portion that projects from the nozzle plate toward the substrate stage. The projecting portion encompasses the nozzle plate. This maintains the viscosity of the liquid crystal in the vicinity of the nozzles at a sufficiently low level.
摘要:
A film-forming line is for forming a film on a substrate, and includes a surface-improving treatment device, a film-forming solution applicator, and a timer controller. The surface-improving treatment device is configured to perform a surface-improving treatment on the substrate. The film-forming solution applicator is configured to apply to the substrate a film-forming solution, which is for forming the film, after the substrate has been subjected to the surface-improving treatment by the surface-improving treatment device. The time controller is configured to obtain a time period since the time the surface-improving treatment is conducted by the surface-improving treatment device on the substrate. The present invention allows a film with a substantially uniform thickness to be formed on a substrate.