公开(公告)号：US08652341B2

公开(公告)日：2014-02-18

申请号：US12433128

申请日：2009-04-30

申请人： Thomas Gessner ,  Andreas Bertz ,  Reinhard Schubert ,  Thomas Werner ,  Wolfgang Hentsch ,  Reinhard Fendler ,  Lutz Koehler

发明人： Thomas Gessner ,  Andreas Bertz ,  Reinhard Schubert ,  Thomas Werner ,  Wolfgang Hentsch ,  Reinhard Fendler ,  Lutz Koehler

IPC分类号： C23F1/00 ,  C23F1/08

CPC分类号： C03C15/00 ,  C03C23/006 ,  C03C2204/08

摘要： A method and an apparatus for forming a structure on a component made of a material composed of silicon oxide, especially of silicate glass, glass ceramic or quartz, wherein in accordance with the process at least a first surface of the component a partial removal of the material by plasma etching takes place and during the plasma etching at least at the surface to be etched a substrate temperature is established which is substantially greater than 90° C. but less than the softening temperature of the material. The apparatus is equipped for this purpose with a heater for generating the substrate temperature.

摘要翻译： 一种用于在由氧化硅，特别是硅酸盐玻璃，玻璃陶瓷或石英组成的材料制成的部件上形成结构的方法和装置，其中根据该方法至少部件的第一表面部分去除 通过等离子体蚀刻发生材料，并且在等离子体蚀刻期间，至少在要蚀刻的表面处建立基板温度，其基本上大于90℃但小于材料的软化温度。 该装置为此用于产生衬底温度的加热器。

公开(公告)号：US08021515B2

公开(公告)日：2011-09-20

申请号：US11720113

申请日：2005-11-22

申请人： Pascal Colpo ,  François Rossi ,  Reinhard Fendler

发明人： Pascal Colpo ,  François Rossi ,  Reinhard Fendler

IPC分类号： C23C16/00 ,  H01L21/306

CPC分类号： H01J37/32458

摘要： An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The dielectric window (400) has an external and an internal side with respect to the chamber (12). An electromagnetic field source (140) is arranged in front of the external side of the dielectric window (400) for generating an electromagnetic field within the plasma chamber (12). The field source comprises at least one magnetic core (301, 302, 303). The at least one magnetic core (301, 302, 303) is attached to the external side of the dielectric window (400), such that the at least one magnetic core helps the dielectric window (400) to withstand collapsing forces caused by negative pressure inside said chamber during operation.

摘要翻译： 电感耦合等离子体处理装置（100）包括具有形成等离子体室（12）的自支撑壁元件的电介质窗（400）的等离子体室（12）。 电介质窗（400）具有相对于室（12）的外侧和内侧。 电磁场源（140）布置在电介质窗（400）的外侧的前面，用于在等离子体室（12）内产生电磁场。 场源包括至少一个磁芯（301,302,303）。 所述至少一个磁芯（301,302,303）附接到所述电介质窗（400）的外侧，使得所述至少一个磁芯有助于所述电介质窗（400）承受由负压引起的折叠力 在操作期间在所述室内。

公开(公告)号：US20090236311A1

公开(公告)日：2009-09-24

申请号：US12433128

申请日：2009-04-30

申请人： Thomas Gessner ,  Andreas Bertz ,  Reinhard Schubert ,  Thomas Werner ,  Wolfgang Hentsch ,  Reinhard Fendler ,  Lutz Koehler

发明人： Thomas Gessner ,  Andreas Bertz ,  Reinhard Schubert ,  Thomas Werner ,  Wolfgang Hentsch ,  Reinhard Fendler ,  Lutz Koehler

IPC分类号： C23F1/00 ,  C23F1/08

CPC分类号： C03C15/00 ,  C03C23/006 ,  C03C2204/08

摘要： A method and an apparatus for forming a structure on a component made of a material composed of silicon oxide, especially of silicate glass, glass ceramic or quartz, wherein in accordance with the process at least a first surface of the component a partial removal of the material by plasma etching takes place and during the plasma etching at least at the surface to be etched a substrate temperature is established which is substantially greater than 90° C. but less than the softening temperature of the material. The apparatus is equipped for this purpose with a heater for generating the substrate temperature.

摘要翻译： 一种用于在由氧化硅，特别是硅酸盐玻璃，玻璃陶瓷或石英组成的材料制成的部件上形成结构的方法和装置，其中根据该方法至少部件的第一表面部分去除 通过等离子体蚀刻发生材料，并且在等离子体蚀刻期间，至少在要蚀刻的表面处建立基板温度，其基本上大于90℃但小于材料的软化温度。 该装置为此用于产生衬底温度的加热器。

公开(公告)号：US20090223928A1

公开(公告)日：2009-09-10

申请号：US11720113

申请日：2005-11-22

申请人： Pascal Colpo ,  Francois Rossi ,  Reinhard Fendler

发明人： Pascal Colpo ,  Francois Rossi ,  Reinhard Fendler

IPC分类号： C23F1/00 ,  C23C16/00 ,  C23F1/08 ,  H05H1/24 ,  H01J37/32

CPC分类号： H01J37/32458

摘要： An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The dielectric window (400) has an external and an internal side with respect to the chamber (12). An electromagnetic field source (140) is arranged in front of the external side of the dielectric window (400) for generating an electromagnetic field within the plasma chamber (12). The field source comprises at least one magnetic core (301, 302, 303). The at least one magnetic core (301, 302, 303) is attached to the external side of the dielectric window (400), such that the at least one magnetic core helps the dielectric window (400) to withstand collapsing forces caused by negative pressure inside said chamber during operation.

摘要翻译： 电感耦合等离子体处理装置（100）包括具有形成等离子体室（12）的自支撑壁元件的电介质窗（400）的等离子体室（12）。 电介质窗（400）具有相对于室（12）的外侧和内侧。 电磁场源（140）布置在电介质窗（400）的外侧的前面，用于在等离子体室（12）内产生电磁场。 场源包括至少一个磁芯（301,302,303）。 所述至少一个磁芯（301,302,303）附接到所述电介质窗（400）的外侧，使得所述至少一个磁芯有助于所述电介质窗（400）承受由负压引起的折叠力 在操作期间在所述室内。