公开(公告)号：US08021515B2

公开(公告)日：2011-09-20

申请号：US11720113

申请日：2005-11-22

申请人： Pascal Colpo ,  François Rossi ,  Reinhard Fendler

发明人： Pascal Colpo ,  François Rossi ,  Reinhard Fendler

IPC分类号： C23C16/00 ,  H01L21/306

CPC分类号： H01J37/32458

摘要： An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The dielectric window (400) has an external and an internal side with respect to the chamber (12). An electromagnetic field source (140) is arranged in front of the external side of the dielectric window (400) for generating an electromagnetic field within the plasma chamber (12). The field source comprises at least one magnetic core (301, 302, 303). The at least one magnetic core (301, 302, 303) is attached to the external side of the dielectric window (400), such that the at least one magnetic core helps the dielectric window (400) to withstand collapsing forces caused by negative pressure inside said chamber during operation.

摘要翻译： 电感耦合等离子体处理装置（100）包括具有形成等离子体室（12）的自支撑壁元件的电介质窗（400）的等离子体室（12）。 电介质窗（400）具有相对于室（12）的外侧和内侧。 电磁场源（140）布置在电介质窗（400）的外侧的前面，用于在等离子体室（12）内产生电磁场。 场源包括至少一个磁芯（301,302,303）。 所述至少一个磁芯（301,302,303）附接到所述电介质窗（400）的外侧，使得所述至少一个磁芯有助于所述电介质窗（400）承受由负压引起的折叠力 在操作期间在所述室内。

公开(公告)号：US20090223928A1

公开(公告)日：2009-09-10

申请号：US11720113

申请日：2005-11-22

申请人： Pascal Colpo ,  Francois Rossi ,  Reinhard Fendler

发明人： Pascal Colpo ,  Francois Rossi ,  Reinhard Fendler

IPC分类号： C23F1/00 ,  C23C16/00 ,  C23F1/08 ,  H05H1/24 ,  H01J37/32

CPC分类号： H01J37/32458

摘要： An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The dielectric window (400) has an external and an internal side with respect to the chamber (12). An electromagnetic field source (140) is arranged in front of the external side of the dielectric window (400) for generating an electromagnetic field within the plasma chamber (12). The field source comprises at least one magnetic core (301, 302, 303). The at least one magnetic core (301, 302, 303) is attached to the external side of the dielectric window (400), such that the at least one magnetic core helps the dielectric window (400) to withstand collapsing forces caused by negative pressure inside said chamber during operation.

摘要翻译： 电感耦合等离子体处理装置（100）包括具有形成等离子体室（12）的自支撑壁元件的电介质窗（400）的等离子体室（12）。 电介质窗（400）具有相对于室（12）的外侧和内侧。 电磁场源（140）布置在电介质窗（400）的外侧的前面，用于在等离子体室（12）内产生电磁场。 场源包括至少一个磁芯（301,302,303）。 所述至少一个磁芯（301,302,303）附接到所述电介质窗（400）的外侧，使得所述至少一个磁芯有助于所述电介质窗（400）承受由负压引起的折叠力 在操作期间在所述室内。

公开(公告)号：US06321681B1

公开(公告)日：2001-11-27

申请号：US09341705

申请日：1999-09-20

申请人： Pascal Colpo ,  François Rossi ,  Jean-François Daviet ,  Roland Ernst

发明人： Pascal Colpo ,  François Rossi ,  Jean-François Daviet ,  Roland Ernst

IPC分类号： C23C1600

CPC分类号： H01J37/32477 ,  H01J37/321 ,  H01J37/32504 ,  H01J37/32623

摘要： A plasma processing apparatus comprises a processing chamber having at least one opening for receiving field energy by inductive coupling, and at least one field energy source arranged to induce the field energy into the chamber via the corresponding opening. The field energy source comprises an inductor device associated with a magnetic core. The magnetic core forms a closure and gas seal for the corresponding opening.

摘要翻译： 等离子体处理装置包括处理室，该处理室具有至少一个用于通过感应耦合接收场能的开口，以及至少一个场能量源，其布置成通过相应的开口将场能引入室。 场能源包括与磁芯相关联的电感器件。 磁芯形成用于相应开口的封闭和气密封。

公开(公告)号：US20140134714A1

公开(公告)日：2014-05-15

申请号：US14232359

申请日：2012-05-31

申请人： Andrea Valsesia ,  Franco Marabelli ,  Silvia Giudicatti ,  Gerardo Marchesini ,  François Rossi ,  Pascal Colpo

发明人： Andrea Valsesia ,  Franco Marabelli ,  Silvia Giudicatti ,  Gerardo Marchesini ,  François Rossi ,  Pascal Colpo

IPC分类号： G01N33/543

CPC分类号： G01N33/54373 ,  G01N21/554

摘要： A sensor device comprises a dielectric substrate (52); and a metal layer (53) on the substrate (52) with at least one array of cavities (54) therein and adapted to support L-SPR, each of the cavities (54) in the metal layer (53) having an opening (56) and a closed bottom (58) and widening from opening to bottom. A bed of dielectric material (62) is provided over the bottom (58) of each cavity (54) to reduce its apparent depth, the bed surface (62) being functionalized to bind to receptor moieties (64). This sensor device is particularly designed for SPR detection, but can be used in other detection techniques.

摘要翻译： 传感器装置包括电介质基片（52）; 和在衬底（52）上的金属层（53），其中具有至少一个空腔阵列（54）并且适于支撑L-SPR，金属层（53）中的每个空腔（54）具有开口 56）和封闭的底部（58），并从开口到底部变宽。 介电材料床（62）设置在每个空腔（54）的底部（58）上方以减小其表观深度，床表面（62）被功能化以结合受体部分（64）。 该传感器设备特别设计用于SPR检测，但可用于其他检测技术。

公开(公告)号：US06682630B1

公开(公告)日：2004-01-27

申请号：US10088512

申请日：2002-03-29

申请人： Pascal Colpo ,  François Rossi

发明人： Pascal Colpo ,  François Rossi

IPC分类号： C23C1600

CPC分类号： H01J37/3244 ,  H01J37/321

摘要： An apparatus configured to generate a time-varying magnetic field through a field admission window of a plasma processing chamber to create or sustain a plasma within the chamber by inductive coupling. The apparatus includes a magnetic core presenting a pole face structure,—an inductor means associated with the magnetic core, arranged to generate a time-varying magnetic field through the pole face structure, and—a device for injecting gas into the chamber and through the chamber and through the magnetic core.

摘要翻译： 一种被配置为通过等离子体处理室的场准入窗口产生时变磁场的装置，以通过电感耦合产生或维持室内的等离子体。 该装置包括呈现极面结构的磁芯， - 与磁芯相关联的电感器装置，布置成通过极面结构产生时变磁场，以及用于将气体注入腔室并通过 并通过磁芯。

公开(公告)号：US09395363B2

公开(公告)日：2016-07-19

申请号：US14232359

申请日：2012-05-31

申请人： Andrea Valsesia ,  Franco Marabelli ,  Silvia Giudicatti ,  Gerardo Marchesini ,  François Rossi ,  Pascal Colpo

发明人： Andrea Valsesia ,  Franco Marabelli ,  Silvia Giudicatti ,  Gerardo Marchesini ,  François Rossi ,  Pascal Colpo

IPC分类号： G01N33/543 ,  G01N21/552

CPC分类号： G01N33/54373 ,  G01N21/554

摘要： A sensor device comprises a dielectric substrate (52); and a metal layer (53) on the substrate (52) with at least one array of cavities (54) therein and adapted to support L-SPR, each of the cavities (54) in the metal layer (53) having an opening (56) and a closed bottom (58) and widening from opening to bottom. A bed of dielectric material (62) is provided over the bottom (58) of each cavity (54) to reduce its apparent depth, the bed surface (62) being functionalized to bind to receptor moieties (64). This sensor device is particularly designed for SPR detection, but can be used in other detection techniques.

摘要翻译： 传感器装置包括电介质基片（52）; 和在衬底（52）上的金属层（53），其中具有至少一个空腔阵列（54）并且适于支撑L-SPR，金属层（53）中的每个空腔（54）具有开口 56）和封闭的底部（58），并从开口到底部变宽。 介电材料床（62）设置在每个空腔（54）的底部（58）上方以减小其表观深度，床表面（62）被功能化以结合受体部分（64）。 该传感器设备特别设计用于SPR检测，但可用于其他检测技术。

公开(公告)号：US06692622B1

公开(公告)日：2004-02-17

申请号：US10129096

申请日：2002-05-10

申请人： Pascal Colpo ,  François Rossi

发明人： Pascal Colpo ,  François Rossi

IPC分类号： C23C1434

CPC分类号： H01J37/321

摘要： The plasma processing apparatus comprises a plasma chamber (1) bounded, on at least one side thereof, by an electrically conductive wall (10), said electrically conductive wall comprising one or several apertures (100) for interrupting a current path through said wall, external electromagnetic means (2) for supplying electromagnetic energy into the plasma chamber through the electrically conductive wall, thereby generating a plasma inside said chamber, and sealing means for sealing the apertures. The apparatus is characterised in that the sealing means comprises one or more electrically conductive enclosure elements which are electrically insulated from the electrically conductive wall.

摘要翻译： 等离子体处理装置包括在其至少一侧上由导电壁（10）限定的等离子体室（1），所述导电壁包括用于中断穿过所述壁的电流路径的一个或多个孔（100） 外部电磁装置（2），用于通过导电壁向等离子体室提供电磁能，从而在所述室内产生等离子体，以及用于密封孔的密封装置。 该装置的特征在于，密封装置包括与导电壁电绝缘的一个或多个导电外壳元件。

公开(公告)号：US06649223B2

公开(公告)日：2003-11-18

申请号：US10203763

申请日：2002-08-13

申请人： Pascal Colpo ,  François Rossi

发明人： Pascal Colpo ,  François Rossi

IPC分类号： H05H124

CPC分类号： H01J37/321

摘要： The apparatus for plasma treatment of a non-conductive hollow substrate (5), comprises a plasma chamber (12) provided with two oppositely facing field admission windows (8, 9), and first and second opposite coil arrangements (20, 30) located on an outer surface (8a; 9a) of the first and second windows respectively. The first and second coil arrangements being connected to power supply means (4) such that a current (I) of a same direction flows simultaneously in the first and second coil arrangements. The two coil arrangements (20, 30) induce through the substrate a magnetic flux (7) transversal and perpendicular to a substrate depth (L) for generating an electrical field in the substrate plan.

摘要翻译： 用于等离子体处理非导电性中空基板（5）的装置包括设置有两个相对面对的入射窗（8,9）的等离子体室（12），以及位于第一和第二相对的线圈装置（20,30） 分别在第一和第二窗口的外表面（8a; 9a）上。 第一和第二线圈装置连接到电源装置（4），使得相同方向的电流（I）在第一和第二线圈装置中同时流动。 两个线圈装置（20,30）通过衬底诱导横向和垂直于衬底深度（L）的磁通（7），用于在衬底平面图中产生电场。

公开(公告)号：US5563904A

公开(公告)日：1996-10-08

申请号：US281704

申请日：1994-07-28

申请人： Pascal Colpo ,  Jean Driole ,  Sylvian Witzke

发明人： Pascal Colpo ,  Jean Driole ,  Sylvian Witzke

IPC分类号： C22B9/02 ,  B22D11/115 ,  B22D39/00 ,  C22B9/16 ,  F27B14/06 ,  F27B14/18 ,  F27B14/20 ,  H05B6/34 ,  F27D23/04

CPC分类号： F27B14/061 ,  B22D11/115 ,  B22D39/003 ,  H05B6/34 ,  H05B2213/02

摘要： A process for melting an electroconductive material (1) in a melting furnace (10) by induction in a cold crucible includes electromagnetically confining a mass of the electroconductive material (1) up to its melting temperature. Then, at least one vortex is created in the liquid material to inclusion particles contained in the liquid electroconductive material. The vortex or vortices are created by electromagnetic stirring. A part of the mass of the liquid electroconductive material (1) is poured in a pouring tube (15) disposed under the melting furnace (10), subjecting the jet of the pouring of the liquid electroconductive material (1) to a radial electromagnetic confinement, and ensuring a vertical coaxial alignment of the electromagnetic fields acting on the mass of liquid electroconductive material (1) and on the pouring jet of the mass. An induction melting furnace employing a cold crucible for carrying out this is also disclosed.

摘要翻译： 通过在冷坩埚中感应熔化熔化炉（10）中的导电材料（1）的方法包括将导电材料（1）的质量电磁限制到其熔融温度。 然后，在液体材料中产生至少一个涡流到包含在液体导电材料中的夹杂物颗粒。 涡流或漩涡是通过电磁搅拌产生的。 将液体导电材料（1）的一部分注入设置在熔化炉（10）下方的倾倒管（15）中，使液体导电材料（1）的倾倒射流进行径向电磁限制 并且确保作用在液体导电材料（1）的质量上的电磁场和物料的倾倒射流的垂直同轴对准。 还公开了一种采用冷坩埚进行这种处理的感应熔炼炉。

公开(公告)号：US20120120401A1

公开(公告)日：2012-05-17

申请号：US13379073

申请日：2010-06-18

申请人： Andrea Valsesia ,  Pascal Colpo ,  Francois Rossi ,  Franco Marabelli

发明人： Andrea Valsesia ,  Pascal Colpo ,  Francois Rossi ,  Franco Marabelli

IPC分类号： G01N21/55

CPC分类号： G01N21/553 ,  G01N21/274 ,  G01N21/554

摘要： A SPR sensing method comprising the steps of: providing a SPR sensor comprising a SPR supporting sensor surface and contacting a sample to be analysed with the sensor surface. At least one resonance condition at said SPR supporting sensor surface is monitored by illuminating the sensor surface with an SPR exciting test light beam and sensing the reflected or transmitted test light beam. Additionally, the sensor surface is illuminated with a reference light beam under conditions selected so as not to excite SPR at said sensor surface and sensing the intensity of the reflected or transmitted reference light beam. At least one property of the reflected or transmitted test light beam is determined taking into account the sensed intensity of the reflected or transmitted reference light beam.

摘要翻译： SPR感测方法包括以下步骤：提供SPR传感器，其包括SPR支持的传感器表面并使待分析的样品与传感器表面接触。 通过用SPR激发测试光束照射传感器表面并感测反射或透射的测试光束来监测在所述SPR支撑传感器表面处的至少一个共振条件。 此外，传感器表面在被选择的条件下用参考光束照射，以便不在所述传感器表面处激发SPR并且感测被反射或透射的参考光束的强度。 考虑反射或透射的参考光束的感测强度来确定反射或透射的测试光束的至少一个特性。