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公开(公告)号:US20060087630A1
公开(公告)日:2006-04-27
申请号:US11212921
申请日:2005-08-29
申请人: Nicolaas Kemper , Henrikus Cox , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Nicolaas Kate , Martinus Hendrikus Leenders , Jeroen Mertens , Frits Meulen , Joost Ottens , Franciscus Maria Teunissen , Jan-Gerard Toorn , Martinus Verhagen , Marco Polizzi , Edwin Augustinus Van Gompel , Johannes Smeulers , Stefan Belfroid
发明人: Nicolaas Kemper , Henrikus Cox , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Nicolaas Kate , Martinus Hendrikus Leenders , Jeroen Mertens , Frits Meulen , Joost Ottens , Franciscus Maria Teunissen , Jan-Gerard Toorn , Martinus Verhagen , Marco Polizzi , Edwin Augustinus Van Gompel , Johannes Smeulers , Stefan Belfroid
IPC分类号: G03B27/52
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号:US20070114452A1
公开(公告)日:2007-05-24
申请号:US11285774
申请日:2005-11-23
申请人: Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
发明人: Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707
摘要: Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译: 平版印刷设备和设备制造方法在浸没式光刻设备中,通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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