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公开(公告)号：US20090174870A1
公开(公告)日：2009-07-09
申请号：US12289621
申请日：2008-10-30
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paul Blom , Ronald Harm Gunther Kramer , Michel van Putten , Ariel de Graaf
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paul Blom , Ronald Harm Gunther Kramer , Michel van Putten , Ariel de Graaf
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70733
摘要： A cleaning apparatus to clean a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the cleaning apparatus to clean a surface is also disclosed. The immersion lithographic apparatus may comprise a substrate table to support a substrate and a fluid confinement structure to at least partly confine immersion fluid between a projection system and a substrate table and/or substrate.
摘要翻译： 公开了一种用于清洁浸没式光刻设备的基板或部件的清洁装置。 清洁装置可以包括等离子体激光源，导管和激光束限制系统。 等离子体自由基源可以提供自由基流。 导管可以将来自等离子体源的源自由基提供到待清洁的表面。 自由基限制系统可以引导自由基清洁表面的局部化部分。 清洁装置可以包括旋转器并且可以被配置为清洁基板边缘。 还公开了包括清洁表面的清洁装置的浸没式光刻设备。 浸没式光刻设备可以包括用于支撑衬底和流体限制结构的衬底台，以至少部分地将浸没流体限制在投影系统和衬底台和/或衬底之间。
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公开(公告)号：US20090115979A1
公开(公告)日：2009-05-07
申请号：US12289537
申请日：2008-10-29
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Ronald Harm Gunther Kramer , Frederik Johannes Van Den Bogaard , Peter Gerardus Hubertus Maria Janssen
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Ronald Harm Gunther Kramer , Frederik Johannes Van Den Bogaard , Peter Gerardus Hubertus Maria Janssen
IPC分类号： G03B27/62
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/707 , G03F7/70916
摘要： A sampler, sample holder and an immersion lithographic apparatus comprising a sampler is disclosed. In an embodiment, a sampler is provided to collect particles in an immersion system of a lithographic apparatus. The sampler comprises a holder base having a collector surface. The collector surface is configured to collect and store contaminants. The sampler may be located on a surface of the immersion system so as to collect sample particles by contact of the collector surface with a liquid or with a surface of the immersion system. The sampler may be removable from the immersion lithographic apparatus for inspection.
摘要翻译： 公开了一种采样器，样品架和包括取样器的浸没式光刻设备。 在一个实施例中，提供采样器以收集光刻设备的浸没系统中的颗粒。 采样器包括具有收集器表面的保持器基座。 收集器表面被配置为收集和存储污染物。 采样器可以位于浸没系统的表面上，以便通过收集器表面与液体或浸没系统的表面接触来收集样品颗粒。 取样器可以从浸没式光刻设备中移除以进行检查。
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公开(公告)号：US20070281149A1
公开(公告)日：2007-12-06
申请号：US11447286
申请日：2006-06-06
IPC分类号： C09J5/00
CPC分类号： C09J5/00 , G03F7/70716 , G03F7/70775 , G03F7/70975 , Y10T428/265
摘要： The present invention relates to a method of assembling an object that includes providing a first object part having a first surface, providing a second object part having a second surface, positioning the first and the second object parts such that the first and the second surfaces face each other, wherein a gap is defined between the first and the second surfaces, applying a glue to at least a part of the gap, holding the first object part and the second object part at a distance during a period of time, wherein the gap is substantially filled with the glue due to capillary action and/or gravity, and moving the first and the second object parts toward each other to reduce the distance between the first and the second surfaces.
摘要翻译： 本发明涉及一种组装物体的方法，包括提供具有第一表面的第一物体部分，提供具有第二表面的第二物体部分，将第一和第二物体部分定位成使得第一和第二表面面对 彼此之间，在所述第一表面和所述第二表面之间限定间隙，在所述间隙的至少一部分上施加胶水，在一段时间内将所述第一物体部分和所述第二物体部分保持一定距离，其中所述间隙 由于毛细管作用和/或重力而基本上填充有胶水，并且使第一和第二物体部件朝向彼此移动以减小第一和第二表面之间的距离。
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