公开(公告)号：US20080017225A1

公开(公告)日：2008-01-24

申请号：US11490950

申请日：2006-07-24

申请人： Rubinder S. Randhawa ,  Shmuel Erez ,  Harry Christov ,  Basha Sajjad

发明人： Rubinder S. Randhawa ,  Shmuel Erez ,  Harry Christov ,  Basha Sajjad

IPC分类号： B08B3/00

CPC分类号： H01L21/67057 ,  H01L21/67313

摘要： A substrate holding and rotary driving mechanism, e.g., for a cleaning chamber with vertical orientation of the wafer, that is comprised of a three-armed spider which is rotatingly installed on the outer side of the cleaning chamber and rotatingly supports on the outer ends of its arms outer shafts with eccentrically arranged inner shafts. The inner shafts pass through the outer shafts into the cleaning chamber where they support contact rollers, while the opposite ends of the inner shafts support gears driven into rotation by a synchronous belt. The contact rollers can be moved apart for insertion or removal of wafers from and into the chamber. This is achieved by turning the spider with eccentric inner shafts in one or another direction.

摘要翻译： 基板保持和旋转驱动机构，例如用于具有晶片垂直取向的清洁室，其由旋转安装在清洁室的外侧上并旋转地支撑在外部的三臂蜘蛛构成， 其臂外轴具有偏心布置的内轴。 内轴通过外轴进入清洁室，在那里它们支撑接触辊，而内轴的相对端支撑由同步带驱动旋转的齿轮。 接触辊可以移开，以将晶片从腔室中进入或移出。 这是通过在一个或另一个方向上转动具有偏心内轴的蜘蛛来实现的。

公开(公告)号：US09202725B2

公开(公告)日：2015-12-01

申请号：US11490950

申请日：2006-07-24

申请人： Rubinder S. Randhawa ,  Shmuel Erez ,  Harry Christov ,  Basha Sajjad

发明人： Rubinder S. Randhawa ,  Shmuel Erez ,  Harry Christov ,  Basha Sajjad

IPC分类号： B65G47/24 ,  H01L21/67 ,  H01L21/673

CPC分类号： H01L21/67057 ,  H01L21/67313

摘要： A substrate holding and rotary driving mechanism, e.g., for a cleaning chamber with vertical orientation of the wafer, that is comprised of a three-armed spider which is rotatingly installed on the outer side of the cleaning chamber and rotatingly supports on the outer ends of its arms outer shafts with eccentrically arranged inner shafts. The inner shafts pass through the outer shafts into the cleaning chamber where they support contact rollers, while the opposite ends of the inner shafts support gears driven into rotation by a synchronous belt. The contact rollers can be moved apart for insertion or removal of wafers from and into the chamber. This is achieved by turning the spider with eccentric inner shafts in one or another direction.

摘要翻译： 基板保持和旋转驱动机构，例如用于具有晶片垂直取向的清洁室，其由旋转安装在清洁室的外侧上并旋转地支撑在外部的三臂蜘蛛构成， 其臂外轴具有偏心布置的内轴。 内轴通过外轴进入清洁室，在那里它们支撑接触辊，而内轴的相对端支撑由同步带驱动旋转的齿轮。 接触辊可以移开，以将晶片从腔室中进入或移出。 这是通过在一个或另一个方向上转动具有偏心内轴的蜘蛛来实现的。