公开(公告)号：US06203865B1

公开(公告)日：2001-03-20

申请号：US09357621

申请日：1999-07-20

Applicant: Andrzej R. Badzian ,  Rustum N. Roy ,  Pravin Mistry ,  Manuel C. Turchan

Inventor： Andrzej R. Badzian ,  Rustum N. Roy ,  Pravin Mistry ,  Manuel C. Turchan

IPC: C23C1648

CPC classification number: C23C16/27 ,  C23C16/483

Abstract: A method for producing well-crystallized adherent diamond layers on WC—Co substrates. An array of focused laser beams is scanned across the WC—Co sample. Useful lasers include the excimer, YAG:Nd, and carbon dioxide types. The process is conducted in open air with carbon dioxide and nitrogen gases delivered for shrouding the substrate. A luminous plasma is found a few mm above the WC—Co insert. The duration of the deposition process in a typical case is approximately 40 s. This typically gives 20-40 &mgr;m thick coatings. The vertical growth rate is about 1 &mgr;m/s.

Abstract translation: 一种用于在WC-Co基底上生产良好结晶的粘附金刚石层的方法。 在WC-Co样品上扫描聚焦激光束阵列。 有用的激光器包括准分子，YAG：Nd和二氧化碳类型。 该过程在露天进行，二氧化碳和氮气输送用于覆盖基材。 发现等离子体在WC-Co插入物上方几毫米。 在典型情况下，沉积过程的持续时间约为40秒。 这通常会给出20-40毫米厚的涂层。 垂直生长速度约为1mum / s。

公开(公告)号：US06370165B1

公开(公告)日：2002-04-09

申请号：US09357623

申请日：1999-07-20

Applicant: Andrzej R. Badzian ,  Rustum N. Roy ,  Theresa Badzian ,  William R. Drawl ,  Pravin Mistry ,  Manuel C. Turchan

Inventor： Andrzej R. Badzian ,  Rustum N. Roy ,  Theresa Badzian ,  William R. Drawl ,  Pravin Mistry ,  Manuel C. Turchan

IPC: H01S330

CPC classification number: C23C16/483 ,  C23C16/27

Abstract: A diamond coating formed on a WC—Co substrate prepared through a process including employing a plasma and a variety of interactions from a multiple laser system demonstrates exceptional adhesion and indicates a durable cubic diamond structure. The coating on the WC—Co substrate is typically between 25 and 40 &mgr;m thick and has an average crystal size of between 10 and 20 &mgr;m. Various methods of confirming the cubic diamond structure of the coatings have been employed. The adhesion of the diamond coating to the substrate is very strong. An electron microprobe analysis shows tungsten and cobalt atoms incorporated into the film and a layer depleted in cobalt exists at the diamond-WC—Co interface. Particulates of WC—Co—C alloy are spread over the top surface, apparently formed by condensation from the vapor phase of metal-containing molecules. Carbon is confirmed as being the main component of the surface layer.

Abstract translation: 通过包括采用等离子体和多种激光系统的相互作用的方法制备的在WC-Co基底上形成的金刚石涂层显示了出色的附着力并且表明了耐久的立方金刚石结构。 WC-Co基底上的涂层通常为25至40μm厚，平均晶体尺寸为10至20μm。 已经采用确认涂层的立方金刚石结构的各种方法。 金刚石涂层对基材的粘附性非常强。 电子探针分析显示结合到膜中的钨和钴原子，在金刚石WC-Co界面存在贫钴层。 WC-Co-C合金的颗粒分散在顶部表面，显然由含金属分子的气相的冷凝形成。 确认碳作为表层的主要成分。

公开(公告)号：US06200183B1

公开(公告)日：2001-03-13

申请号：US09357622

申请日：1999-07-20

Applicant: Andrzej R. Badzian ,  Rustum N. Roy ,  Theresa Badzian ,  William R. Drawl ,  Pravin Mistry ,  Manuel C. Turchan

Inventor： Andrzej R. Badzian ,  Rustum N. Roy ,  Theresa Badzian ,  William R. Drawl ,  Pravin Mistry ,  Manuel C. Turchan

IPC: H01J902

CPC classification number: C23C16/27 ,  C23C16/277 ,  C23C16/483 ,  H01J2201/30457

Abstract: The preparation and use of diamond as an electron emission material is disclosed. Satisfactory measurements were conducted on diamond coatings deposited on WC-Co alloy by a multiple pulsed laser process. The electron emission was measured in a diode configuration with a diamond surface-anode spacing of 20 and 50 &mgr;m in vacuum at P=10−7 Torr. Current densities of 6 mA/cm were calculated at an applied of voltage of 3000 V (for 20 &mgr;m). Analysis proved that electron field emission provided by a diamond grown by a multiple pulsed laser process proved to satisfactorily meet the specified demands.

Abstract translation: 公开了金刚石作为电子发射材料的制备和使用。 对通过多脉冲激光工艺沉积在WC-Co合金上的金刚石涂层进行了令人满意的测量。 在二极管配置中测量电子发射，金刚石表面 - 阳极间距为20和50微米，真空度为P = 10-7乇。 在施加的电压为3000V（20mum）下计算出6mA / cm 2的电流密度。 分析证明，通过多脉冲激光工艺生长的金刚石提供的电子场发射证明满足了特定的要求。