摘要:
A liquid crystal display device (LCD) includes a liquid crystal panel displaying an image; a first transparent plate disposed on the liquid crystal panel; a second transparent plate disposed underneath the liquid crystal panel; a support member supporting the second transparent plate and the liquid crystal panel; and a fixing member disposed on the first transparent plate, the fixing member coupled with the support member to fix the liquid crystal panel and the first and second transparent plates in place, and to protect the liquid crystal panel and the first and second transparent plates.
摘要:
A divided exposure method for a photolithography process is disclosed, which uses a mask. The mask for an exposer having a left and right light intensity deviation includes a substrate; a first pattern in a middle of the substrate; and second and third patterns on left and right sides of the first pattern, respectively, wherein the first and second patterns compensate for the left and right light intensity deviation of the exposer.
摘要:
A liquid crystal display device (LCD) includes a liquid crystal panel displaying an image; a first transparent plate disposed on the liquid crystal panel; a second transparent plate disposed underneath the liquid crystal panel; a support member supporting the second transparent plate and the liquid crystal panel; and a fixing member disposed on the first transparent plate, the fixing member coupled with the support member to fix the liquid crystal panel and the first and second transparent plates in place, and to protect the liquid crystal panel and the first and second transparent plates.
摘要:
A liquid crystal display device (LCD) includes a liquid crystal panel displaying an image; a first transparent plate disposed on the liquid crystal panel; a second transparent plate disposed underneath the liquid crystal panel; a support member supporting the second transparent plate and the liquid crystal panel; and a fixing member disposed on the first transparent plate, the fixing member coupled with the support member to fix the liquid crystal panel and the first and second transparent plates in place, and to protect the liquid crystal panel and the first and second transparent plates.
摘要:
A divided exposure method for a photolithography process is disclosed, which uses a mask. The mask for an exposer having a left and right light intensity deviation includes a substrate; a first pattern in a middle of the substrate; and second and third patterns on left and right sides of the first pattern, respectively, wherein the first and second patterns compensate for the left and right light intensity deviation of the exposer.
摘要:
A liquid crystal display device includes first and second substrates bonded to each other, first column spacers on the first substrate, protrusions on the second substrate that contact a center portion of an upper surface of the spacers, respectively, recesses formed in the second substrate surrounding the protrusions, respectively, and a liquid crystal layer between the first and second substrates.
摘要:
A base substrate includes a first liquid crystal display (LCD) panel and a second LCD panel on the base substrate, wherein the second LCD panel contacts the first LCD panel.
摘要:
A liquid crystal display device and methodology of fabricating the same includes a picture display part provided on a substrate; a tape carrier package mounted with an integrated circuit to drive the picture display part, the tape carrier package having first pads attached to the substrate; signal lines provided on the substrate to apply signals to the tape carrier package; and second pads having a larger width than the first pads, the second pads being provided on the substrate in such a manner to be connected to the signal lines, and the second pads being connected to the first pads.
摘要:
A liquid crystal display device is disclosed that is capable of preventing poor alignment caused by a column spacer to improve the contrast ratio. The liquid crystal display device includes a color filter and column spacers located between a first substrate and a second substrate. The column spacers maintain the cell gap between the first and second substrates. The color filter contains pixels having multiple sub-pixels of different colors. The column spacers in regions of sub-pixels of the same color are randomly formed within the regions.
摘要:
A divided exposure method for a photolithography process is disclosed, which uses a mask. The mask for an exposer having a left and right light intensity deviation includes a substrate; a first pattern in a middle of the substrate; and second and third patterns on left and right sides of the first pattern, respectively, wherein the first and second patterns compensate for the left and right light intensity deviation of the exposer.