Turbomachine Rotor Balancing System
    1.
    发明申请
    Turbomachine Rotor Balancing System 有权
    涡轮机转子平衡系统

    公开(公告)号:US20130236310A1

    公开(公告)日:2013-09-12

    申请号:US13417454

    申请日:2012-03-12

    IPC分类号: F01D5/02

    摘要: A turbine rotor balancing system comprises a circumferential array of mounting features. One or more balance weights are each mounted to the respective associated said mounting feature. Each balance weight comprises: a front wall along the forward face of the mounting feature; an aft wall along the aft face of the mounting feature; and a radially inboard wall. One or more fasteners each extend at least partially through holes of the front wall and rear wall of an associated said balance weight and through a hole of the associated said mounting feature. An abutment surface of the rotor is positioned to engage an outboard end of at least one of the front wall and aft wall of each said balance weight.

    摘要翻译: 涡轮转子平衡系统包括圆周阵列的安装特征。 一个或多个平衡重分别安装到相应的相关联的所述安装特征。 每个平衡重包括:沿着安装特征的前面的前壁; 沿着安装特征的后表面的后壁; 和径向内侧壁。 一个或多个紧固件至少部分地通过相关联的所述平衡重的前壁和后壁的孔并且穿过相关联的所述安装特征的孔延伸。 转子的邻接表面被定位成接合每个所述平衡重的前壁和后壁中的至少一个的外侧端。

    Foldable rigidified textile panels
    2.
    发明授权
    Foldable rigidified textile panels 失效
    可折叠硬化织物面板

    公开(公告)号:US4837066A

    公开(公告)日:1989-06-06

    申请号:US868902

    申请日:1986-05-29

    IPC分类号: B32B5/26

    摘要: A carpeting material of nonwoven synthetic thermoplastic resin fibers, capable of being folded so as to fit onto sharply irregular surfaces such as car trunk liners, made by the process of needle-looming a nonwoven carpeting material having higher and lower melting temperature synthetic thermoplastic resin fibers, subjecting the material to sufficient heat to soften and subsequently harden and rigidify one side of the carpeting, and then punching two substantially parallel rows of regularly spaced slots in the back side of the carpeting material. The slots of one row are arranged so that they are staggered in relation to the slots of the parallel row. The arrangement of slots in the back side of the carpeting enables it to be sharply folded while maintaining tear resistance.

    摘要翻译: 一种非织造合成热塑性树脂纤维的地毯材料,其能够被折叠以适合于诸如汽车后备箱的急剧不规则的表面上,该方法是通过针对具有较高和较低熔点的合成热塑性树脂纤维的无纺布地毯材料的方法 对材料进行足够的热量软化,然后使地毯的一侧硬化和硬化,然后在地毯材料的后侧冲压两条基本平行的规则间隔开的槽。 一排的槽布置成使得它们相对于平行排的槽交错。 在地毯的后侧的槽的布置使得它能够在保持抗撕裂性的同时被锐利地折叠。

    Turbomachine rotor balancing system
    3.
    发明授权
    Turbomachine rotor balancing system 有权
    涡轮机转子平衡系统

    公开(公告)号:US08888458B2

    公开(公告)日:2014-11-18

    申请号:US13417454

    申请日:2012-03-12

    IPC分类号: F01D5/10

    摘要: A turbine rotor balancing system comprises a circumferential array of mounting features. One or more balance weights are each mounted to the respective associated said mounting feature. Each balance weight comprises: a front wall along the forward face of the mounting feature; an aft wall along the aft face of the mounting feature; and a radially inboard wall. One or more fasteners each extend at least partially through holes of the front wall and rear wall of an associated said balance weight and through a hole of the associated said mounting feature. An abutment surface of the rotor is positioned to engage an outboard end of at least one of the front wall and aft wall of each said balance weight to resist outward radial movement of the weight.

    摘要翻译: 涡轮转子平衡系统包括圆周阵列的安装特征。 一个或多个平衡重分别安装到相应的相关联的所述安装特征。 每个平衡重包括:沿着安装特征的前面的前壁; 沿着安装特征的后表面的后壁; 和径向内侧壁。 一个或多个紧固件至少部分地通过相关联的所述平衡重的前壁和后壁的孔并且穿过相关联的所述安装特征的孔延伸。 转子的邻接表面被定位成接合每个所述平衡重的前壁和后壁中的至少一个的外侧端部,以抵抗重量的向外径向移动。

    Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles
    5.
    发明授权
    Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles 有权
    抛光垫可用于在含有磨料颗粒的浆料存在下对基材进行化学机械抛光

    公开(公告)号:US06890244B2

    公开(公告)日:2005-05-10

    申请号:US10664735

    申请日:2003-09-18

    CPC分类号: B24B37/24 B24B37/22

    摘要: A polishing pad for polishing semiconductors and other planar substrates in the presence of a slurry comprising abrasive particles and a dispersive agent is disclosed. The polishing pad includes a soluble component within a polymer matrix component. The soluble component includes particles soluble in the slurry sufficiently to provide a void structure in the polishing surface of the pad. The void structure enhances the polishing rate and uniformity by increasing the mobility of the abrasive particles while reducing scratching of the polished surface. Additives that further enhance polishing and/or assist in the removal of residues generated during polishing, such as surfactants and removers, are optionally incorporated in the soluble particles or topographically coated on the soluble particles.

    摘要翻译: 公开了一种用于在包含磨料颗粒和分散剂的浆料存在下研磨半导体和其它平面基板的抛光垫。 抛光垫包括聚合物基质组分内的可溶组分。 可溶性组分包括可溶于浆料中的颗粒,足以在垫的抛光表面中提供空隙结构。 空隙结构通过增加研磨颗粒的迁移率同时减少抛光表面的划伤来提高抛光速率和均匀性。 进一步增强抛光和/或有助于去除在抛光过程中产生的残留物(如表面活性剂和去除剂)的添加剂任选地并入可溶性颗粒中或地形上涂覆在可溶性颗粒上。

    Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles
    6.
    发明授权
    Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles 有权
    抛光垫可用于在含有磨料颗粒的浆料存在下对基材进行化学机械抛光

    公开(公告)号:US06656018B1

    公开(公告)日:2003-12-02

    申请号:US09545982

    申请日:2000-04-10

    IPC分类号: B24B100

    CPC分类号: B24B37/24 B24B37/22

    摘要: A polishing pad for polishing semiconductors and other planar substrates in the presence of a slurry comprising abrasive particles and a dispersive agent is disclosed. The polishing pad includes a soluble component, preferably fibrous, within a polymer matrix component. The fibrous component includes fibers soluble in the slurry sufficiently to provide a void structure in the polishing surface of the pad. The void structure enhances the polishing rate and uniformity by increasing the mobility of the abrasive particles while reducing scratching of the polished surface. Additives that further enhance polishing and/or assist in the removal of residues generated during polishing, such as surfactants and removers, are optionally incorporated in the fibrous substance or topographically coated on the fibrous substance.

    摘要翻译: 公开了一种用于在包含磨料颗粒和分散剂的浆料存在下研磨半导体和其它平面基板的抛光垫。 抛光垫在聚合物基质组分内包括可溶组分,优选纤维状。 纤维组分包括可溶于浆料的纤维,足以在垫的抛光表面中提供空隙结构。 空隙结构通过增加研磨颗粒的迁移率同时减少抛光表面的划伤来提高抛光速率和均匀性。 进一步增强抛光和/或辅助去除在抛光过程中产生的残留物(如表面活性剂和去除剂)的添加剂任选地并入纤维状物质中,或者以地形方式包被在纤维状物质上。