Deposition of uniform layer of desired material
    1.
    发明申请
    Deposition of uniform layer of desired material 审中-公开
    沉积所需材料的均匀层

    公开(公告)号:US20060275542A1

    公开(公告)日:2006-12-07

    申请号:US11143180

    申请日:2005-06-02

    IPC分类号: B05D1/12

    摘要: A process for the deposition of a thin film of a desired material on a surface comprising: (i) providing a continuous stream of amorphous solid particles of desired material suspended in at least one carrier gas, the solid particles having a volume-weighted mean particle diameter of less than 500 nm, at an average stream temperature below the glass transition temperature of the solid particles of desired material, (ii) passing the stream provided in (i) into a heating zone, and heating the stream in the heating zone to elevate the average stream temperature to above the glass transition temperature of the solid particles of desired material, wherein no substantial chemical transformation of the desired material occurs due to heating of the desired material, (iii) exhausting the heated stream from the heating zone through at least one distributing passage, at a rate substantially equal to its rate of addition to the heating zone in step (ii), wherein the carrier gas does not undergo a thermodynamic phase change upon passage through heating zone and distribution passage, and (iv) exposing a receiver surface that is at a temperature below the temperature of the heated stream to the exhausted flow of the heated stream, and depositing particles of the desired material to form a thin uniform layer of the desired material on the receiver surface.

    摘要翻译: 一种用于在表面上沉积所需材料的薄膜的方法,包括:(i)提供悬浮在至少一种载气中的所需材料的无定形固体颗粒的连续流,所述固体颗粒具有体积加权平均颗粒 直径小于500nm,平均流温度低于所需材料的固体颗粒的玻璃化转变温度,(ii)使(i)中提供的流进入加热区,并将加热区中的流加热至 将平均流温度提高到所需材料的固体颗粒的玻璃化转变温度以上,其中由于所需材料的加热而不会发生所需材料的实质化学转化,(iii)将加热的流从加热区排出通过 至少一个分配通道,其速率基本上等于其在步骤(ii)中加热区的加入速率,其中载气不经历 在通过加热区和分配通道的过程中,流体动力学相位变化,和(iv)使处于低于加热流的温度的温度的接收器表面暴露于经加热的流的排出的流中,并沉积所需材料的颗粒以形成 接收器表面上所需材料的薄均匀层。