公开(公告)号：US09830524B2

公开(公告)日：2017-11-28

申请号：US14239803

申请日：2012-05-24

申请人： Tomoko Sekiguchi ,  Takeyoshi Ohashi ,  Junichi Tanaka ,  Zhaohui Cheng ,  Ruriko Tsuneta ,  Hiroki Kawada ,  Seiko Hitomi

发明人： Tomoko Sekiguchi ,  Takeyoshi Ohashi ,  Junichi Tanaka ,  Zhaohui Cheng ,  Ruriko Tsuneta ,  Hiroki Kawada ,  Seiko Hitomi

IPC分类号： G01N23/22 ,  G06K9/46 ,  H01J37/317 ,  G01B15/04 ,  B82Y10/00 ,  B82Y40/00 ,  G06T7/00 ,  H01L21/66

CPC分类号： G06K9/4604 ,  B82Y10/00 ,  B82Y40/00 ,  G01B15/04 ,  G01N23/22 ,  G06T7/0004 ,  H01J37/3174 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2816 ,  H01J2237/31754 ,  H01J2237/31796 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).

公开(公告)号：US20150036914A1

公开(公告)日：2015-02-05

申请号：US14239803

申请日：2012-05-24

申请人： Tomoko Sekiguchi ,  Takeyoshi Ohashi ,  Junichi Tanaka ,  Zhaohui Cheng ,  Ruriko Tsuneta ,  Hiroki Kawada ,  Seiko Hitomi

发明人： Tomoko Sekiguchi ,  Takeyoshi Ohashi ,  Junichi Tanaka ,  Zhaohui Cheng ,  Ruriko Tsuneta ,  Hiroki Kawada ,  Seiko Hitomi

IPC分类号： G06K9/46 ,  G06T7/00

CPC分类号： G06K9/4604 ,  B82Y10/00 ,  B82Y40/00 ,  G01B15/04 ,  G01N23/22 ,  G06T7/0004 ,  H01J37/3174 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2816 ,  H01J2237/31754 ,  H01J2237/31796 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).

摘要翻译： 在本发明中，在测量时，使用CD-SEM，当用电子束照射时收缩的抗蚀剂的长度为了在收缩之前高精度地估计抗蚀剂的形状和尺寸，收缩数据库 预先准备了各种图案，所述收缩数据库包含在电子束照射之前获得的横截面形状数据，横截面形状数据组和CD-SEM图像数据组，其在各种电子束照射条件下获得 ，以及基于这样的数据和数据组的模型，并且获得要测量的抗蚀剂图案的CD-SEM图像（S102），然后将CD-SEM图像和收缩数据库中的数据彼此进行比较（S103 ），并且估计并输出收缩前的图案的形状和尺寸（S104）。